Abstract: An air cleaner assembly includes a housing and a removable cover. A filter element is removably positioned in the housing. A two-part mating catch assembly includes a first part that is secured to the cover and a second part that is on one of the housing and the filter element. The first part and second part are positioned to releasably mate when the filter element is operably mounted within the housing.

Abstract: Transportation of a lithographic plate uses an indexer to load plates into pods for delivery to a press cylinder via a pod elevator or a pod cart. The plates are imprinted with a bar code, imaged, punched, bent, sheared, corner notched, and registered to a press cylinder. The plates are loaded into the indexer, which moves the loaded plates into a position in alignment with designated pod compartments, and loads the plates into each of the designated pod compartments by indexed movement of an elevator within the indexer. The pod elevator or the pod cart moves the pods proximate to a press cylinder where the plates are unloaded from the pod and loaded onto a press cylinder. A computing device, such as a PLC, directs the process. A vision system senses information from the indexer, pod, pod elevator, and the plate for feedback to a PLC, which initiates all of the foregoing operations.

Abstract: Transportation of a lithographic plate uses an indexer to load plates into pods for delivery to a press cylinder via a pod elevator or a pod cart. The plates are imprinted with a bar code, imaged, punched, bent, sheared, corner notched, and registered to a press cylinder. The plates are loaded into the indexer, which moves the loaded plates into a position in alignment with designated pod compartments, and loads the plates into each of the designated pod compartments by indexed movement of an elevator within the indexer. The pod elevator or the pod cart moves the pods proximate to a press cylinder where the plates are unloaded from the pod and loaded onto a press cylinder. A computing device, such as a PLC, directs the process. A vision system senses information from the indexer, pod, pod elevator, and the plate for feedback to a PLC, which initiates all of the foregoing operations.

Abstract: The method and apparatus for registration of a lithographic plate includes a means for ensuring that the plate is in contact with registration pins on imaging and bending devices and a means for finely adjusting an initial position of the plate with respect to registration pins on the bender to bring the plate in registration with the specified plate lock-up position on the press cylinder. Three separate electrical circuits ensure that the plate is in contact with the registration pins if each separate circuit is able to conduct current between the respective pins and the plate. The fine adjustment is accomplished by rotation of eccentric registration pins until the plate is within tolerance.

Abstract: Transportation of a lithographic plate uses an indexer to load plates into pods for delivery to a press cylinder via a pod elevator or a pod cart. The plates are imprinted with a bar code, imaged, punched, bent, sheared, corner notched, and registered to a press cylinder. The plates are loaded into the indexer, which moves the loaded plates into a position in alignment with designated pod compartments, and loads the plates into each of the designated pod compartments by indexed movement of an elevator within the indexer. The pod elevator or the pod cart moves the pods proximate to a press cylinder where the plates are unloaded from the pod and loaded onto a press cylinder. A computing device, such as a PLC, directs the process. A vision system senses information from the indexer, pod, pod elevator, and the plate for feedback to a PLC, which initiates all of the foregoing operations.

Abstract: The present invention provides for a method and an apparatus for controlling manufacturing processes using a hierarchical system. A first lot of semiconductor devices is processed using a first set of control input parameters. The first set of control input parameters is stored in one of a plurality of hierarchical levels, the first set of control input parameters being available for processing of a second lot of semiconductor devices. Process data is acquired from the processing of the first lot of semiconductor devices. A second set of control input parameters is determined for a subsequent lot of semiconductor devices based upon the acquired process data. The second set of control input parameters is stored in one of a plurality of hierarchical levels, the first and second sets of control input settings being available for processing of a third lot of semiconductor devices.

Abstract: A method for controlling wafer uniformity in a polishing tool includes providing a plurality of carrier heads, determining a signature for each of the carrier heads, and installing carrier heads with similar signatures in a polishing tool. A processing line includes a polishing tool and a processing tool. The polishing tool is adapted to polish wafers. The polishing tool includes a plurality of carrier heads, each carrier head having a polishing signature similar to the other carrier heads. The processing tool is adapted to process the polished wafers in accordance with a recipe. At least one parameter in the recipe is based on the polishing signatures of the carrier heads.

Abstract: A method for monitoring consumable performance in a processing tool comprises storing a performance model of the processing tool; receiving a consumable item characteristic of a consumable item in the processing tool; determining a predicted processing rate for the processing tool based on the consumable item characteristic and the performance model; determining an actual processing rate of the processing tool; and determining a replacement interval for the consumable item based on at least the actual processing rate. A processing system includes a processing tool and an automatic process controller. The processing tool is adapted to process wafers and includes a consumable item.

Abstract: The present invention provides for a method and an apparatus for monitoring controller performance using statistical process control analysis. A manufacturing model is defined. A processing run of semiconductor devices is performed as defined by the manufacturing model and implemented by a process controller. A fault detection analysis is performed on the process controller. At least one control input signal generated by the process controller is updated.

Abstract: The present invention provides for a method and an apparatus for interfacing a statistical process control system with a manufacturing control system. A manufacturing model is defined. A processing run of semiconductor devices is processed in a manufacturing facility as defined by the manufacturing model. An advanced process control analysis is performed on the processed semiconductor devices. A statistical process control analysis is performed on the processed semiconductor devices. The manufacturing facility is modified in response to the advanced process control analysis and the statistical process control analysis.

Abstract: An emulsion coater is provided with a framework having a table or work surface for supporting a sheet of material that is to be coated e.g., a sheet of transparent plastic film. A carriage is mounted on the framework for rectilinear movement thereacross parallel to the surface of the sheet to advance a coating applicator across the sheet. A coating dryer is also mounted on the carriage to progressively dry the coating from one end to the other as it is applied. A motor is supported on the framework for moving the carriage forwardly from one end of the sheet to the other. Provision is made for disengaging the coating applicator from the carriage once the coating has been applied and thereafter moving the carriage in a reverse direction across the applied coating to the starting position while optionally continuing to dry the coating.

Abstract: A method for filling a trench is provided. A wafer having at least a first layer formed thereon is provided. A trench is formed in the first layer. The depth of the trench is measured. A target thickness is determined based on the depth of the trench. A second layer of the target thickness is formed over the trench. A processing line includes a trench etch tool, a first metrology tool, a trench fill tool, and an automatic process controller. The trench etch tool is adapted to form a trench in a first layer on a wafer. The first metrology tool is adapted to measure the depth of the trench. The trench fill tool is adapted to form a second layer over the first layer based on an operating recipe. An automatic process controller is adapted to determine a target thickness based on the depth of the trench and modify the operating recipe of the trench fill tool based on the target thickness.

Abstract: An emulsion coater is provided with a framework having a table or work surface for supporting a sheet of material that is to be coated e.g., a sheet of transparent plastic film. A carriage is mounted on the framework for rectilinear movement thereacross parallel to the surface of the sheet to advance a coating applicator across the sheet. A coating dryer is also mounted on the carriage to progressively dry the coating from one end to the other as it is applied. A motor is supported on the framework for moving the carriage forwardly from one end of the sheet to the other. Provision is made for disengaging the coating applicator from the carriage once the coating has been applied and thereafter moving the carriage in a reverse direction across the applied coating to the starting position while optionally continuing to dry the coating.

Abstract: A method for filling a trench is provided. A wafer having at least a first layer formed thereon is provided. A trench is formed in the first layer. The depth of the trench is measured. A target thickness is determined based on the depth of the trench. A second layer of the target thickness is formed over the trench. A processing line includes a trench etch tool, a first metrology tool, a trench fill tool, and an automatic process controller. The trench etch tool is adapted to form a trench in a first layer on a wafer. The first metrology tool is adapted to measure the depth of the trench. The trench fill tool is adapted to form a second layer over the first layer based on an operating recipe. An automatic process controller is adapted to determine a target thickness based on the depth of the trench and modify the operating recipe of the trench fill tool based on the target thickness.

Abstract: A rotary apparatus for applying heat to develop an image on photosensitive copy paper or to desensitize the photosensitive paper against further exposure to light includes an elongated supporting framework including a base having a roll support stand at each end with spaced apart bearings for supporting a drive roll that is provided with a high friction, e.g. a rubber coated, surface. A drive motor is connected to the drive roll for rotating the drive roll, a hot shoe is supported on the framework adjacent to the roll, and a slip sheet is mounted between the hot shoe and the drive roll to provide a low friction surface for allowing the photosensitive sheet to slide easily through the apparatus as it is carried forward by frictionally contact with the drive roll. The hot shoe and slip sheet are both held in a fixed position. The bearings for the drive roll are able to be moved radially with respect to the axis of the drive roll and then secured, i.e. locked in a selected position with respect to the hot shoe.

Abstract: An apparatus and a method configure lithographic plates by cutting corners and bending edges in preparation for use in web offset printing. The lithographic plate is precisely aligned and immobilized on a support bed, which has bending anvils at opposing edges of the bed. A corner die cutter advances into position above a corner of the plate, cuts a corner of the plate and then retracts. An eccentric camming member for bending the plate edges has full bearing supporting ends and additional bearings intermediate the ends. The eccentric camming members lower to the plate and rotate within their bearings to form bends of selected angles in opposing edges of the plate. The eccentric camming members are then counter rotated and raised to their position above the plate. The movements of the corner die cutter and the eccentric camming member are precisely sequenced with each other by programmable logic control.

Abstract: A child resistant quick release firearm safety and security device wherein the one piece device is inserted into the loading port of a tubular magazine, bottom loading, firearm. The operative position places the safety and security device under pressure from the magazine spring and the firearm is disabled by blocking internal mechanisms. The firearm cannot be loaded either externally through the ejection port or internally from the magazine. Further, the outer surface of the safety and security device substantially fills the loading port to act as both a dust and anti-tamporing cover. The body is shared so as to retain anti-corrosion, agents within the firearm. Removal is by catching the fingernails in a recess on the outer surface of the body and pulling the safety and security device forward toward the magazine tube. Upon being moved forward as far as possible the safety and security device will flip free of the firearm, thereby enabling immediate operation of the firearm.

Abstract: A scanning light contact duplicating apparatus is described which includes an explosure frame having a front and rear edge between which extends a backing plate that is used for supporting an original sheet such as a negative transparency to be copied, together with a photosensitive sheet in contact with it. A transparent cover is connected to the exposure frame. Provision is also made for pressing the transparent cover toward the backing to force the original sheet (negative) into close contact with the copy sheet (photosensitive sheet). An elongated light, usually a gas or vapor lamp, is positioned parallel to the front edge of the exposure frame. The light is supported for rectilinear movement toward the rear of the exposure frame and parallel to the plane of the exposure frame. A collimator is preferably provided between the light and the exposure frame. The collimator has a honeycomb array of parallel open-ended cells, each of the cells having walls perpendicular to the exposure frame.

Abstract: The operating characteristics of a diverter having a driven article conveying surface of parallel tubes on which article diverting shoes are caused to move across progressively because of contract between a depending drive pin on each shoe and a laterally inclined rail beneath the conveying surface by changing the shape of the rail contacting roller on the pin so that a downward force vector is created tending to hold the shoe down. Also, the shoe is supported on three rollers instead of two to prevent the tendency of the shoe to pivot about one tube due to article resistance to lateral movement. The design of the openings in the shoe through which the tubes pass are such that the shoe will not become bound between two tubes which are not entirely straight.