Patents by Inventor William M. Lamanna

William M. Lamanna has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7547732
    Abstract: Described are monomeric fluorochemical surfactants having two perfluoroalkyl sulfonamido segments and two hydrophilic group, which are more efficient and effective in lowering the surface tension of organic solvents and water compared to other C4-based fluorochemical surfactants.
    Type: Grant
    Filed: August 30, 2005
    Date of Patent: June 16, 2009
    Assignee: 3M Innovative Properties Company
    Inventors: George G. I. Moore, William M. Lamanna, Michael S. Terrazas, Rudolf J. Dams, Johan E. De Witte
  • Patent number: 7517604
    Abstract: An electrolyte membrane is formed by an acidic polymer and a low-volatility acid that is fluorinated, substantially free of basic groups, and is either oligomeric or non-polymeric.
    Type: Grant
    Filed: September 19, 2005
    Date of Patent: April 14, 2009
    Assignee: 3M Innovative Properties Company
    Inventors: Steven J. Hamrock, James M. Larson, Phat T. Pham, Matthew H. Frey, Gregory M. Haugen, William M. Lamanna
  • Publication number: 20090053589
    Abstract: Disclosed are electrochemical cells that include electrodes comprising an electrolyte comprising a vinylene carbonate or a halogenated ethylene carbonate, composite electrodes, and a binder.
    Type: Application
    Filed: August 22, 2007
    Publication date: February 26, 2009
    Inventors: Mark N. Obrovac, Leif Christensen, Phat T. Pham, William M. Lamanna
  • Publication number: 20080206631
    Abstract: Electrochemical cells are disclosed that include electrodes comprising a composite that includes an active material, graphite and a binder. The amount of graphite in the composite is greater than about 20 volume percent of the total volume of the active material and graphite in the composite. The porosity of the composite is less than about 20%. The cells also comprise an electrolyte that includes a vinylene carbonate derivative or a halogenated ethylene carbonate derivative.
    Type: Application
    Filed: July 12, 2007
    Publication date: August 28, 2008
    Inventors: Leif Christensen, Mark N. Obrovac, Phat T. Pham, William M. Lamanna
  • Publication number: 20080160419
    Abstract: Electrolyte solutions for an electrochemical energy device, including a lithium secondary battery, comprising (a) a supporting electrolyte salt and (b) a solvent composition comprising (1) at least one of a cyclic carbonic acid ester solvent and (2) at least one fluorine-containing solvent having a boiling point of at least 80° C.
    Type: Application
    Filed: February 3, 2006
    Publication date: July 3, 2008
    Inventors: Haruki Segawa, William M. Lamanna, Michael G. Costello
  • Patent number: 7361706
    Abstract: A water- and oil-repellent, antistatic composition comprises (a) at least one nonpolymeric ionic salt consisting of (i) at least one cation selected from the group consisting of monovalent metal cations, divalent metal cations, and organic onium cations, and (ii) at least one weakly coordinating anion, the conjugate acid of the anion having an acidity greater than or equal to that of a hydrocarbon sulfonic acid, and with the proviso that the anion is organic or fluoroorganic when the cation is a metal; (b) at least one fluorochemical repellency-imparting additive or repellent; and (c) at least one insulating material. The composition exhibits good antistatic and repellency characteristics.
    Type: Grant
    Filed: February 24, 2004
    Date of Patent: April 22, 2008
    Assignee: 3M Innovative Properties Company
    Inventors: Delton R. Thompson, Thomas P. Klun, William M. Lamanna
  • Patent number: 7294610
    Abstract: Described are anionic N-substituted fluorinated sulfonamide surfactants, and use thereof in cleaning and in acid etch solutions. The cleaning and etch solutions are used with a wide variety of substrates, for example, in the cleaning and etching of silicon oxide-containing substrates.
    Type: Grant
    Filed: March 3, 2004
    Date of Patent: November 13, 2007
    Assignee: 3M Innovative Properties Company
    Inventors: Patricia M. Savu, William M. Lamanna, Michael J. Parent
  • Publication number: 20070196727
    Abstract: Provided is a rechargeable lithium-ion cell that contains a positive electrode, a negative electrode, a charge-carrying electrolyte containing a charge carrying medium and a lithium salt, and a triphenylamine compound dissolved in or dissolvable in the electrolyte. The triphenylamine compound has an oxidation potential above the positive electrode recharged potential and serves as a cyclable redox chemical shuttle providing cell overcharge protection. Also provided are methods for manufacturing a rechargeable lithium-ion cell.
    Type: Application
    Filed: February 5, 2007
    Publication date: August 23, 2007
    Inventors: Richard L. Wang, Claudia Buhrmester, William M. Lamanna, Jeffrey R. Dahn
  • Patent number: 7147767
    Abstract: The present invention provides plating solutions having either copper bis(perfluoroalkanesulfonyl) imides or copper tris(perfluoroalkanesulfonyl) methides and methods of electrochemically or chemically depositing copper interconnects using these plating solutions.
    Type: Grant
    Filed: December 16, 2002
    Date of Patent: December 12, 2006
    Assignee: 3M Innovative Properties Company
    Inventors: Steven D. Boyd, Susrut Kesari, William M. Lamanna, Michael J. Parent, Lawrence A. Zazzera, Haiyan Zhang
  • Patent number: 7122294
    Abstract: Photoacid generators (PAGs) comprising photoactive moieties and perfluorinated, multifunctional anionic moieties (or incipient anionic moieties) are disclosed which provide photoacids with high acid strength, low volatility and low diffusivity. The present invention further relates to photoacid generators as they are used in photoinitiated or acid-catalyzed processes for uses such as photoresists for microlithography and photopolymerization.
    Type: Grant
    Filed: May 22, 2003
    Date of Patent: October 17, 2006
    Assignee: 3M Innovative Properties Company
    Inventor: William M. Lamanna
  • Patent number: 7101492
    Abstract: Novel aqueous, acid etch solutions comprising a fluorinated surfactant are provided. The etch solutions are used with a wide variety of substrates, for example, in the etching of silicon oxide-containing substrates.
    Type: Grant
    Filed: March 16, 2005
    Date of Patent: September 5, 2006
    Assignee: 3M Innovative Properties Company
    Inventors: Michael J. Parent, Patricia M. Savu, Richard M. Flynn, Zhongxing Zhang, William M. Lamanna, Zai-Ming Qiu, George G. I. Moore
  • Patent number: 7078444
    Abstract: Photoacid generator salts comprising photoactive cationic moieties and segmented, highly fluorinated-hydrocarbon anionic moieties are disclosed which provide high photoacid strength and can be tailored for solubility and polarity. The present invention further relates to photoacid generators as they are used in photoinitiated acid-catalyzed processes for uses such as photoresists for microlithography and photopolymerization.
    Type: Grant
    Filed: January 5, 2005
    Date of Patent: July 18, 2006
    Assignee: 3M Innovative Properties Company
    Inventors: William M. Lamanna, Gregory D. Clark, Richard M. Flynn, Zai-Ming Qiu
  • Patent number: 7030067
    Abstract: The present invention provides for the use of bis(perfluoroalkanesulfonyl)imide and its salts as surfactants or additives applications having an extreme environment.
    Type: Grant
    Filed: February 24, 2003
    Date of Patent: April 18, 2006
    Assignee: 3M Innovative Properties Company
    Inventors: William M. Lamanna, Patricia M. Savu, Michael J. Parent, Lawrence A. Zazzera
  • Patent number: 6924329
    Abstract: A water- and oil-repellent, antistatic composition comprises (a) at least one polymeric salt consisting of (i) at least one cation having at least one polyoxyalkylene moiety bonded to a cationic nitrogen center, and (ii) at least one weakly coordinating anion, the conjugate acid of the anion having an acidity greater than or equal to that of a hydrocarbon sulfonic acid; (b) at least one fluorochemical repellent; and (c) at least one insulating material. The composition exhibits good antistatic and repellency characteristics.
    Type: Grant
    Filed: November 5, 2001
    Date of Patent: August 2, 2005
    Assignee: 3M Innovative Properties Company
    Inventors: Thomas P. Klun, William M. Lamanna
  • Patent number: 6890452
    Abstract: Novel aqueous, acid etch solutions comprising a fluorinated surfactant are provided. The etch solutions are used with a wide variety of substrates, for example, in the etching of silicon oxide-containing substrates.
    Type: Grant
    Filed: November 8, 2002
    Date of Patent: May 10, 2005
    Assignee: 3M Innovative Properties Company
    Inventors: Michael J. Parent, Patricia M. Savu, Richard M. Flynn, Zhongxing Zhang, William M. Lamanna, Zai-Ming Qiu, George G. I. Moore
  • Patent number: 6884338
    Abstract: The present invention provides methods of polishing and/or cleaning copper interconnects using bis(perfluoroalkanesulfonyl) imide acids or copper tris(perfluoroalkanesulfonyl) methide acids compositions.
    Type: Grant
    Filed: December 16, 2002
    Date of Patent: April 26, 2005
    Assignee: 3M Innovative Properties Company
    Inventors: Susrut Kesari, William M. Lamanna, Michael J. Parent, Lawrence A. Zazzera
  • Patent number: 6858124
    Abstract: The present invention provides methods of polishing and/or cleaning copper interconnects using sulfonic acid compositions.
    Type: Grant
    Filed: December 16, 2002
    Date of Patent: February 22, 2005
    Assignee: 3M Innovative Properties Company
    Inventors: Lawrence A. Zazzera, Michael J. Parent, William M. Lamanna, Susrut Kesari
  • Patent number: 6841333
    Abstract: Photoacid generator salts comprising photoactive cationic moieties and segmented, highly fluorinated-hydrocarbon anionic moieties are disclosed which provide high photoacid strength and can be tailored for solubility and polarity. The present invention further relates to photoacid generators as they are used in photoinitiated acid-catalyzed processes for uses such as photoresists for microlithography and photopolymerization.
    Type: Grant
    Filed: November 1, 2002
    Date of Patent: January 11, 2005
    Assignee: 3M Innovative Properties Company
    Inventors: William M. Lamanna, Gregory D. Clark, Richard M. Flynn, Zai-Ming Qiu
  • Publication number: 20040234888
    Abstract: Photoacid generators (PAGs) comprising photoactive moieties and perfluorinated, multifunctional anionic moieties (or incipient anionic moieties) are disclosed which provide photoacids with high acid strength, low volatility and low diffusivity. The present invention further relates to photoacid generators as they are used in photoinitiated or acid-catalyzed processes for uses such as photoresists for microlithography and photopolymerization.
    Type: Application
    Filed: May 22, 2003
    Publication date: November 25, 2004
    Applicant: 3M Innovative Properties Company
    Inventor: William M. Lamanna
  • Patent number: 6784237
    Abstract: A water- and oil-repellent, antistatic composition comprises (a) at least one nonpolymeric ionic salt consisting of (i) at least one cation selected from the group consisting of monovalent metal cations, divalent metal cations, and organic onium cations, and (ii) at least one weakly coordinating anion, the conjugate acid of the anion having an acidity greater than or equal to that of a hydrocarbon sulfonic acid, and with the proviso that the anion is organic or fluoroorganic when the cation is a metal; (b) at least one fluorochemical repellency-imparting additive or repellent; and (c) at least one insulating material. The composition exhibits good antistatic and repellency characteristics.
    Type: Grant
    Filed: June 11, 2003
    Date of Patent: August 31, 2004
    Assignee: 3M Innovative Properties Company
    Inventors: Delton R. Thompson, Thomas P. Klun, William M. Lamanna