Abstract: Systems and methods for generating hint information associated with a host command are disclosed. In one implementation, a processor of a host system determines whether the host system has initiated a procedure that will send a command to a non-volatile memory system. The processor analyzes at least one of metadata or payload data associated with the command to determine whether the processor is able to generate hint information associated with the at least one of metadata or payload data. The processor generates hint information based on the analysis of the at least one of metadata or payload data, sends the hint information to the non-volatile memory system, and sends the command to the non-volatile memory system.

Abstract: Systems, methods and/or devices are used to enable enhancing data integrity to protect against returning old versions of data. In one aspect, the method includes (1) receiving a write request from a host that specifies write data for a set of logical block addresses in a logical address space of the host, (2) mapping the set of logical block addresses to a set of physical addresses corresponding to physical pages of the storage device, and (3) performing one or more operations for each logical block specified by the set of logical block addresses, including: (a) generating metadata for the logical block, the metadata including a version number for the logical block, (b) storing the metadata, including the version number, in a header of a physical page in which the logical block is stored, and (c) storing the version number in a version data structure.

Abstract: Systems, methods and/or devices are used to enhance data integrity to protect against returning old versions of data. In one aspect, a method includes (1) receiving a write request from a host that specifies write data for a set of logical block addresses, (2) mapping, using a mapping table, the set of logical block addresses to a set of physical addresses, where the mapping table includes a plurality of subsets, and (3) performing operations for each subset of the mapping table that includes at least one entry corresponding to a logical block specified by the set of logical block addresses, including: (a) generating metadata for the subset, the metadata including a version number for the subset, (b) calculating a Cyclic Redundancy Check (CRC) checksum for the subset, and (c) storing the version number for the subset and the CRC checksum for the subset in a version data structure.

Abstract: Systems and methods for generating hint information associated with a host command are disclosed. In one implementation, a processor of a host system determines whether the host system has initiated a procedure that will send a command to a non-volatile memory system. The processor analyzes at least one of metadata or payload data associated with the command to determine whether the processor is able to generate hint information associated with the at least one of metadata or payload data. The processor generates hint information based on the analysis of the at least one of metadata or payload data, sends the hint information to the non-volatile memory system, and sends the command to the non-volatile memory system.

Abstract: Systems, methods and/or devices are used to enable enhancing data integrity to protect against returning old versions of data. In one aspect, the method includes (1) receiving a write request from a host that specifies write data for a set of logical block addresses in a logical address space of the host, (2) mapping the set of logical block addresses to a set of physical addresses corresponding to physical pages of the storage device, and (3) performing one or more operations for each logical block specified by the set of logical block addresses, including: (a) generating metadata for the logical block, the metadata including a version number for the logical block, (b) storing the metadata, including the version number, in a header of a physical page in which the logical block is stored, and (c) storing the version number in a version data structure.

Abstract: Systems, methods and/or devices are used to enhance data integrity to protect against returning old versions of data. In one aspect, a method includes (1) receiving a write request from a host that specifies write data for a set of logical block addresses, (2) mapping, using a mapping table, the set of logical block addresses to a set of physical addresses, where the mapping table includes a plurality of subsets, and (3) performing operations for each subset of the mapping table that includes at least one entry corresponding to a logical block specified by the set of logical block addresses, including: (a) generating metadata for the subset, the metadata including a version number for the subset, (b) calculating a Cyclic Redundancy Check (CRC) checksum for the subset, and (c) storing the version number for the subset and the CRC checksum for the subset in a version data structure.

Abstract: Buffer memory reservation techniques for use with NAND flash memory include dynamically reserving regions of the buffer memory, responsive to a read/write request. Where the read/write request includes a plurality of data transfer requests, following completion of a data transfer request, the reserved buffer space may be recycled for use in a further data transfer request or for other purposes. During fulfillment of a read request, a buffer region is reserved from a larger buffer pool for a time period significantly smaller than the time required to execute a sense operation associated with the read request. The reserved buffer region may be reused for unrelated processes during execution of the sense operation.

Abstract: This disclosure provides examples of circuits, devices, systems, and methods for managing a buffer memory. Regions of the buffer memory are dynamically reserved, responsive to a read/write request. Where the read/write request includes a plurality of data transfer requests, following completion of a data transfer request, the reserved buffer space may be recycled for use in a further data transfer request or for other purposes. During fulfillment of a read request, a buffer region is reserved from a larger buffer pool for a time period significantly smaller than the time required to execute a sense operation associated with the read request. The reserved buffer region may be reused for unrelated processes during execution of the sense operation.

Abstract: A polishing pad assembly for a chemical mechanical polishing apparatus includes a polishing pad having a polishing surface and a surface opposite the polishing surface for attachment to a platen, and a solid light-transmissive window formed in the polishing pad. The light-transmissive window is more transmissive to light than the polishing pad. The light-transmissive window has a light-diffusing bottom surface.

Abstract: A method of polishing a substrate includes holding the substrate on a polishing pad with a polishing head, wherein the polishing pad is supported by a platen, creating relative motion between the substrate and the polishing pad to polish a side of the substrate, generating a light beam and directing the light beam towards the substrate to cause the light beam to impinge on the side of the substrate being polished. Light reflected from the substrate is at a detector to generate an interference signal. A measure of uniformity is computed from the interference signal.

Abstract: A desired cache size in a disk drive is established, and no reordering algorithm is performed on commands in the cache until the desired size is reached. An optimal subset size is also established. Then, an optimization algorithm is performed on all commands in the cache, with only the commands in the optimal subset being output for execution. The cache is refilled to the desired size, and the process is repeated.

Abstract: The polishing pad for a chemical mechanical polishing apparatus, and a method of making the same. The polishing pad has a covering layer with a polishing surface and a backing layer which is adjacent to the platen. A first opening in the covering layer with a first cross-sectional area and a second opening in the backing layer with a second, different cross-sectional area form an aperture through the polishing pad. A substantially transparent polyurethane plug is positioned in the aperture, and an adhesive material fixes the plug in the aperture.

Abstract: The polishing pad for a chemical mechanical polishing apparatus, and a method of making the same. The polishing pad has a covering layer with a polishing surface and a backing layer which is adjacent to the platen. A first opening in the covering layer with a first cross-sectional area and a second opening in the backing layer with a second, different cross-sectional area form an aperture through the polishing pad. A substantially transparent polyurethane plug is positioned in the aperture, and an adhesive material fixes the plug in the aperture.

Abstract: The polishing pad for a chemical mechanical polishing apparatus, and a method of making the same. The polishing pad has a covering layer with a polishing surface and a backing layer which is adjacent to the platen. A first opening in the covering layer with a first cross-sectional area and a second opening in the backing layer with a second, different cross-sectional area form an aperture through the polishing pad. A substantially transparent polyurethane plug is positioned in the aperture, and an adhesive material fixes the plug in the aperture.

Abstract: The polishing pad for a chemical mechanical polishing apparatus, and a method of making the same. The polishing pad has a covering layer with a polishing surface and a backing layer which is adjacent to the platen. A first opening in the covering layer with a first cross-sectional area and a second opening in the backing layer with a second, different cross-sectional area form an aperture through the polishing pad. A substantially transparent polyurethane plug is positioned in the aperture, and an adhesive material fixes the plug in the aperture.

Abstract: The polishing pad for a chemical mechanical polishing apparatus, and a method of making the same. The polishing pad has a covering layer with a polishing surface and a backing layer which is adjacent to the platen. A first opening in the covering layer with a first cross-sectional area and a second opening in the backing layer with a second, different cross-sectional area form an aperture through the polishing pad. A substantially transparent polyurethane plug is positioned in the aperture, and an adhesive material fixes the plug in the aperture.

Abstract: The polishing pad for a chemical mechanical polishing apparatus, and a method of making the same. The polishing pad has a covering layer with a polishing surface and a backing layer which is adjacent to the platen. A first opening in the covering layer with a first cross-sectional area and a second opening in the backing layer with a second, different cross-sectional area form an aperture through the polishing pad. A substantially transparent polyurethane plug is positioned in the aperture, and an adhesive material fixes the plug in the aperture.

Abstract: The polishing pad for a chemical mechanical polishing apparatus, and a method of making the same. The polishing pad has a covering layer with a polishing surface and a backing layer which is adjacent to the platen. A first opening in the covering layer with a first cross-sectional area and a second opening in the backing layer with a second, different cross-sectional area form an aperture through the polishing pad. A substantially transparent polyurethane plug is positioned in the aperture, and an adhesive material fixes the plug in the aperture.

Abstract: Slurry is provided to the surface of the polishing pad by pumping the slurry up through a central port, or by dripping the slurry down onto the surface of the polishing pad from a slurry feed tube. A slurry wiper, which may have one or more flexible members, sweeps the slurry evenly and thinly across the polishing pad. A control system coordinates the distribution of slurry to the polishing pad with the motion of the carrier head.

Abstract: Slurry is provided to the surface of the polishing pad by pumping the slurry up through a central port, or by dripping the slurry down onto the surface of the polishing pad from a slurry feed tube. A slurry wiper, which may have one or more flexible members, sweeps the slurry evenly and thinly across the polishing pad. A control system coordinates the distribution of slurry to the polishing pad with the motion of the carrier head.