Abstract: Provided are stacks including CMC structures and capping layers deposited on surfaces of these CMC structures. Also provided are methods for hermetically sealing the surfaces of the CMC structures with the capping layers. These stacks may be used to construct walls of radomes that enclose antennas and other equipment of aerospace vehicles. The capping layers may form smooth external surfaces of the radomes and may hermetically seal the underlying CMC structures. The dielectric properties of these stacks may be configured to minimize interference with operations of the antennas and other equipment deposited within the radome.

Abstract: Provided are stacks including CMC structures and capping layers deposited on surfaces of these CMC structures. Also provided are methods for hermetically sealing the surfaces of the CMC structures with the capping layers. These stacks may be used to construct walls of radomes that enclose antennas and other equipment of aerospace vehicles. The capping layers may form smooth external surfaces of the radomes and may hermetically seal the underlying CMC structures. The dielectric properties of these stacks may be configured to minimize interference with operations of the antennas and other equipment deposited within the radome.

Abstract: Provided are methods for hermetically sealing the surfaces of the CMC structures with the capping layers, comprising depositing a slurry onto the surface of a CMC structure and treating the CMC structure with the deposited slurry in an oxygen containing environment, thereby forming a stack. These stacks may be used to construct walls of radomes that enclose antennas and other equipment of aerospace vehicles. The capping layers may form smooth external surfaces of the radomes and may hermetically seal the underlying CMC structures. The dielectric properties of these stacks may be configured to minimize interference with operations of the antennas and other equipment deposited within the radome.

Abstract: Provided are stacks including CMC structures and capping layers deposited on surfaces of these CMC structures. Also provided are methods for hermetically sealing the surfaces of the CMC structures with the capping layers. These stacks may be used to construct walls of radomes that enclose antennas and other equipment of aerospace vehicles. The capping layers may form smooth external surfaces of the radomes and may hermetically seal the underlying CMC structures. The dielectric properties of these stacks may be configured to minimize interference with operations of the antennas and other equipment deposited within the radome.

Abstract: Provided are stacks including CMC structures and capping layers deposited on surfaces of these CMC structures. Also provided are methods for hermetically sealing the surfaces of the CMC structures with the capping layers. These stacks may be used to construct walls of radomes that enclose antennas and other equipment of aerospace vehicles. The capping layers may form smooth external surfaces of the radomes and may hermetically seal the underlying CMC structures. The dielectric properties of these stacks may be configured to minimize interference with operations of the antennas and other equipment deposited within the radome.

Abstract: A manufacturing method for producing metal matrix composite (MMC) sheets without intermediate process losses associated with extrusion and rolling edge cracks. The method results in theoretical sheet yield rates from the initial MMC billet of up to 100%, compared to 30 to 60% yield rates for prior-art manufacturing processes. The methods in this invention comprise the following processes: (a) preparing a MMC powder mixture; (b) preparing a frame and a billet consolidation tool; (c) loading and compacting the MMC mixture to form a framed MMC compact; (d) consolidation of the framed MMC compact to form a framed MMC billet; (e) preparing the framed billet to be a framed roll-preform; and (e) rolling the framed roll-preform to MMC sheet.