Patents by Inventor William Peter VAN DRENT
William Peter VAN DRENT has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11846887Abstract: Degradation of the reflectivity of one or more reflective optical elements in a system for generating EUV radiation is reduced by the controlled introduction of a gas into a vacuum chamber containing the optical element. The gas may be added to the flow of another gas such as hydrogen or alternated with the introduction of hydrogen radicals.Type: GrantFiled: April 7, 2022Date of Patent: December 19, 2023Assignee: ASML Netherlands B.V.Inventors: Yue Ma, Antonius Theodorus Wilhelmus Kempen, Klaus Martin Hummler, Johannes Hubertus Josephina Moors, Jeroen Hubert Rommers, Hubertus Johannes Van De Wiel, Andrew David Laforge, Fernando Brizuela, Rob Carlo Wieggers, Umesh Prasad Gomes, Elena Nedanovska, Celal Korkmaz, Alexander Downn Kim, Rui Miguel Duarte Rodrigues Nunes, Hendrikus Alphonsus Ludovicus Van Dijck, William Peter Van Drent, Peter Gerardus Jonkers, Qiushi Zhu, Parham Yaghoobi, Jan Steven Christiaan Westerlaken, Martinus Hendrikus Antonius Leenders, Alexander Igorevich Ershov, Igor Vladimirovich Fomenkov, Fei Liu, Johannes Henricus Wilhelmus Jacobs, Alexey Sergeevich Kuznetsov
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Publication number: 20230091648Abstract: A contamination trap for use in a debris mitigation system of a radiation source, the contamination trap comprising a plurality of vanes configured to trap fuel debris emitted from a plasma formation region of the radiation source; wherein at least one vane or each vane of the plurality of vanes comprises a material comprising a thermal conductivity above 30 W m?1 K?1.Type: ApplicationFiled: November 28, 2022Publication date: March 23, 2023Applicant: ASML Netherlands B.V.Inventors: Sander Catharina Reinier DERKS, Daniel Jozef Maria DIRECKS, Maurice Wilhelmus Leonardus Hendricus FEIJTS, Pieter Gerardus Mathijs HOEIJMAKERS, Katja Cornelia Joanna Clasina MOORS, Violeta NAVARRO PAREDES, William Peter VAN DRENT, Jan Steven Christiaan WESTERLAKEN
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Patent number: 11556067Abstract: A contamination trap for use in a debris mitigation system of a radiation source, the contamination trap comprising a plurality of vanes configured to trap fuel debris emitted from a plasma formation region of the radiation source; wherein at least one vane or each vane of the plurality of vanes comprises a material comprising a thermal conductivity above 30 W m?1K?1.Type: GrantFiled: March 10, 2020Date of Patent: January 17, 2023Assignee: ASML Netherlands B.V.Inventors: Sander Catharina Reinier Derks, Daniel Jozef Maria Direcks, Maurice Wilhelmus Leonardus Hendricus Feijts, Pieter Gerardus Mathijs Hoeijmakers, Katja Cornelia Joanna Clasina Moors, Violeta Navarro Paredes, William Peter Van Drent, Jan Steven Christiaan Westerlaken
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Publication number: 20220291591Abstract: Degradation of the reflectivity of one or more reflective optical elements in a system for generating EUV radiation is reduced by the controlled introduction of a gas into a vacuum chamber containing the optical element. The gas may be added to the flow of another gas such as hydrogen or alternated with the introduction of hydrogen radicals.Type: ApplicationFiled: April 7, 2022Publication date: September 15, 2022Inventors: Yue Ma, Antonius Theodorus Wilhelmus Kempen, Klaus Martin Hummler, Johannes Hubertus Josephina Moors, Jeroen Hubert Rommers, Hubertus Johannes Van De Wiel, Andrew David Laforge, Fernando Brizuela, Rob Carlo Wieggers, Umesh Prasad Gomes, Elena Nedanovska, Celal Korkmaz, Alexander Downn Kim, Rui Miguel Duarte Rodrigues Nunes, Hendrikus Alphonsus Ludovicus Van Dijck, William Peter Van Drent, Peter Gerardus Jonkers, Qiushi Zhu, Parham Yaghoobi, Jan Steven Christiaan Westerlaken, Martinus Hendrikus Antonius Leenders, Alexander Igorevich Ershov, Igor Vladimirovich Fomenkov, Fei Liu, Johannes Henricus Wilhelmus Jacobs, Alexey Sergeevich Kuznetsov
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Publication number: 20220197158Abstract: A contamination trap for use in a debris mitigation system of a radiation source, the contamination trap comprising a plurality of vanes configured to trap fuel debris emitted from a plasma formation region of the radiation source; wherein at least one vane or each vane of the plurality of vanes comprises a material comprising a thermal conductivity above 30 W m?1K?1.Type: ApplicationFiled: March 10, 2020Publication date: June 23, 2022Applicant: ASML Netherlands B.V.Inventors: Sander Catharina Reinier DERKS, Daneil Jozel Maria DIRECKS, Marurice Wilhelmus Leonardus Hendricu FEIJTS, Pieter Geradus Mathijs HOEIJMAKERS, Katja Cornelia Joanna Clasina MOORS, Violeta NAVARRO PAREDES, William Peter VAN DRENTS, Jan Steven Christiaan WESTERLAKEN
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Patent number: 11340532Abstract: Degradation of the reflectivity of one or more reflective optical elements in a system (SO) for generating EUV radiation is reduced by the controlled introduction of a gas into a vacuum chamber (26) containing the optical element. The gas may be added to the flow of another gas such as hydrogen or alternated with the introduction of hydrogen radicals.Type: GrantFiled: February 28, 2019Date of Patent: May 24, 2022Assignee: ASML Netherlands B.V.Inventors: Yue Ma, Antonius Theodorus Wilhelmus Kempen, Klaus Martin Hummler, Johannes Hubertus Josephina Moors, Jeroen Hubert Rommers, Hubertus Johannes Van De Wiel, Andrew David Laforge, Fernando Brizuela, Rob Carlo Wieggers, Umesh Prasad Gomes, Elena Nedanovska, Celal Korkmaz, Alexander Downn Kim, Rui Miguel Duarte Rodrigues Nunes, Hendrikus Alphonsus Ludovicus Van Dijck, William Peter Van Drent, Peter Gerardus Jonkers, Qiushi Zhu, Parham Yaghoobi, Jan Steven Christiaan Westerlaken, Martinus Hendrikus Antonius Leenders, Alexander Igorevich Ershov, Igor Vladimirovich Fomenkov, Fei Liu, Johannes Henricus Wilhelmus Jacobs, Alexey Sergeevich Kuznetsov
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Patent number: 11194256Abstract: An optical diffraction component is configured to suppress at least one target wavelength by destructive interference. The optical diffraction component includes at least three diffraction structure levels that are assignable to at least two diffraction structure groups. A first of the diffraction structure groups is configured to suppress a first target wavelength ?1. A second of the diffraction structure groups is configured to suppress a second target wavelength ?2, where (?1??2)2/(?1+?2)2<20%. A topography of the diffraction structure levels can be described as a superimposition of two binary diffraction structure groups. Boundary regions between adjacent surface sections of each of the binary diffraction structure groups have a linear course and are superimposed on one another at most along sections of the linear course.Type: GrantFiled: November 17, 2020Date of Patent: December 7, 2021Assignee: Carl Zeiss SMT GmbHInventors: Heiko Feldmann, Valentin Bolsinger, William Peter Van Drent, Jozef Petrus Henricus Benschop
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Publication number: 20210318622Abstract: An optical diffraction component is configured to suppress at least one target wavelength by destructive interference. The optical diffraction component includes at least three diffraction structure levels that are assignable to at least two diffraction structure groups. A first of the diffraction structure groups is configured to suppress a first target wavelength ?1. A second of the diffraction structure groups is configured to suppress a second target wavelength ?2, where (?1??2)2/(?1+?2)2<20%. A topography of the diffraction structure levels can be described as a superimposition of two binary diffraction structure groups. Boundary regions between adjacent surface sections of each of the binary diffraction structure groups have a linear course and are superimposed on one another at most along sections of the linear course.Type: ApplicationFiled: November 17, 2020Publication date: October 14, 2021Inventors: Heiko Feldmann, Valentin Bolsinger, William Peter Van Drent, Jozef Petrus Henricus Benschop
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Patent number: 11022902Abstract: The invention relates to a sensor comprising: a radiation source to emit radiation having a coherence length towards a sensor target; and a polarizing beam splitter to split radiation diffracted by the sensor target into radiation with a first polarization state and radiation with a second polarization state, wherein the first polarization state is orthogonal to the second polarization state, and wherein the sensor is configured such that after passing the polarizing beam splitter radiation with the first polarization state has an optical path difference relative to radiation with the second polarization state that is larger than the coherence length.Type: GrantFiled: May 14, 2018Date of Patent: June 1, 2021Assignee: ASML Netherlands B.VInventors: Arie Jeffrey Den Boef, Patricius Aloysius Jacobus Tinnemans, Haico Victor Kok, William Peter Van Drent, Sebastianus Adrianus Goorden
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Publication number: 20210109452Abstract: Degradation of the reflectivity of one or more reflective optical elements in a system (SO) for generating EUV radiation is reduced by the controlled introduction of a gas into a vacuum chamber (26) containing the optical element. The gas may be added to the flow of another gas such as hydrogen or alternated with the introduction of hydrogen radicals.Type: ApplicationFiled: February 28, 2019Publication date: April 15, 2021Inventors: Yue Ma, Antonius Theodorus Wilhelmus Kempen, Klaus Martin Hummler, Johannes Hubertus Josephina Moors, Jeroen Hubert Rommers, Hubertus Johannes Van De Wiel, Andrew David Laforge, Fernando Brizuela, Rob Carlo Wieggers, Umesh Prasad Gomes, Elena Nedanovska, Celal Korkmaz, Alexander Downn Kim, Rui Miguel Duarte Rodrigues Nunes, Hendrikus Alphonsus Ludovicus Van Dijck, William Peter Van Drent, Peter Gerardus Jonkers, Qiushi Zhu, Parham Yaghoobi, Jan Steven Christiaan Westerlaken, Martinus Hendrikus Antonius Leenders, Alexander Igorevich Ershov, Igor Vladimirovich Fomenkov, Fei Liu, Johannes Henricus Wilhelmus Jacobs, Alexey Sergeevich Kuznetsov
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Publication number: 20210072647Abstract: The invention relates to a sensor (SE) comprising: —a radiation source (LS) to emit radiation (LI) having a coherence length towards a sensor target (GR); and —a polarizing beam splitter (PBS) to split radiation diffracted by the sensor target into radiation with a first polarization state and radiation with a second polarization state, wherein the first polarization state is orthogonal to the second polarization state, and wherein the sensor is configured such that after passing the polarizing beam splitter radiation with the first polarization state has an optical path difference relative to radiation with the second polarization state that is larger than the coherence length.Type: ApplicationFiled: May 14, 2018Publication date: March 11, 2021Applicant: ASML Netherlands B.V.Inventors: Arie Jeffrey DEN BOEF, Patricius Aloysius Jacobus TINNEMANS, Haico Victor KOK, William Peter VAN DRENT, Sebastianus Adrianus GOORDEN
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Patent number: 10852640Abstract: An optical diffraction component is configured to suppress at least one target wavelength by destructive interference. The optical diffraction component includes at least three diffraction structure levels that are assignable to at least two diffraction structure groups. A first of the diffraction structure groups is configured to suppress a first target wavelength ?1. A second of the diffraction structure groups is configured to suppress a second target wavelength ?2, where (?1??2)2/(?1+?2)2<20%. A topography of the diffraction structure levels can be described as a superimposition of two binary diffraction structure groups. Boundary regions between adjacent surface sections of each of the binary diffraction structure groups have a linear course and are superimposed on one another at most along sections of the linear course.Type: GrantFiled: January 10, 2020Date of Patent: December 1, 2020Assignee: Carl Zeiss SMT GmbHInventors: Heiko Feldmann, Valentin Bolsinger, William Peter Van Drent, Jozef Petrus Henricus Benschop
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Publication number: 20200225586Abstract: An optical diffraction component is configured to suppress at least one target wavelength by destructive interference. The optical diffraction component includes at least three diffraction structure levels that are assignable to at least two diffraction structure groups. A first of the diffraction structure groups is configured to suppress a first target wavelength ?1. A second of the diffraction structure groups is configured to suppress a second target wavelength ?2, where (?1??2)2/(?1+?2)2<20%. A topography of the diffraction structure levels can be described as a superimposition of two binary diffraction structure groups. Boundary regions between adjacent surface sections of each of the binary diffraction structure groups have a linear course and are superimposed on one another at most along sections of the linear course.Type: ApplicationFiled: January 10, 2020Publication date: July 16, 2020Inventors: Heiko Feldmann, Valentin Bolsinger, William Peter Van Drent, Jozef Petrus Henricus Benschop
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Patent number: 9696638Abstract: A lithographic apparatus including a substrate table position measurement system and a projection system position measurement system to measure a position of the substrate table and the projection system, respectively. The substrate table position measurement system includes a substrate table reference element mounted on the substrate table and a first sensor head. The substrate table reference element extends in a measurement plane substantially parallel to the holding plane of a substrate on substrate table. The holding plane is arranged at one side of the measurement plane and the first sensor head is arranged at an opposite side of the measurement plane. The projection system position measurement system includes one or more projection system reference elements and a sensor assembly. The sensor head and the sensor assembly or the associated projection system measurement elements are mounted on a sensor frame.Type: GrantFiled: December 10, 2015Date of Patent: July 4, 2017Assignee: ASML NETHERLANDS B.V.Inventors: Engelbertus Antonius Fransiscus Van Der Pasch, Joost Jeroen Ottens, Emiel Jozef Melanie Eussen, Johannes Henricus Wilhelmus Jacobs, William Peter Van Drent, Frank Staals, Lukasz Jerzy Macht, Erik Willem Bogaart
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Publication number: 20160109812Abstract: A lithographic apparatus including a substrate table position measurement system and a projection system position measurement system to measure a position of the substrate table and the projection system, respectively. The substrate table position measurement system includes a substrate table reference element mounted on the substrate table and a first sensor head. The substrate table reference element extends in a measurement plane substantially parallel to the holding plane of a substrate on substrate table. The holding plane is arranged at one side of the measurement plane and the first sensor head is arranged at an opposite side of the measurement plane. The projection system position measurement system includes one or more projection system reference elements and a sensor assembly. The sensor head and the sensor assembly or the associated projection system measurement elements are mounted on a sensor frame.Type: ApplicationFiled: December 10, 2015Publication date: April 21, 2016Applicant: ASML NETHERLANDS B.V.Inventors: Engelbertus Antonius Fransiscus VAN DER PASCH, Joost Jeroen OTTENS, Emiel Jozef Melanie EUSSEN, Johannes Henricus Wilhelmus JACOBS, William Peter VAN DRENT, Frank STAALS, Lukasz Jerzy MACHT, Erik Willem BOGAART
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Patent number: 9229340Abstract: A lithographic apparatus including a substrate table position measurement system and a projection system position measurement system to measure a position of the substrate table and the projection system, respectively. The substrate table position measurement system includes a substrate table reference element mounted on the substrate table and a first sensor head. The substrate table reference element extends in a measurement plane substantially parallel to the holding plane of a substrate on substrate table. The holding plane is arranged at one side of the measurement plane and the first sensor head is arranged at an opposite side of the measurement plane. The projection system position measurement system includes one or more projection system reference elements and a sensor assembly. The sensor head and the sensor assembly or the associated projection system measurement elements are mounted on a sensor frame.Type: GrantFiled: September 25, 2013Date of Patent: January 5, 2016Assignee: ASML NETHERLANDS B.V.Inventors: Engelbertus Antonius Fransiscus Van Der Pasch, Joost Jeroen Ottens, Emiel Jozef Melanie Eussen, Johannes Henricus Wilhelmus Jacobs, William Peter Van Drent, Frank Staals, Lukasz Jerzy Macht, Erik Willem Bogaart
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Publication number: 20140022527Abstract: A lithographic apparatus including a substrate table position measurement system and a projection system position measurement system to measure a position of the substrate table and the projection system, respectively. The substrate table position measurement system includes a substrate table reference element mounted on the substrate table and a first sensor head. The substrate table reference element extends in a measurement plane substantially parallel to the holding plane of a substrate on substrate table. The holding plane is arranged at one side of the measurement plane and the first sensor head is arranged at an opposite side of the measurement plane. The projection system position measurement system includes one or more projection system reference elements and a sensor assembly. The sensor head and the sensor assembly or the associated projection system measurement elements are mounted on a sensor frame.Type: ApplicationFiled: September 25, 2013Publication date: January 23, 2014Applicant: ASML NETHERLANDS B.V.Inventors: Engelbertus Antonius Fransiscus VAN DER PASCH, Joost Jeroen Ottens, Emiel Jozef Melanie Eussen, Johannes Henricus Wilhelmus Jacobs, William Peter Van Drent, Frank Staals, Lukasz Jerzy Macht, Erik Willem Bogaart
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Patent number: 8619235Abstract: A level sensor configured to measure a height level of a substrate arranged in a measurement position is disclosed. The level sensor comprises a projection unit to project multiple measurement beams on multiple measurement locations on the substrate, a detection unit to receive the measurement beams after reflection on the substrate, and a processing unit to calculate a height level on the basis of the reflected measurement beams received by the detection unit, wherein the projection unit and the detection unit are arranged next to the substrate, when the substrate is arranged in the measurement position.Type: GrantFiled: March 10, 2011Date of Patent: December 31, 2013Assignee: ASML Netherlands B.V.Inventor: William Peter Van Drent
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Patent number: 8570492Abstract: A lithographic apparatus including a substrate table position measurement system and a projection system position measurement system to measure a position of the substrate table and the projection system, respectively. The substrate table position measurement system includes a substrate table reference element mounted on the substrate table and a first sensor head. The substrate table reference element extends in a measurement plane substantially parallel to the holding plane of a substrate on substrate table. The holding plane is arranged at one side of the measurement plane and the first sensor head is arranged at an opposite side of the measurement plane. The projection system position measurement system includes one or more projection system reference elements and a sensor assembly. The sensor head and the sensor assembly or the associated projection system measurement elements are mounted on a sensor frame.Type: GrantFiled: March 7, 2012Date of Patent: October 29, 2013Assignee: ASML Netherlands B.V.Inventors: Engelbertus Antonius Fransiscus Van Der Pasch, Emiel Jozef Melanie Eussen, Johannes Henricus Wilhelmus Jacobs, Joost Jeroen Ottens, Frank Staals, Lukasz Jerzy Macht, William Peter Van Drent, Erik Willem Bogaart
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Publication number: 20120242969Abstract: A lithographic apparatus including a substrate table position measurement system and a projection system position measurement system to measure a position of the substrate table and the projection system, respectively. The substrate table position measurement system includes a substrate table reference element mounted on the substrate table and a first sensor head. The substrate table reference element extends in a measurement plane substantially parallel to the holding plane of a substrate on substrate table. The holding plane is arranged at one side of the measurement plane and the first sensor head is arranged at an opposite side of the measurement plane. The projection system position measurement system includes one or more projection system reference elements and a sensor assembly. The sensor head and the sensor assembly or the associated projection system measurement elements are mounted on a sensor frame.Type: ApplicationFiled: March 7, 2012Publication date: September 27, 2012Applicant: ASML NETHERLANDS B.V.Inventors: Engelbertus Antonius Fransiscus VAN DER PASCH, Emiel Jozef Melanie Eussen, Johannes Henricus Wilhelmus Jacobs, Joost Jeroen Ottens, Frank Staals, Lukasz Jerzy Macht, William Peter Van Drent, Erik Willem Bogaart