Patents by Inventor William Landers

William Landers has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240269209
    Abstract: The present disclosure provides new beverages and methods of making said beverages from hemp juice, coffee fruit, and oranges. The present disclosure also provides new beverages and methods of making said beverages from hemp juice and coffee fruit juice.
    Type: Application
    Filed: March 25, 2024
    Publication date: August 15, 2024
    Inventor: William Landers
  • Publication number: 20230267460
    Abstract: Embodiments provide a system where a user can obtain a fractional portion of a blockchain unit. The fractional portion can be obtained as part of a separate arrangement. A computer ledger tracks the fractional interests of multiple users. An aggregator computer communicates with a blockchain computer to record ownership of one or more whole units in a pool. In one embodiment, a concierge system is provided that supports a social equity economy.
    Type: Application
    Filed: February 7, 2023
    Publication date: August 24, 2023
    Inventors: John Scannell, William Landers
  • Publication number: 20220125868
    Abstract: The present disclosure provides new beverages and methods of making said beverages from hemp juice, coffee fruit, and oranges. The present disclosure also provides new beverages and methods of making said beverages from hemp juice and coffee fruit juice. The disclosure further relates to the production of a non-water-soluble and water-soluble coffee fruit, hemp juice, and orange powders.
    Type: Application
    Filed: October 22, 2021
    Publication date: April 28, 2022
    Inventor: William Landers
  • Publication number: 20080073790
    Abstract: A method for sealing an exposed surface of a wire bond pad with a material that is capable of preventing a possible chemical attack during electroless deposition of Ni/Au pad metallurgy is provided. Specifically, the present invention provides a method whereby a TiN/Ti or TiN/Al cap is used as a protective coating covering exposed surfaces of a wire bond pad. The TiN/Ti or TiN/Al cap is not affected by alkaline chemistries used in forming the Ni/Au metallization, yet it provides a sufficient electrical pathway connecting the bond pads to the Ni/Au pad metallization.
    Type: Application
    Filed: October 3, 2007
    Publication date: March 27, 2008
    Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Lloyd Burrell, Charles Davis, Ronald Goldblatt, William Landers, Sanjay Mehta
  • Publication number: 20070290345
    Abstract: An electrical structure and method comprising a first substrate electrically and mechanically connected to a second substrate. The first substrate comprises a first electrically conductive pad and a second electrically conductive pad. The second substrate comprises a third electrically conductive pad, a fourth electrically conductive pad, and a first electrically conductive member. The fourth electrically conductive pad comprises a height that is different than a height of the first electrically conductive member. The electrically conductive member is electrically and mechanically connected to the fourth electrically conductive pad. A first solder ball connects the first electrically conductive pad to the third electrically conductive pad. The first solder ball comprises a first diameter. A second solder ball connects the second electrically conductive pad to the first electrically conductive member. The second solder ball comprises a second diameter. The first diameter is greater than said second diameter.
    Type: Application
    Filed: August 30, 2007
    Publication date: December 20, 2007
    Inventors: Lawrence Clevenger, Mukta Farooq, Louis Hsu, William Landers, Donna Zupanski-Nielsen, Carl Radens, Chih-Chao Yang
  • Publication number: 20070222073
    Abstract: A system and method comprises depositing a dielectric layer on a substrate and depositing a metal layer on the dielectric layer. The system and method further includes depositing a high temperature diffusion barrier metal cap on the metal layer. The system and method further includes depositing a second dielectric layer on the high temperature diffusion barrier metal cap and the first dielectric layer, and etching a via into the second dielectric layer, such that the high temperature diffusion barrier metal cap is exposed. The system and method further includes depositing an under bump metallurgy in the via, and forming a C4 ball on the under bump metallurgy layer.
    Type: Application
    Filed: March 21, 2006
    Publication date: September 27, 2007
    Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Mukta Farooq, Jasvir Jaspal, William Landers, Thomas Lombardi, Hai Longworth, H. Pogge, Roger Quon
  • Publication number: 20070080455
    Abstract: A semiconductor having an insulating layer, a contact pad, a via, and a sacrificial dielectric cap is provided. The contact pad is embedded in the insulating layer, where the contact pad has a top metal layer of copper. The via creates an opening over the top metal layer. The sacrificial dielectric cap is over at least the top metal layer.
    Type: Application
    Filed: October 11, 2005
    Publication date: April 12, 2007
    Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Donna Zupanski-Nielsen, William Landers, Ian Melville, Roger Quon, Timothy Daubenspeck, Kamalesh Srivastava, Mary Cullinan-Scholl, Lawrence Clevenger, Christopher Muzzy
  • Publication number: 20070007665
    Abstract: An electrical structure and method comprising a first substrate electrically and mechanically connected to a second substrate. The first substrate comprises a first electrically conductive pad and a second electrically conductive pad. The second substrate comprises a third electrically conductive pad, a fourth electrically conductive pad, and a first electrically conductive member. The fourth electrically conductive pad comprises a height that is different than a height of the first electrically conductive member. The electrically conductive member is electrically and mechanically connected to the fourth electrically conductive pad. A first solder ball connects the first electrically conductive pad to the third electrically conductive pad. The first solder ball comprises a first diameter. A second solder ball connects the second electrically conductive pad to the first electrically conductive member. The second solder ball comprises a second diameter. The first diameter is greater than said second diameter.
    Type: Application
    Filed: July 5, 2005
    Publication date: January 11, 2007
    Applicant: INTERANTIONAL BUSINESS MACHINES CORPORATION
    Inventors: Lawrence Clevenger, Mukta Farooq, Louis Hsu, William Landers, Donna Zupanski-Nielsen, Carl Radens, Chih-Chao Yang
  • Publication number: 20050242414
    Abstract: An interlevel dielectric layer (ILD) comprises a low-k dielectric layer; and a low-k dielectric film, deposited under compressive stress, atop the dielectric layer. The dielectric layer comprises a low-k material, such as an organosilicon glass (OSG) or a SiCOH material. The dielectric film has a thickness, which is 2%-10% of the thickness of the dielectric layer, has a similar chemical composition to the dielectric layer, but has a different morphology than the dielectric layer. The dielectric film is deposited under compressive stress, in situ, at or near the end of the dielectric layer deposition by altering a process that was used to deposit the low-k dielectric layer.
    Type: Application
    Filed: April 28, 2004
    Publication date: November 3, 2005
    Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Matthew Angyal, Edward Barth, Sanjit Das, Charles Davis, Habib Hichri, William Landers, Jia Lee
  • Publication number: 20050074959
    Abstract: A method for sealing an exposed surface of a wire bond pad with a material that is capable of preventing a possible chemical attack during electroless deposition of Ni/Au pad metallurgy is provided. Specifically, the present invention provides a method whereby a TiN/Ti or TiN/Al cap is used as a protective coating covering exposed surfaces of a wire bond pad. The TiN/Ti or TiN/Al cap is not affected by alkaline chemistries used in forming the Ni/Au metallization, yet it provides a sufficient electrical pathway connecting-the bond pads to the Ni/Au pad metallization.
    Type: Application
    Filed: October 1, 2003
    Publication date: April 7, 2005
    Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Lloyd Burrell, Charles Davis, Ronald Goldblatt, William Landers, Sanjay Mehta