Abstract: A method of forming a top coat layer and a topcoat material for use in immersion lithography. A topcoat layer is formed on a photoresist layer from an aqueous solution that is immiscible with the photoresist layer. The topcoat layer is then rendered insoluble in neutral water but remains soluble in aqueous-base developer solutions so the photoresist may be exposed in a immersion lithographic system using water as the immersion fluid, but is removed during photoresist development. The topcoat materials are suitable for use with positive, negative, dual tone and chemically amplified (CA) photoresist.

Abstract: A method of forming a top coat layer and a topcoat material for use in immersion lithography. A topcoat layer is formed on a photoresist layer from an aqueous solution that is immiscible with the photoresist layer. The topcoat layer is then rendered insoluble in neutral water but remains soluble in aqueous-base developer solutions so the photoresist may be exposed in a immersion lithographic system using water as the immersion fluid, but is removed during photoresist development. The topcoat materials are suitable for use with positive, negative, dual tone and chemically amplified (CA) photoresist.

Abstract: An optical apparatus used for the efficient characterization of photoresist material includes at least one grating interferometer having at least two gratings that together define an optical recombination plane. An optical stop blocks any zeroth order beam from propagating through the apparatus. A reticle positioned at the recombination plane has at least one fiducial marking therein. A lithographic imaging optical tool is positioned so that its input optical plane is substantially coincident with the optical recombination plane and its output imaging plane is substantially coincident with photoresist on a wafer. The apparatus writes in the photoresist latent, sinusoidal grating patterns, preferably of different spatial frequencies, as well as at least one fiducial mark whose pattern is determined by the marking in the reticle. After the photoresist is developed, its intrinsic spatial resolution may be determined by automated means.

Abstract: An optical apparatus used for the efficient characterization of photoresist material includes at least one grating interferometer having at least two gratings that together define an optical recombination plane. An optical stop blocks any zeroth order beam from propagating through the apparatus. A reticle positioned at the recombination plane has at least one fiducial marking therein. A lithographic imaging optical tool is positioned so that its input optical plane is substantially coincident with the optical recombination plane and its output imaging plane is substantially coincident with photoresist on a wafer. The apparatus writes in the photoresist latent, sinusoidal grating patterns, preferably of different spatial frequencies, as well as at least one fiducial mark whose pattern is determined by the marking in the reticle. After the photoresist is developed, its intrinsic spatial resolution may be determined by automated means.

Abstract: A method is disclosed for preparing a patterned continuous polymeric brush on a substrate surface. The method generally involves functionalization of the substrate surface followed by surface-initiated polymerization at the initiation sites so provided, e.g., using a living free radical polymerization technique or the like, whereby a covalently bound continuous polymeric brush results, with acid-labile groups present throughout. An acid is then applied to the continuous polymer brush in a predetermined pattern, under conditions that result in removal of the acid-labile groups in at least one first region of the continuous polymer brush but not in at least one second region of the continuous polymer brush. In a preferred embodiment, the acid is a photogenerated acid resulting from imagewise irradiation of a photoacid generator applied as a film or coating to the surface-bound polymer brush.

Abstract: The present invention relates to an improved lithographic imaging process for use in the manufacture of integrated circuits. The process provides protection to the photoresist film from airborne chemical contaminants.

Abstract: A stochastic simulation method and system are provided. The invention eliminates the need for the use of subroutine calls in a user-written simulation program, and of option flags to direct execution via decision trees, by allowing the user to configure the simulator through choices of options at run-time. The options are presented via a user interface as radio buttons or checkboxes which the user activates. The simulator sets itself up to incorporate only those options. The programmer (that is, the author of software according to the invention) only makes the objects available and ensures that they work together. It is the user who actually configures the simulator. The invention provides a highly extendable structure. By use of inheritance and dynamic allocation of memory, and by design of self-contained objects to represent various components of the simulation system, a simulation program according to the invention incorporates new features and options with a minimum of new code.

Abstract: A system and method for simulating a mechanistic kinetic process, such as a chemical process including one or more chemical reactions, over a predetermined time period, subject to a programmed temperature variation, is provided. The simulation proceeds stochastically, by taking discrete time steps through the time period. The time steps vary in size, based on instantaneous reaction rate values for the reactions taking place. Reaction rates can vary by many orders of magnitude, and sometimes a stochastically calcualated time step will be so great that it might skip over a later increase in chemical activity. To avoid loss of accuracy and control of the simulation due to such excessively large time steps, when the stochastically determined time step exceeds a threshold, one or more smaller, deterministic time steps are made. The deterministic time steps "inch" forward in time, until an increase in chemical activity is detected. Then, stochastic time steps are resumed.