Patents by Inventor William Eckes
William Eckes has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 7518732Abstract: Improved systems, apparatus, and methods for detecting positions of moving stages and a reference position of a beam column are provided. For some embodiments, independent discrete interferometers may be utilized for distance measurements in each axis, rather than a cumbersome monolithic multi-axis interferometer utilized in conventional systems.Type: GrantFiled: October 22, 2007Date of Patent: April 14, 2009Inventors: William A. Eckes, Jeffrey Sullivan, Kurt Werder
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Patent number: 7470919Abstract: Embodiments of the invention generally provide a substrate support assembly. In one embodiment, a substrate support assembly includes a substrate support plate, a thermal regulating plate coupled in a spaced-apart relation to the substrate support plate and a main actuator coupled in a spaced-apart relation to the thermal regulating plate. The main actuator is adapted to move the substrate support plate laterally. The substrate support assembly is configured to limit the thermal influence of the main actuator on a substrate positioned on the substrate support plate.Type: GrantFiled: September 29, 2006Date of Patent: December 30, 2008Assignee: Applied Materials, Inc.Inventors: Yacov Elgar, Patrick D. Duane, William Eckes, Rushford Ogden
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Patent number: 7345287Abstract: We have developed a method and apparatus for cooling electromagnetic lens coils of the kind used in charged particle beams. The method and apparatus provide not only a symmetrical cooling effect around the optical axis of the charged particle beam, but also provide improved uniformity of heat transfer. This improved uniformity enables control over the optical axis of the charged particle beam within about 1 nm for high current charged particle beam columns, wherein the current ranges from about 100 nanoamps to about 1000 nanoamps. The use of a squat and wide electromagnetic lens coil in combination with an essentially flat modular cooling panel, which provides uniform cooling to the electromagnetic lens coil, not only enables control over the optical axis of the charged particle beam, but also provides mechanical stability for the charged particle beam column.Type: GrantFiled: September 30, 2005Date of Patent: March 18, 2008Assignee: Applied Materials, Inc.Inventors: Thomas Jasinski, Dieter Winkler, William A. Eckes
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Patent number: 7336369Abstract: Improved systems, apparatus, and methods for detecting positions of moving stages and a reference position of a beam column are provided. For some embodiments, independent discrete interferometers may be utilized for distance measurements in each axis, rather than a cumbersome monolithic multi-axis interferometer utilized in conventional systems.Type: GrantFiled: September 30, 2005Date of Patent: February 26, 2008Assignee: Applied Materials, Inc.Inventors: William A. Eckes, Jeffrey Sullivan, Kurt Werder
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Publication number: 20080043246Abstract: Improved systems, apparatus, and methods for detecting positions of moving stages and a reference position of a beam column are provided. For some embodiments, independent discrete interferometers may be utilized for distance measurements in each axis, rather than a cumbersome monolithic multi-axis interferometer utilized in conventional systems.Type: ApplicationFiled: October 22, 2007Publication date: February 21, 2008Inventors: WILLIAM ECKES, Jeffrey Sullivan, Kurt Werder
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Publication number: 20070206456Abstract: Methods and apparatus to compensate for low-frequency tracking errors in motion control of a movable stage are provided. By recording tracking errors during earlier traversal of a trajectory, filtering, and applying those recorded tracking errors to subsequent traversals of the same or a similar trajectory, tracking errors of the subsequent traversals may be significantly reduced.Type: ApplicationFiled: September 29, 2006Publication date: September 6, 2007Inventors: Jeffrey Sullivan, Benyamin Buller, Eugene Mirro, William Eckes
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Publication number: 20070157886Abstract: Embodiments of the invention generally provide a substrate support assembly. In one embodiment, a substrate support assembly includes a substrate support plate, a thermal regulating plate coupled in a spaced-apart relation to the substrate support plate and a main actuator coupled in a spaced-apart relation to the thermal regulating plate. The main actuator is adapted to move the substrate support plate laterally. The substrate support assembly is configured to limit the thermal influence of the main actuator on a substrate positioned on the substrate support plate.Type: ApplicationFiled: September 29, 2006Publication date: July 12, 2007Inventors: Yacov Elgar, Patrick Duane, William Eckes, Rushford Ogden
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Publication number: 20070085019Abstract: We have developed a method and apparatus for cooling electromagnetic lens coils of the kind used in charged particle beams. The method and apparatus provide not only a symmetrical cooling effect around the optical axis of the charged particle beam, but also provide improved uniformity of heat transfer. This improved uniformity enables control over the optical axis of the charged particle beam within about 1 nm for high current charged particle beam columns, wherein the current ranges from about 100 nanoamps to about 1000 nanoamps. The use of a squat and wide electromagnetic lens coil in combination with an essentially flat modular cooling panel, which provides uniform cooling to the electromagnetic lens coil, not only enables control over the optical axis of the charged particle beam, but also provides mechanical stability for the charged particle beam column.Type: ApplicationFiled: September 30, 2005Publication date: April 19, 2007Inventors: Thomas Jasinski, Dieter Winkler, William Eckes
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Publication number: 20070077354Abstract: Methods and apparatus enable thermal conditioning of a substrate in a vacuum chamber that is evacuated to a high vacuum pressure. The substrate rests on a thermally controlled support that defines a cavity area between an underside of the substrate and a recessed section of the support. A fence of the support bounds the recessed section and limits flow of a gas injected into the cavity area into an interior region of the vacuum chamber where the support and substrate are disposed. Accordingly, a pressure differential exists between the cavity area and the interior region of the vacuum chamber. This relatively higher pressure in the cavity area enables heat transfer between the support and substrate via the gas in the cavity area in order to adjust the temperature of the substrate.Type: ApplicationFiled: September 30, 2005Publication date: April 5, 2007Inventors: Paul O'Brien, Rushford Ogden, Yacov Elgar, William Eckes, Patrick Duane
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Publication number: 20070076216Abstract: Improved systems, apparatus, and methods for detecting positions of moving stages and a reference position of a beam column are provided. For some embodiments, independent discrete interferometers may be utilized for distance measurements in each axis, rather than a cumbersome monolithic multi-axis interferometer utilized in conventional systems.Type: ApplicationFiled: September 30, 2005Publication date: April 5, 2007Inventors: William Eckes, Jeffrey Sullivan, Kurt Werder
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Patent number: 6219146Abstract: A laser beam or other parallel light beam divides at a beamsplitter into sample and reference beams. The sample beam reflects from a reflective surface back to the beamsplitter, and the reference beam reflects from a retroreflector back to the beamsplitter. The beams are then directed into a telescope. The angle between sample and reference beams at the telescope is proportional to the angle between the laser beam and the normal to the reflective surface. The telescope collects both sample beam and reference beam and transforms each beam into a sharply defined point image. The lateral separation between the two point images is proportional to the magnification of the telescope and to the angle formed at the telescope between the sample beam and the reference beam. If the reflective surface is accurately aligned relative to the laser beam, then the two point images are substantially superposed on one another.Type: GrantFiled: July 9, 1999Date of Patent: April 17, 2001Assignee: Etec Systems, Inc.Inventors: Robert Innes, William A. Eckes
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Patent number: 5209402Abstract: A laminar flow diffuser has a plurality of round, thin, stacked plates. A central bore penetrates all the plates with the exception of the bottom plate. The diffuser is secured to the vacuum chamber port. When gas enters the port, it enters the central bore and then flows radially outward through the interplate spaces to the outer circumference of the plates and subsequently into the periphery of the chamber. The diffuser thereby provides a controlled laminar flow which prevents turbulence in the chamber and hence, reduces the possibility of contamination to the workpiece in the chamber. The laminar flow diffuser is easily cleaned, both during its initial assembly and later after use, because it chiefly has flat surfaces which do not harbor dirt or gas.Type: GrantFiled: May 24, 1991Date of Patent: May 11, 1993Assignee: Etec System, Inc.Inventors: Daniel B. DeBra, William A. Eckes
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Patent number: 4788431Abstract: A specimen distance measuring system uses a plate (36) to obstruct the flux of backscattered electrons produced by an electron beam (18), and to cast a shadow across a measurement detector (32) which is sensitive to the position of the shadow. The shadow plate (36) and measurement detector (32) are aligned at an angle of approximately 45 degrees with a substrate (14) in order to allow calibration of the distance measuring system by scanning the electron beam (18). The measuring system is particularly useful as a height sensor (10) in an electron beam lithography apparatus (12) for sensing the height of a substrate (14). The distance measuring system may also include a reference detector (34) which is positioned in order to receive backscattered electron flux without obstruction from the shadow plate (36).Type: GrantFiled: April 10, 1987Date of Patent: November 29, 1988Assignee: The Perkin-Elmer CorporationInventors: William A. Eckes, Lee Veneklasen, Glen E. Howard, Donald J. McCarthy, Allen M. Carroll, Daniel L. Cavan
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Patent number: 4412133Abstract: An electrostatic cassette assembly comprising, a cassette body having a central opening for receiving a wafer to be processed in a particle beam lithographic system, a charge plate with a top surface having a coating of dielectric (nonconductive) material or a plurality of nonconductive means, or both, on which the wafer is supported, means for forcing said charge plate and wafer into contact with stop means to hold the wafer rigidly in said cassette assembly, and means for applying a potential difference between the wafer and the charge plate to flatten said wafer by Coulombic force so that the wafer is held both mechanically and electrostatically in said cassette assembly. Means are also provided for insuring a good electrical contact with the wafer and for aligning the wafer in the cassette assembly.Type: GrantFiled: January 5, 1982Date of Patent: October 25, 1983Assignee: The Perkin-Elmer Corp.Inventors: William A. Eckes, Russell H. Rhoades, John W. Vorreiter, John C. Wiesner, Charles E. Shepard