Patents by Inventor William Polinsky

William Polinsky has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Modified Facet Etch to Prevent Blown Gate Oxide and Increase Etch Chamber Life
    Publication number: 20070278611
    Abstract: A modified facet etch is disclosed to prevent blown gate oxide and increase etch chamber life. The modified facet etch is a two-stage process. The first stage is a plasma sputter etch to form a facet profile. The first stage etch is terminated prior to reaching the target depth for the etching process. The second stage etch is a reactive ion etch which directionally follows the facet profile to reach the target depth.
    Type: Application
    Filed: August 16, 2007
    Publication date: December 6, 2007
    Applicant: MICRON TECHNOLOGY, INC.
    Inventors: William Polinsky, Thomas Kari, Mark Bossler
  • Conditioning of a reaction chamber
    Publication number: 20060202394
    Abstract: A method is provided for forming polymer on an interior surface of a reaction chamber. A polymer-forming gas is introduced into the chamber during the etching of a photoresist layer of a semiconductor wafer within the reaction chamber and the environment is regulated to form the polymer on the interior surface of the chamber. The polymer thus formed reduces the standard deviation of the critical dimensions of the semiconductor wafer. A method for the manufacture of integrated circuits is also provided.
    Type: Application
    Filed: November 14, 2005
    Publication date: September 14, 2006
    Inventors: William Polinsky, Bill Crane, John Gonzales, Steven Ott
  • Conditioning of a reaction chamber
    Publication number: 20050106891
    Abstract: A method is provided for forming polymer on an interior surface of a reaction chamber. A polymer-forming gas is introduced into the chamber and the environment is regulated to form the polymer on the interior surface of the chamber. Methods for the manufacture of integrated circuits, electronic devices, and electronic systems, are also provided.
    Type: Application
    Filed: November 18, 2003
    Publication date: May 19, 2005
    Inventors: William Polinsky, Bill Crane, John Gonzales, Steven Ott
  • Theft preventing and deterring system and method using a remote station
    Patent number: 5969433
    Abstract: Upon the occurrence of a predetermined event, the protection system will automatically disable the vehicle or object that the system is installed in. Several sensors and events can be monitored by the system simultaneously, and the system can be automatically or manually programmed to selectively intervene or monitor events as they occur. Radiolocation systems, such as GPS and TELETRAC(.TM.) are used to monitor status and send commands.
    Type: Grant
    Filed: April 23, 1997
    Date of Patent: October 19, 1999
    Inventors: David Raymond Maggiora, Dennis William Polinski