Abstract: A laser component purge system for discharge lasers. The LNP, the output coupler and the wavemeter are contained in sealed chambers each having a purge inlet port and a purge outlet port. Purge gas such as N2 is directed to each of the inlet ports. A purge monitoring system is provided which monitors the purge flow and provides one or more signals to a processor which is programmed to minimize laser timeouts attributable to purge conditions without endangering the purged optical components. In a preferred embodiment, gas exiting the outlet ports are directed to flow monitors which provide the one or more signals to the processor. Purge gas may be exhausted or recirculated.

Abstract: A laser component purge system for discharge lasers. The LNP, the output coupler and the wavemeter are contained in sealed chambers each having a purge inlet port and a purge outlet port. Purge gas such as N2 is directed to each of the inlet ports. A purge monitoring system is provided which monitors the purge flow and provides one or more signals to a processor which is programmed to minimize laser timeouts attributable to purge conditions without endangering the purged optical components. In a preferred embodiment, gas exiting the outlet ports are directed to flow monitors which provide the one or more signals to the processor. Purge gas may be exhausted or recirculated.