Abstract: A method of forming an image having reduced comer rounding in a photoresist layer is provided which comprises exposing a photoresist layer to a first mask having a first image, said first image having at least two edges; exposing said photoresist layer to a second mask having a second image, said second image having at least two edges, the second image edges being substantially rotated relative to the first image edges to produce a latent image in said photoresist layer having edges substantially rotated relative to the first and second image edges; and developing the photoresist layer to produce said image.

Abstract: A schematic modifier editor that works in concert with a shapes modifier editor so that changes to a design layout are reflected in the schematic. The shapes modifier editor tracks the changes made to the cell hierarchy and saves the changes to a list file. The schematic modifier editor processes the list file and edits the schematic file so that its cell hierarchy corresponds with that of the modified shapes file. The modified schematic file and modified shapes file can then be compared by a conventional verification program to ensure that the modified shapes file implements the desired circuit.