Abstract: A plasma processing system is provided with diagnostic apparatus for making in-situ measurements of plasma properties. The diagnostic apparatus generally comprises a non-invasive sensor array disposed within a plasma processing chamber, an electrical circuit for stimulating the sensors, and means for recording and communicating sensor measurements for monitoring or control of the plasma process. In one form, the sensors are dynamically pulsed dual floating Langmuir probes that measure incident charged particle currents and electron temperatures in proximity to the plasma boundary or boundaries within the processing system. The plasma measurements may be used to monitor the condition of the processing plasma or furnished to a process system controller for use in controlling the plasma process.

Abstract: A plasma processing system is provided with diagnostic apparatus for making in-situ measurements of plasma properties. The diagnostic apparatus generally comprises a non-invasive sensor array disposed within a plasma processing chamber, an electrical circuit for stimulating the sensors, and means for recording and communicating sensor measurements for monitoring or control of the plasma process. In one form, the sensors are dynamically pulsed dual floating Langmuir probes that measure incident charged particle currents and electron temperatures in proximity to the plasma boundary or boundaries within the processing system. The plasma measurements may be used to monitor the condition of the processing plasma or furnished to a process system controller for use in controlling the plasma process.

Abstract: A method and apparatus for monitoring and controlling deposition of metal, insulating compounds or other compounds on a substrate by sputtering techniques includes maintaining pulsed, constant, direct current power to the target, sensing the voltage of the target material used in the process, simultaneously rapidly sensing the partial pressure of the reactive gas, and simultaneously biasing the substrate to activate the reactive gas or otherwise energizing the reactive gas in the vicinity of the substrate. An apparatus for practicing the invention is also disclosed.

Abstract: A method and apparatus for monitoring and controlling deposition of metal, insulating compounds or other compounds on a substrate by sputtering techniques includes maintaining pulsed, constant, direct current power to the target, sensing the voltage of the target material used in the process, simultaneously rapidly sensing the partial pressure of the reactive gas, and simultaneously biasing the substrate to activate the reactive gas or otherwise energizing the reactive gas in the vicinity of the substrate. Low temperature coating (eg., below 550.degree. C.) of compounds such as alumina is effected by introduction of an extra energy source such as a radio frequency coil to the sputtering system to enhance the ionization potential of the positive ions. The asymmetric direct current pulsed magnetron power source is coupled to the cathode, as well as the substrate to be coated.

Abstract: The present invention provides a coated article comprising a substrate that can be non-crystalline or crystalline such as a polycrystalline engineering material, having advantageous mechanical properties and a superlattice-type protective composite coating on the substrate. The composite coating comprises a plurality of vapor deposited, ion bombarded, polycrystalline layers of different adjacent compositions formed one atop the other in lamellar manner. The polycrystalline layers have sufficiently thin individual layer thicknesses (e.g. not exceeding about 150 nanometers) and sufficiently distinct and different compositions proximate their interfaces despite being ion bombarded as to constitute superlattice layers that exhibit a collective hardness exceeding the hardness of any individual layer material in homogenous or bulk form.

Abstract: A composite material having high hardness comprises a carbon nitrogen compound, such as CN.sub.x where x is greater than 0.1 and up to 1.33, deposited on a metal or metal compound selected to promote deposition of substantially crystalline CN.sub.x. The carbon nitrogen compound is deposited on a crystal plane of the metal or metal compound sufficiently lattice-matched with a crystal plane of the carbon nitrogen compound that the carbon nitrogen compound is substantially crystalline. A plurality of layers of the compounds can be formed in alternating sequence to provide a multi-layered, superlattice coating having a coating hardness in the range of 45-55 GPa, which corresponds to the hardness of a BN coating and approaches that of a diamond coating.

Abstract: A composite material having high hardness comprises a carbon nitrogen compound, such as CN.sub.x where x is greater than 0.1 and up to 1.33, deposited on a metal or metal compound selected to promote deposition of substantially crystalline CN.sub.x. The carbon nitrogen compound is deposited on a crystal plane of the metal or metal compound sufficiently lattice-matched with a crystal plane of the carbon nitrogen compound that the carbon nitrogen compound is substantially crystalline. A plurality of layers of the compounds can be formed in alternating sequence to provide a multi-layered, superlattice coating having a coating hardness in the range of 45-55 GPa, which corresponds to the hardness of a BN coating and approaches that of a diamond coating.

Abstract: A kit and process are provided for working metals, said kit comprising a metal nitride and/or metal carbonitride coated metal working tool and a water soluble metal working fluid, said fluid including a relatively large alkoxylated amine, an alkanol amine and an acid-derived compound selected from the group consisting of organic acids, inorganic acids, and salts thereof, and said process comprising contacting a metal workpiece with said metal working tool and said fluid to effectuate working of said metal.

Abstract: A high hardness hafnium nitride formed by a reactive sputter coating of a substrate in a closed chamber with a substantially pure hafnium target, and an atmosphere of argon and nitrogen. The hafnium nitride has a face centered cubic structure with a lattice spacing of 4.55 to 4.58 .ANG., and a hardness in the range of 2700 to 5500 kilograms per square millimeter utilizing a Vickers microindentation hardness test.

Abstract: A metal from group IVb of the periodic table is used as the target in a reactive deposition process. An inert gas such as argon is admitted within the chamber housing the target. Electrical power at a constant level is supplied to the target, ionizing the inert gas so that the ions bombard the metal target and initiate sputtering. A controlled flow of a reactive gas such as nitrogen is then admitted to the chamber and controlled in such a way that the metal deposition rate is not lowered. The amount of the reactive gas is constantly sampled to provide a control signal used to regulate admission of the reactive gas at the proper rate for most effective deposition of the metal onto the substrate. Closed loop systems regulate the level of electrical power supplied to the target, rate of admission of the inert gas, and rate of admission of the reactive gas.

Abstract: A method of reactive sputtering of the nitride, oxide or carbide of titanium or similar materials onto a substrate from a target of the pure metal in a chamber utilizing an inert gas, such as argon, wherein the deposition rate of the metallic compound approaches substantially the deposition rate of the pure metal. A reactive gas is introduced into the chamber adjacent to the target at a constant flow and by a rapid pulsing wherein a valve is alternately opened and shut for very short time intervals.

Abstract: The surfaces of aluminum and aluminum alloy articles, when abraded with a low-density abrasive product in the presence of a lower alcohol such as isopropanol, are readily plated or coated to provide a uniform plating or coating. The process is particularly useful in providing aluminum-silicon brazing alloy with nickel or nickel-lead plating for brazing.