Patents by Inventor William Partlo

William Partlo has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20070002919
    Abstract: A line narrowed gas discharge laser system and method of operating same is disclosed which may comprise a dispersive center wavelength selective element; a beam expander comprising a plurality of refractive elements; a refractive element positioning mechanism positioning at least one of the refractive elements to modify an angle of incidence of a laser light beam on the dispersive center wavelength selection element; each of the dispersive center wavelength selection element and the beam expander being aligned with each other and with a housing containing at least the dispersive center wavelength selection element; a housing positioning mechanism positioning the housing with respect to an optical axis of the gas discharge laser system. The dispersive element may comprise a grating and the beam expander may comprise a plurality of prisms. The housing may contain the dispersive center wavelength selective element and the beam expander. The housing positioning element may comprise a position locking mechanism.
    Type: Application
    Filed: June 30, 2005
    Publication date: January 4, 2007
    Applicant: Cymer, Inc.
    Inventors: Raymond Cybulski, Robert Bergstedt, William Partlo, Richard Sandstrom, Gon Wang
  • Publication number: 20060291517
    Abstract: A pulsed gas discharge laser operating at an output laser pulse repetition rate of greater than 4 kHz and a method of operating same is disclosed which may comprise a high voltage electrode having a longitudinal extent; a main insulator electrically insulating the high voltage electrode from a grounded gas discharge chamber; a preionizer longitudinally extending along at least a portion of the longitudinal extent of the high voltage electrode; a preionization shim integral with the electrode extending toward the preionizer. The preionizer may be formed integrally with the main insulator. The preionization shim may substantially cover the gap between the electrode and the preionizer.
    Type: Application
    Filed: June 27, 2005
    Publication date: December 28, 2006
    Applicant: Cymer, Inc.
    Inventors: Walter Gillespie, Thomas Steiger, Richard Ujazdowski, William Partlo
  • Publication number: 20060289808
    Abstract: An EUV light source collector erosion mitigation system and method is disclosed which may comprise a collector comprising a multilayered mirror collector comprising a collector outer surface composed of a capping material subject to removal due to a removing interaction with materials created in an EUV light-creating plasma; a replacement material generator positioned to deliver replacement material comprising the capping material to the collector outer surface at a rate sufficient to replace the capping material removed due to the removing interaction. The replacement material generator may comprise a plurality of replacement material generators positioned to respectively deliver replacement material to a selected portion of the collector outer surface, which may comprise a sputtering mechanism sputtering replacement capping material onto the collector outer surface.
    Type: Application
    Filed: September 28, 2005
    Publication date: December 28, 2006
    Applicant: Cymer, Inc.
    Inventors: William Partlo, Alexander Ershov, Igor Fomenkov
  • Publication number: 20060227839
    Abstract: A line narrowed gas discharge laser system and method of operation are disclosed which may comprise: an oscillator cavity; a laser chamber comprising a chamber housing containing a lasing medium gas; at least one peaking capacitor electrically connected to the chamber housing and to a first one of a pair of electrodes; a second one of the pair of electrodes connected to an opposite terminal of the at least one peaking capacitor; a current return path connected to the chamber housing; the one terminal, the first one of the electrodes, the lasing medium gas, the second one of the electrodes, the current return path and the second terminal forming a head current inductive loop having an inductance unique to the particular head current inductive loo; a spectral quality tuning mechanism comprising a mechanism for changing the particular head current inductive loop inductance value for the particular head current inductance loop.
    Type: Application
    Filed: March 31, 2005
    Publication date: October 12, 2006
    Applicant: Cymer, Inc.
    Inventors: Herve Besaucele, Igor Fomenkov, William Partlo, Fedor Trintchouk, Hao Ton That
  • Publication number: 20060219957
    Abstract: An EUV light source is disclosed that may include a laser source, e.g. CO2 laser, a plasma chamber, and a beam delivery system for passing a laser beam from the laser source into the plasma chamber. Embodiments are disclosed which may include one or more of the following; a bypass line may be provided to establish fluid communication between the plasma chamber and the auxiliary chamber, a focusing optic, e.g. mirror, for focusing the laser beam to a focal spot in the plasma chamber, a steering optic for steering the laser beam focal spot in the plasma chamber, and an optical arrangement for adjusting focal power.
    Type: Application
    Filed: February 21, 2006
    Publication date: October 5, 2006
    Applicant: Cymer, Inc.
    Inventors: Alexander Ershov, William Partlo, Norbert Bowering, Bjorn Hansson
  • Publication number: 20060209917
    Abstract: The present invention provides a control system for a modular high repetition rate two discharge chamber ultraviolet gas discharge laser. In preferred embodiments, the laser is a production line machine with a master oscillator producing a very narrow band seed beam which is amplified in the second discharge chamber. Novel control features specially adapted for a two-chamber gas discharge laser system include: (1) pulse energy controls, with nanosecond timing precision (2) precision pulse to pulse wavelength controls with high speed and extreme speed wavelength tuning (3) fast response gas temperature control and (4) F2 injection controls with novel learning algorithm.
    Type: Application
    Filed: March 15, 2006
    Publication date: September 21, 2006
    Applicant: Cymer, Inc.
    Inventors: John Fallon, John Rule, Robert Jacques, Jacob Lipcon, William Partlo, Alexander Ershov, Toshihiko Ishihara, John Meisner, Richard Ness, Paul Melcher
  • Publication number: 20060192151
    Abstract: Systems and methods are disclosed for protecting an EUV light source plasma production chamber optical element surface from debris generated by plasma formation. In one aspect of an embodiment of the present invention, a shield is disclosed which comprises at least one hollow tube positioned between the optical element and a plasma formation site. The tube is oriented to capture debris while allowing light to pass through the tube's lumen via reflection at relatively small angles of grazing incidence. In another aspect of an embodiment of the present invention, a shield is disclosed which is heated to a temperature sufficient to remove one or more species of debris material that has deposited on the shield. In yet another aspect of an embodiment of the present invention, a system is disclosed which a shield is moved from a light source plasma chamber to a cleaning chamber where the shield is cleaned.
    Type: Application
    Filed: February 25, 2005
    Publication date: August 31, 2006
    Applicant: Cymer, Inc.
    Inventors: Norbert Bowering, Bjorn Hansson, Alexander Bykanov, Oleh Khodykin, Alexander Ershov, William Partlo
  • Publication number: 20060192154
    Abstract: An EUV plasma formation target delivery system and method is disclosed which may comprise: a target droplet formation mechanism comprising a magneto-restrictive or electro-restrictive material, a liquid plasma source material passageway terminating in an output orifice; a charging mechanism applying charge to a droplet forming jet stream or to individual droplets exiting the passageway along a selected path; a droplet deflector intermediate the output orifice and a plasma initiation site periodically deflecting droplets from the selected path, a liquid target material delivery mechanism comprising a liquid target material delivery passage having an input opening and an output orifice; an electromotive disturbing force generating mechanism generating a disturbing force within the liquid target material, a liquid target delivery droplet formation mechanism having an output orifice; and/or a wetting barrier around the periphery of the output orifice.
    Type: Application
    Filed: February 25, 2005
    Publication date: August 31, 2006
    Applicant: Cymer, Inc.
    Inventors: J. Algots, Igor Fomenkov, Alexander Ershov, William Partlo, Richard Sandstrom, Oscar Hemberg, Alexander Bykanov, Dennis Cobb
  • Publication number: 20060146906
    Abstract: An apparatus and method is disclosed which may comprise an EUV drive laser system comprising: a solid state seed laser master oscillator laser; a gas discharge excimer laser gain generator producing a drive laser output light beam. The solid state seed laser may comprise a third harmonic Nd:YLF laser, which may be tunable. The gas discharge excimer gain generator laser may comprise a XeF excimer laser power amplifier or power oscillator. The solid state laser may comprise a tunable laser tuned by changing the temperature of a laser crystal comprising the solid state laser, or by utilizing a wavelength selection element, e.g., a Lyot filter or an etalon.
    Type: Application
    Filed: December 29, 2005
    Publication date: July 6, 2006
    Applicant: Cymer, Inc.
    Inventors: Daniel Brown, Alexander Ershov, Vladimir Fleurov, Igor Fomenkov, William Partlo
  • Publication number: 20060146900
    Abstract: A method and apparatus are disclosed for controlling bandwidth in a multi-portion laser system comprising a first line narrowed oscillator laser system portion providing a line narrowed seed pulse to an amplifier laser system portion, may comprise utilizing a timing difference curve defining a relationship between a first laser system operating parameter other than bandwidth and the timing difference and also a desired point on the curve defining a desired timing difference, wherein each unique operating point on the curve corresponds to a respective bandwidth value; determining an actual offset from the timing difference at the desired point on the curve to an actual operating point on the curve; determining an error between the actual offset and a desired offset corresponding to a desired bandwidth; modifying the firing differential timing to remove the error between the actual offset and the desired offset.
    Type: Application
    Filed: December 29, 2005
    Publication date: July 6, 2006
    Applicant: Cymer, Inc.
    Inventors: Robert Jacques, William Partlo, Daniel Brown
  • Publication number: 20060131515
    Abstract: A method and apparatus for debris removal from a reflecting surface of an EUV collector in an EUV light source is disclosed which may comprise the reflecting surface comprises a first material and the debris comprises a second material and/or compounds of the second material, the system and method may comprise a controlled sputtering ion source which may comprise a gas comprising the atoms of the sputtering ion material; and a stimulating mechanism exciting the atoms of the sputtering ion material into an ionized state, the ionized state being selected to have a distribution around a selected energy peak that has a high probability of sputtering the second material and a very low probability of sputtering the first material. The stimulating mechanism may comprise an RF or microwave induction mechanism.
    Type: Application
    Filed: March 10, 2004
    Publication date: June 22, 2006
    Inventors: William Partlo, John Algots, Gerry Blumenstock, Norbert Bowering, Alexander Ershov, Igor Fomenkov, Xiaojiang Pan
  • Publication number: 20060126697
    Abstract: An oscillator-amplifier gas discharge laser system and method is disclosed which may comprise a first laser unit which may comprise a first discharge region which may contain an excimer or molecular fluorine lasing gas medium; a first pair of electrodes defining the first discharge region containing the lasing gas medium, a line narrowing unit for narrowing a spectral bandwidth of output laser light pulse beam pulses produced in said first discharge region; a second laser unit which may comprise a second discharge chamber which may contain an excimer or molecular fluorine lasing gas medium; a second pair of electrodes defining the second discharge region containing the lasing gas medium; a pulse power system providing electrical pulses to the first pair of electrodes and to the second pair of electrodes producing gas discharges in the lasing gas medium between the respective first and second pair of electrodes, and laser parameter control mechanism modifying a selected parameter of a selected laser output lig
    Type: Application
    Filed: February 1, 2006
    Publication date: June 15, 2006
    Applicant: Cymer, Inc.
    Inventors: David Knowles, Daniel Brown, Herve Besaucele, David Myers, Alexander Ershov, William Partlo, Richard Sandstrom, Palash Das, Stuart Anderson, Igor Fomenkov, Richard Ujazdowski, Eckehard Onkels, Richard Ness, Scott Smith, William Hulburd, Jeffrey Oicles
  • Publication number: 20060114956
    Abstract: A line narrowing apparatus and method for a narrow band DUV high power high repetition rate gas discharge laser producing output laser light pulse beam pulses in bursts of pulses is disclosed, which may comprise a dispersive center wavelength selection optic contained within a line narrowing module, selecting at least one center wavelength for each pulse determined at least in part by the angle of incidence of the laser light pulse beam containing the respective pulse on a dispersive wavelength selection optic dispersive surface; a first dispersive optic bending mechanism operatively connected to the dispersive center wavelength selection optic and operative to change the curvature of the dispersive surface in a first manner; and, a second dispersive optic bending mechanism operatively connected to the dispersive center wavelength selection optic and operative to change the curvature of the dispersive surface in a second manner.
    Type: Application
    Filed: November 30, 2004
    Publication date: June 1, 2006
    Inventors: Richard Sandstrom, William Partlo, Daniel Brown, J. Martin Algots, Fedor Trintchouk
  • Publication number: 20060114957
    Abstract: A line narrowing method and module for a narrow band DUV high power high repetition rate gas discharge laser producing output laser light pulse beam pulses in bursts of pulses, the module having a nominal optical path are disclosed which may comprise: a dispersive center wavelength selection optic moveably mounted within an optical path of the line narrowing module, selecting at least one center wavelength for each pulse determined at least in part by the angle of incidence of the laser light pulse beam containing the respective pulse on the dispersive wavelength selection optic; a first tuning mechanism operative in part to select the angle of incidence of the laser light pulse beam containing the respective pulse upon the dispersive center wavelength selection optic, by selecting an angle of transmission of the laser light pulse beam containing the pulse toward the dispersive center wavelength selection optic; a second tuning mechanism operative in part to select the angle of incidence of the laser light pu
    Type: Application
    Filed: November 30, 2004
    Publication date: June 1, 2006
    Inventors: J. Martin Algots, Robert Bergstedt, Walter Gillespie, Vladimir Kulgeyko, William Partlo, German Rylov, Richard Sandstrom, Brian Strate, Timothy Dyer
  • Publication number: 20060091109
    Abstract: A method and apparatus that may comprise an EUV light producing mechanism utilizing an EUV plasma source material comprising a material that will form an etching compound, which plasma source material produces EUV light in a band around a selected center wavelength comprising: an EUV plasma generation chamber; an EUV light collector contained within the chamber having a reflective surface containing at least one layer comprising a material that does not form an etching compound and/or forms a compound layer that does not significantly reduce the reflectivity of the reflective surface in the band; an etchant source gas contained within the chamber comprising an etchant source material with which the plasma source material forms an etching compound, which etching compound has a vapor pressure that will allow etching of the etching compound from the reflective surface. The etchant source material may comprises a halogen or halogen compound.
    Type: Application
    Filed: November 1, 2004
    Publication date: May 4, 2006
    Inventors: William Partlo, Richard Sandstrom, Igor Fomenkov, Alexander Ershov, William Oldham, William Marx, Oscar Hemberg
  • Publication number: 20050286598
    Abstract: An apparatus and method for providing bandwidth control in a narrow band short pulse duration gas discharge laser output light pulse beam producing system, producing a beam comprising laser output light pulses at a selected pulse repetition rate, is disclosed which may comprise a dispersive bandwidth selection optic selecting at least one center wavelength for each pulse determined at least in part by the angle of incidence of the laser light pulse beam containing the respective pulse on the dispersive wavelength selection optic; a tuning mechanism operative to select at least one angle of incidence of the a laser light pulse beam containing the respective pulse upon the dispersive center wavelength selection optic; the tuning mechanism comprising a plurality of incidence angle selection elements each defining an angle of incidence for a different spatially separated but not temporally separated portion of the laser light pulse to return from the dispersive center wavelength selection optic a laser light puls
    Type: Application
    Filed: June 23, 2004
    Publication date: December 29, 2005
    Inventors: Richard Sandstrom, Daniel Brown, Alexander Ershov, Igor Fomenkov, William Partlo
  • Publication number: 20050271109
    Abstract: An oscillator-amplifier gas discharge laser system and method is disclosed which may comprise a first laser unit which may comprise a first discharge region which may contain an excimer or molecular fluorine lasing gas medium; a first pair of electrodes defining the first discharge region containing the lasing gas medium, a line narrowing unit for narrowing a spectral bandwidth of output laser light pulse beam pulses produced in said first discharge region; a second laser unit which may comprise a second discharge chamber which may contain an excimer or molecular fluorine lasing gas medium; a second pair of electrodes defining the second discharge region containing the lasing gas medium; a pulse power system providing electrical pulses to the first pair of electrodes and to the second pair of electrodes producing gas discharges in the lasing gas medium between the respective first and second pair of electrodes, and laser parameter control mechanism modifying a selected parameter of a selected laser output lig
    Type: Application
    Filed: August 9, 2005
    Publication date: December 8, 2005
    Applicant: Cymer, Inc.
    Inventors: David Knowles, Daniel Brown, Herve Besaucele, David Myers, Alexander Ershov, William Partlo, Richard Sandstrom, Palash Das, Stuart Anderson, Igor Fomenkov, Richard Ujazdowski, Eckehard Onkels, Richard Ness, Scot Smith, William Hulburd, Jeffrey Oicles
  • Publication number: 20050269300
    Abstract: A high energy, high repetition rate workpiece surface heating method and apparatus are disclosed which may comprise a pulsed XeF laser operating at or above 4000 Hz and producing a laser output light pulse beam at a center wavelength of about 351 nm; an optical system narrowing the laser output light pulse beam to less than 20 ?m in a short axis of the laser output light pulse beam and expanding the laser output light pulse beam to form in a long axis of the beam a workpiece covering extent of the long axis; the optical system including a field stop intermediate the laser and the workpiece; the workpiece comprising a layer to be heated; wherein the optical system focuses the laser output light pulse beam at a field stop with a magnification sufficient to maintain an intensity profile that has sufficiently steep sidewalls to allow the field stop to maintain a sufficiently steep beam profile at the workpiece without blocking the beam profile at too high an intensity level. 2.
    Type: Application
    Filed: August 11, 2005
    Publication date: December 8, 2005
    Inventors: William Partlo, Palash Das, Russell Hudyma, Michael Thomas
  • Publication number: 20050269529
    Abstract: Systems and methods are disclosed for reducing the influence of plasma generated debris on internal components of an EUV light source. In one aspect, an EUV metrology monitor is provided which may have a heater to heat an internal multi-layer filtering mirror to a temperature sufficient to remove deposited debris from the mirror. In another aspect, a device is disclosed for removing plasma generated debris from an EUV light source collector mirror having a different debris deposition rate at different zones on the collector mirror. In a particular aspect, an EUV collector mirror system may comprise a source of hydrogen to combine with Li debris to create LiH on a collector surface; and a sputtering system to sputter LiH from the collector surface. In another aspect, an apparatus for etching debris from a surface of a EUV light source collector mirror with a controlled plasma etch rate is disclosed.
    Type: Application
    Filed: June 29, 2005
    Publication date: December 8, 2005
    Applicant: Cymer, Inc.
    Inventors: Alexander Ershov, William Marx, Norbert Bowering, Bjorn Hansson, Oleh Khodykin, Igor Fomenkov, William Partlo
  • Publication number: 20050265417
    Abstract: The present invention provides a control system for a modular high repetition rate two discharge chamber ultraviolet gas discharge laser. In preferred embodiments, the laser is a production line machine with a master oscillator producing a very narrow band seed beam which is amplified in the second discharge chamber. Novel control features specially adapted for a two-chamber gas discharge laser system include: (1) pulse energy controls, with nanosecond timing precision (2) precision pulse to pulse wavelength controls with high speed and extreme speed wavelength tuning (3) fast response gas temperature control and (4) F2 injection controls with novel learning algorithm.
    Type: Application
    Filed: July 14, 2005
    Publication date: December 1, 2005
    Applicant: Cymer, Inc.
    Inventors: John Fallon, John Rule, Robert Jacques, Jacob Lipcon, William Partlo, Alexander Ershov, Toshihiko Ishihara, John Meisner, Richard Ness, Paul Melcher