Abstract: Cosmetic assemblies are movable between a resting state and a compressed state. The cosmetic assemblies include an applicator and an actuator. The applicator is at least partially formed of a compressible material that is biased toward the resting state, and the actuator is configured to actuate the applicator between the resting state and the compressed state. In the resting state, the applicator displaces a first volume and has a first outer dimension. In the compressed state, the applicator displaces a second volume that is less than the first volume, and the applicator has a second outer dimension that corresponds to and exceeds the first outer dimension.

Abstract: A compact, high resolution, bright and long life modulator for projection displays, mates a field emission array (FEA) with a deformable light valve modulator (DLVM) of reflective operation in a thin vacuum package. The DLVM includes a continuous film mirror layer formed on or between one or more deformable layers on a transparent substrate. The field emitters (at least one per pixel) are driven to deliver primary electrons that strike and deposit a charge that produces electrostatic forces that locally deform the continuous film mirror layer. Because the mirror layer is a continuous film, i.e. not pixelated, the modulator resolution is limited only by the addressing resolution of the FEA. Mating the FEA and DLVM technologies also reduces the drive voltage requirements associated with typical FEA driven phosphor displays and scanned beam DLVMs thus improving their performance and extending the lifetime of each.

Abstract: A thin low power, paper white, direct-view display includes an array of bistable micromirrors that are deflected between two stable states, a dark state in which the mirror covers a portion of the background and a white state in which the mirror uncovers the background. The drive electronics are similar to those used in multiplexed LDCs but are modified in order to drive the micromirrors to one of their two stable states. The micromirrors in the enabled row are attracted up or down with sufficient force to exceed the micromirrors' bistable threshold and deflect the micromirrors to their dark and white states, respectively. The attractive forces on the micromirrors in the remaining non-enabled rows are insufficient to exceed the micromirrors' bistable threshold so that the micromirrors remain in their current stable state.

Abstract: A membrane-actuated charge controlled mirror (CCM) that exhibits increased deflection range, reduced beam current and improved electrostatic stability is fabricated using a combination of flat panel manufacturing along with traditional MEMS techniques. More specifically, a unique combination of five masking layers is used to fabricate a number of CCMs on a large glass panel. At the completion of the MEMS processing, the glass panel is diced into individual CCMs. Thereafter, the polymer mirror and membrane release layers are simultaneously released through vent holes in the membrane to leave the free-standing CCM.

Abstract: A micromirror light valve target configuration that overcomes the problems of limited deflection range, electrostatic and resolution by forming the secondary electron collector grid of a fine conductive mesh and placing it in close proximity to the micromirror array. The source, preferably a fixed beam array, addresses the micromirror array such that it exhibits a secondary emission coefficient less than one to write a negative charge pattern onto the mirrors so that they are attracted to the collector grid. If the anode is also in close proximity to the array, the mirrors can be addressed so that they deflect up toward the grid and down toward the anode thereby increasing the deflection range.

Abstract: A thin low power, paper white, direct-view display includes an array of bistable micromirrors that are deflected between two stable states, a dark state in which the mirror covers a portion of the background and a white state in which the mirror uncovers the background. The drive electronics are similar to those used in multiplexed LCDs but are modified in order to drive the micromirrors to one of their two stable states. The micromirrors in the enabled row are attracted up or down with sufficient force to exceed the micromirrors' bistable threshold and deflect the micromirrors to their dark and white states, respectively. The attractive forces on the micromirrors in the remaining non-enabled rows are insufficient to exceed the micromirrors' bistable threshold so that the micromirrors remain in their current stable state.

Abstract: A bright, high contrast, compact, large area, high-resolution light modulator uses a field emitter array (FEA) to address a charge controlled mirror (CCM). The FEA deposits a charge pattern onto the CCM, which in turn produces electrostatic forces that deflect the micromirrors in accordance with the amount of accumulated charge. The CCM that is used in combination with the FEA can be configured in many different ways to implement different actuation modes, e.g. attractive, repulsive, grid-actuated or membrane-actuated and different charge control modes, e.g. RC decay, RC sustain and charge control.

Abstract: A flat-panel direct view display positions an array of electrostatically-actuated cantilevered micromirrors in front of a contrasting background and opposite a flat-panel electron beam source. Depending upon the display configuration, the electron beam source addresses either the array of micromirrors or a reference surface a row at a time while the other is held at a reference potential. The electron beams modulate the potential difference between each micromirror and the reference surface thereby adjusting the magnitude of the attractive electrostatic force between the two. This in turn modulates the deflection of the micromirrors between their quiescent and fully actuated states to selectively cover and uncover the background thereby producing a grey scale direct-view image.

Abstract: The present invention provides a Schlieren projection system with a large aperture reflective imager. The combination of a beam-addressed CCM design with flat-panel manufacturing techniques configuration produces a large aperture imager that overcomes the problems of limited deflection range, high beam current, electrostatic instability and limited resolution associated with known electrostatically-actuated micromirror targets. The CCM imager includes a thin insulating membrane that decouples the electron beam from the micromirror array. Decoupling also allows the mirror to be designed to optimize reflectivity, exhibit a higher resonant frequency for better video performance, and be fabricated simultaneously with the hinges. The CCM imager is fabricated using flat-panel manufacturing techniques that are ideally suited to producing large aperture devices at low cost.

Abstract: A beam addressed electrostatically-actuated charge controlled mirror (CCM) with frame time utilization approaching 100% is provided by partially coating the CCM's pixelized beam addressing surface with a material having the opposite electron affinity. Each pixel of the pixelized beam addressing surface has first and second portions that exhibit secondary emission coefficients that are respectively less than and greater than one for the same beam energy. A beam or beams that are capable of subpixel resolution selectively address each pixel's first and second portions to control the amount of charge on the pixelized beam addressing surface and its localized potentials.

Abstract: An electrostatically actuated micromirror light modulator that exhibits increased deflection range, better charge efficiency and improved electrostatic stability. A thin insulating membrane decouples the electron beam from the micromirror array inside the vacuum cell. The membrane is just thick enough to stop the incident electrons from penetrating through to the mirrors but is thin enough to maintain resolution of the deposited charge pattern. An equipotential layer beneath the mirror array prevents any attractive force from being developed due to the accumulation of static charge on the surface of the light modulator that may otherwise cause the mirror to snap-over and become stuck to the substrate.

Abstract: Apparatus and method for repairing semiconductor masks and reticles is disclosed, utilizing a focused ion beam system capable of delivering, from a single ion beam column, several different species of focused ion beams, each of which is individually optimized to meet the differing requirements of the major functions to be performed in mask repair. This method allows the mask to be imaged with high resolution and minimum mask damage. Opaque defects are removed by sputter etching at high rates with minimum damage to the mask substrate, and clear defects are filled in at high rates directly from the beam by deposition of a metallic or other substance compatible with the mask materials. A focused ion beam column able to produce precisely focused ion beams is employed and is operated at high energies for imaging and sputter etching, and at low energies for imaging and deposition. A liquid metal alloy source containing suitable atomic species is employed.

Abstract: Apparatus and method for repairing semiconductor masks and reticles is disclosed, utilizing a focused ion beam system capable of delivering, from a single ion beam column, several different species of focused ion beams, each of which is individually optimized to meet the differing requirements of the major functions to be performed in mask repair. This method allows the mask to be imaged with high resolution and minimum mask damage. Opaque defects are removed by sputter etching at high rates with minimum damage to the mask substrate, and clear defects are filled in at high rates directly from the beam by deposition of a metallic or other substance compatible with the mask materials. A focused ion beam column able to produce precisely focused ion beams is employed and is operated at high energies for imaging and sputter etching, and at low energies for imaging and deposition. A liquid metal alloy source containing suitable atomic species is employed.

Abstract: A focused ion beam optical column includes asymmetrical three-element electrostatic upper and lower lenses, a velocity filter, an electrostatic blanker, and an electrostatic octopole deflector for maskless ion implantation, resist exposure, repair of x-ray and photo masks, micromachining, and scanning ion microscopy and microanalysis. A constant and relatively high beam energy is maintained through the mass filter and blanker. The column produces a focused beam over a wide range of final beam voltages, with the particular voltage range determined by the dimensions of three components in the column. A large working distance between the main deflector and target is provided to allow for the insertion of imaging and/or charge neutralization optics.

Abstract: A hydraulic servovalve including a valve body, a spool bore in the valve body, a spool in the spool bore, inlet and outlet conduits in the valve body, control conduits in the valve body, annular grooves on the spool for providing fluid flow paths between the inlet and outlet conduits and the control conduits, bores extending through the spool for providing additional fluid flow paths in addition to the fluid flow paths through the annular grooves, an inclined base on the valve body, a torque motor mounted on the inclined base, a flapper bore extending through the valve body transversely to the inclined base and lying in line with a diameter of the spool bore, a flapper in the flapper bore, and a filter bore in the valve body located laterally of the spool bore.

Abstract: An integrated charge neutralization and imaging system is disclosed. An energy analyzer is mounted directed above a target surface consisting of a 90 degree spherical electrostatic capacitor with variable voltage on both the inner and outer electrodes. Circular apertures are mounted at the entrance and exit of the analyzer to limit the fringing electric fields and define the beam size. An electrostatic lenses is used for focusing the beam from the electron gun into the virtual object plane of the energy analyzer. It is also used to collect secondary electrons or secondary ions leaving the energy analyzer and focused them into the imaging optics. A defector is used for steering the electron beam onto the axis of the lens. This deflector is also used to steer the secondary electrons or secondary ions into the electron/ion detector, or to steer the secondary ions into the SIMS mass filter entrance aperture.

Abstract: Thermionic cathode 12 for a plasma ion source 10 has tungsten wire 64 advanced by wheels 56 from supply 50 to take-up spool 58. In chamber 48, the active cathode region 64 acts with anode 16 to supply electrons for ionizing a fuel gas so the ions are discharged from slit 18 for acceleration, separation and implantation.

Abstract: A bi-stable electrically operated valve including a housing having inlet, outlet and return conduits, an intermediate conduit between the inlet and return conduits, a bi-stable electro-mechanical transducer having a flapper slidably mounting a first ball valve, first and second seats on the intermediate conduit, a third seat on the outlet conduit, the first and third seats being alternately engageable by the first ball valve to permit communication between the inlet and outlet conduits when the valve is open or between the inlet and return conduits when the valve is closed, a second ball valve, a piston for moving the second ball valve onto the second seat on the intermediate conduit, a conduit for effecting communication between the outlet conduit and the piston so as to cause the piston to drive the second ball valve onto the second seat when the inlet and outlet conduits are in communication, to thereby close off the inlet conduit from the return conduit, and a bleed opening between the inlet conduit and t

Abstract: A plurality of beam generating units 76, 78, 80 and 82 each produces separated rectangular ion beams for implantation onto a targets 52 and 54 rotatively moving therepast. Each rectangular footprint is long in the direction of motion and is scanned transversely to the direction of motion. A plurality of beam generating units can be positioned adjacent to each other to multiply implant targets because of the compact structure of the separated ion source.

Abstract: The ion implantation system includes a separate vacuum housing 102 for the ion source and the target chamber 118. The ribbon beam ion source 10 provides a footprint 162 on the wafer wheel 126 of such shape as to permit short traverse of the wafer wheel 126 for full wafer scan.