Abstract: A system, method and program product for performing density checking of an IC design. The invention establishes an evaluation array for the IC design including an array element for each evaluation window of the IC design. The number of evaluation windows is based on a smallest necessary granularity. A single pass through shape data for the IC design is then conducted to populate each array element with a shape area for a corresponding evaluation window. Density checking is performed by iterating over the evaluation array using a sub-array. The sub-array may have the size of the preferred density design rule window. The invention removes the need for repetitive calculations, and results in a more efficient approach to density checking.

Abstract: According to the present embodiment, a method for calculating the parasitic capacitance in a semiconductor device is disclosed. According to the preferred method, a layout file containing the shapes of a semiconductor device is provided. The dimensions of the layout file are then adjusted to wafer dimensions so as reflect actual production devices. The shapes of the layout file are then partitioned into simpler shapes, typically abutted rectangles, called tiles. Each tile is then decomposed into overlap and fringe capacitance components, each component having a uniform capacitance environment with respect to its capacitance elements. The parasitic capacitance of the semiconductor device can thus be accurately computed, with an efficient use of resources. Additionally the preferred embodiment is easily adaptable to a wide range of technology types.