Abstract: A method for producing an optical waveguide by: (a) depositing a first composition: (i) a polysiloxane comprising epoxy and alkenyl groups with refractive index no greater than 1.50, (ii) a compound comprising at least one epoxy group and refractive index no greater than 1.49, and (iii) a polysiloxane having refractive index at least 1.50; (iv) a photo acid generator; (v) a hydrosilylation catalyst, (vi) an inhibitor for hydrosilylation; (b) curing by exposure to ultraviolet light; (c) removing the uncured portion to produce a patterned core layer; (d) after a time from 20 to 300 hours depositing a second composition comprising: (i) a polysiloxane comprising epoxy groups with refractive index no greater than 1.49, and (ii) a compound comprising at least two epoxy groups with a refractive index no greater than 1.49 and an alcohol having refractive index no more than 1.45 (iii) at least one photo acid generator.

Abstract: A method for producing an optical waveguide by: (a) depositing a first composition comprising: (i) a polysiloxane comprising epoxy and alkenyl groups, and (ii) a compound comprising an epoxy group, having molecular weight no greater than 1000 and a refractive index of at least 1.47 and (iii) a photo acid generator; and (iv) a hydrosilation catalyst (b) curing the first composition by exposure to ultraviolet light; (c) removing at least a part of the uncured portion of the first composition to produce a final patterned core layer; (d) depositing on the final patterned core layer a second composition comprising: (i) a polysiloxane comprising epoxy groups and alkenyl groups, and (ii) a compound comprising an epoxy group and a silicon-hydrogen bond, having molecular weight no greater than 1000 and a refractive index no greater than 1.45; (iii) a photo acid generator (e) heating at a temperature from 20 to 150° C. for 0.1 to 120 minutes; and (f) curing by exposure to ultraviolet light.

Abstract: A method for producing an optical waveguide by: (a) depositing a first composition comprising: (i) a polysiloxane comprising epoxy and alkenyl groups, and (ii) a compound comprising an epoxy group, having molecular weight no greater than 1000 and a refractive index of at least 1.47 and (iii) a photo acid generator; and (iv) a hydrosilation catalyst (b) curing the first composition by exposure to ultraviolet light; (c) removing at least a part of the uncured portion of the first composition to produce a final patterned core layer; (d) depositing on the final patterned core layer a second composition comprising: (i) a polysiloxane comprising epoxy groups and alkenyl groups, and (ii) a compound comprising an epoxy group and a silicon-hydrogen bond, having molecular weight no greater than 1000 and a refractive index no greater than 1.45; (iii) a photo acid generator (e) heating at a temperature from 20 to 150° C. for 0.1 to 120 minutes; and (f) curing by exposure to ultraviolet light.

Abstract: A method for producing an optical waveguide by: (a) depositing a first composition: (i) a polysiloxane comprising epoxy and alkenyl groups with refractive index no greater than 1.50, (ii) a compound comprising at least one epoxy group and refractive index no greater than 1.49, and (iii) a polysiloxane having refractive index at least 1.50; (iv) a photo acid generator; (v) a hydrosilylation catalyst, (vi) an inhibitor for hydrosilylation; (b) curing by exposure to ultraviolet light; (c) removing the uncured portion to produce a patterned core layer; (d) after a time from 20 to 300 hours depositing a second composition comprising: (i) a polysiloxane comprising epoxy groups with refractive index no greater than 1.49, and (ii) a compound comprising at least two epoxy groups with a refractive index no greater than 1.49 and an alcohol having refractive index no more than 1.45 (iii) at least one photo acid generator.

Abstract: A method of preparing an optical connector located within a gap between a first optical assembly and a second optical assembly is provided. The optical connector includes a contrast layer having at least one cured bridge portion and at least one uncured portion formed from a first composition having a first refractive index (RI1). The method comprises applying a second composition having a second refractive index (RI2) on the contrast layer to form a second layer and mixing at least a portion of the second layer with the at least one uncured portion of the contrast layer to form at least one intermixed portion having a third refractive index (RI3), wherein R|1>R|3>RI2, and then curing the intermixed portion and optional second layer such that each one of the at least one cured bridge portions is surrounded by an intermixed portion and optional second layer.

Abstract: A method for preparing an article includes applying a first composition on a substrate to form a first layer, and applying a curing condition to a target portion without applying the curing condition to a non-target portion of the first layer to form a first contrast layer. A second composition is then applied on the first contrast layer to form a second layer, and a curing condition is applied to a target portion without applying the curing condition to a non-target portion of the second layer and first contrast layer to form a second contrast layer. A third composition can optionally be applied and cured on the second contrast layer to form a third contrast layer having a cured and uncured portion in the same manner. The uncured portions of these contrast layers are then selectively removed to prepare the article.

Abstract: A method of preparing an optical connector located within a gap between a first optical assembly and a second optical assembly is provided. The optical connector includes a contrast layer having at least one cured bridge portion and at least one uncured portion formed from a first composition having a first refractive index (R11). The method comprises applying a second composition having a second refractive index (R12) on the contrast layer to form a second layer and mixing at least a portion of the second layer with the at least one uncured portion of the contrast layer to form at least one intermixed portion having a third refractive index (R13), wherein R|1>R|3>R12, and then curing the intermixed portion and optional second layer such that each one of the at least one cured bridge portions is surrounded by an intermixed portion and optional second layer.

Abstract: A method and process for forming a barrier layer on a flexible substrate are provided. A continuous roll-to-roll method includes providing a substrate to a processing chamber using at least one roller configured to guide the substrate through the processing chamber. The process includes depositing a barrier layer adjacent the substrate by exposing at least one portion of the substrate that is within the processing chamber to plasma comprising a silicon-and-carbon containing precursor gas. Also provided is a coated flexible substrate comprising a barrier layer based on the structural unit SiC:H, or SiOC:H, or SiOCN:H. The barrier layer possesses high density and low porosity. The barrier layer exhibits low water vapor transmission rate (WVTR) in the range of 10?2-10?4 g·m?2d?1 and is appropriate for very low permeability applications.