Patents by Inventor William Park, Jr.

William Park, Jr. has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Ion implant apparatus and a method of implanting ions
    Patent number: 8759803
    Abstract: Ion implant apparatus using a drum-type scan wheel holds wafers with a total cone angle less than 60°. A collimated scanned beam of ions, for example H+, is directed along a final beam path which is at an angle of at least 45° to the axis of rotation of the scan wheel. Ions are extracted from a source and accelerated along a linear acceleration path to a high implant energy (more than 500 keV) before scanning or mass analysis. The mass analyzer may be located near the axis of rotation and unwanted ions are directed to an annular beam dump which may be mounted on the scan wheel.
    Type: Grant
    Filed: January 16, 2014
    Date of Patent: June 24, 2014
    Assignee: GTAT Corporation
    Inventors: Theodore Smick, Geoffrey Ryding, Hilton Glavish, Takao Sakase, William Park, Jr., Paul Eide, Drew Arnold, Ronald Horner, Joseph Gillespie
  • ION IMPLANT APPARATUS AND A METHOD OF IMPLANTING IONS
    Publication number: 20140130741
    Abstract: Ion implant apparatus using a drum-type scan wheel holds wafers with a total cone angle less than 60°. A collimated scanned beam of ions, for example H+, is directed along a final beam path which is at an angle of at least 45° to the axis of rotation of the scan wheel. Ions are extracted from a source and accelerated along a linear acceleration path to a high implant energy (more than 500 keV) before scanning or mass analysis. The mass analyzer may be located near the axis of rotation and unwanted ions are directed to an annular beam dump which may be mounted on the scan wheel.
    Type: Application
    Filed: January 16, 2014
    Publication date: May 15, 2014
    Applicant: GTAT CORPORATION
    Inventors: Theodore Smick, Geoffrey Ryding, Hilton Glavish, Takao Sakase, William Park, JR., Paul Eide, Drew Arnold, Ronald Horner, Joseph Gillespie
  • Ion implant apparatus and a method of implanting ions
    Patent number: 8633458
    Abstract: Ion implant apparatus using a drum-type scan wheel holds wafers with a total cone angle less than 60°. A collimated scanned beam of ions, for example H+, is directed along a final beam path which is at an angle of at least 45° to the axis of rotation of the scan wheel. Ions are extracted from a source and accelerated along a linear acceleration path to a high implant energy (more than 500 keV) before scanning or mass analysis. The mass analyzer may be located near the axis of rotation and unwanted ions are directed to an annular beam dump which may be mounted on the scan wheel.
    Type: Grant
    Filed: November 15, 2011
    Date of Patent: January 21, 2014
    Assignee: GTAT Corporation
    Inventors: Theodore Smick, Geoffrey Ryding, Hilton Glavish, Takao Sakase, William Park, Jr., Paul Eide, Drew Arnold, Ronald Horner, Joseph Gillespie
  • Ion Implant Apparatus and a Method of Implanting Ions
    Publication number: 20130119263
    Abstract: Ion implant apparatus using a drum-type scan wheel holds wafers with a total cone angle less than 60°. A collimated scanned beam of ions, for example H+, is directed along a final beam path which is at an angle of at least 45° to the axis of rotation of the scan wheel. Ions are extracted from a source and accelerated along a linear acceleration path to a high implant energy (more than 500 keV) before scanning or mass analysis. The mass analyzer may be located near the axis of rotation and unwanted ions are directed to an annular beam dump which may be mounted on the scan wheel.
    Type: Application
    Filed: November 15, 2011
    Publication date: May 16, 2013
    Applicant: Twin Creeks Technologies, Inc.
    Inventors: Theodore Smick, Geoffrey Ryding, Hilton Glavish, Takao Sakase, William Park, JR., Paul Eide, Drew Arnold, Ronald Horner, Joseph Gillespie
  • ION IMPLANT APPARATUS AND METHOD OF ION IMPLANTATION
    Publication number: 20130056655
    Abstract: An apparatus and a method of ion implantation using a rotary scan assembly having an axis of rotation and a periphery. A plurality of substrate holders is distributed about the periphery, and the substrate holders are arranged to hold respective planar substrates. Each planar substrate has a respective geometric center on the periphery. A beam line assembly provides a beam of ions for implantation in the planar substrates on the holders. The beam line assembly is arranged to direct said beam along a final beam path.
    Type: Application
    Filed: September 7, 2011
    Publication date: March 7, 2013
    Applicant: TWIN CREEKS TECHNOLOGIES, INC.
    Inventors: Theodore Smick, Geoffrey Ryding, Takao Sakase, William Park, JR., Joseph Gillespie, Ronald Horner, Paul Eide
  • Ion implant apparatus and method of ion implantation
    Patent number: 8378317
    Abstract: An apparatus and a method of ion implantation using a rotary scan assembly having an axis of rotation and a periphery. A plurality of substrate holders is distributed about the periphery, and the substrate holders are arranged to hold respective planar substrates. Each planar substrate has a respective geometric center on the periphery. A beam line assembly provides a beam of ions for implantation in the planar substrates on the holders. The beam line assembly is arranged to direct said beam along a final beam path.
    Type: Grant
    Filed: September 7, 2011
    Date of Patent: February 19, 2013
    Assignee: GTAT Corporation
    Inventors: Theodore Smick, Geoffrey Ryding, Takao Sakase, William Park, Jr., Joseph Gillespie, Ronald Horner, Paul Eide