Abstract: A pressure washer for dispensing either water or a water-chemical mixture includes an injector for injecting chemical into water flowing through a hose at a relatively high flow rate. A sprayer connected to the hose has a passage having one upstream, one middle, and first and second downstream portions. The first downstream portion is connected to a high pressure conduit and the second downstream portion is connected to a high flow conduit less resistance to fluid flow than the high pressure conduit. A valve between the upstream portion and the middle portion selectively allows fluid flow to the middle portion of the passage. Another valve between the middle portion and downstream portion selectively allows flow to the second downstream portion and high flow conduit. Otherwise the valve directs flow through only the first downstream portion and high pressure conduit, which limits flow rate so as not to activate the injector.

Abstract: A method of locating and characterizing defects on semiconductor using a scanner device and a high-magnification imaging device comprises the steps of scanning (A) a test wafer a plurality of times with the scanner device, recording the scanner device coordinates of defects and the markers in the standard patterns, analyzing the coordinates to identify the standard patterns and; loading and aligning (B) the test wafer in both the average predicted coordinates and the actual coordinates for each of the located patterns, and then averaging over the multiple sets of actual coordinates; then using a non-linear least-squares program to calculate a set of alignment transformation parameters that converts the average predicted coordinates as nearly as possible to the actual coordinates.