Patents by Inventor William Pratt Funsten

William Pratt Funsten has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method of manufacturing calibration wafers for determining in-line defect scan tool sensitivity
    Patent number: 6274396
    Abstract: Methods of manufacturing calibration wafers by forming a first layer of a material on a layer of a substrate material. In a first embodiment, calibration spheres are deposited on the first layer of material followed by an etch process that removes exposed portions of the first layer of a material. The calibration spheres are removed leaving pillars of the first layer of a material formed on the layer of a substrate material. The calibration spheres can be of various sizes forming pillars of various sizes. The calibration wafer with the various size pillars is scanned in a scan tool to determine the scan tool sensitivity. In a second embodiment, a layer of a second material is deposited on and around the various size pillars forming bumps over the various size pillars.
    Type: Grant
    Filed: January 29, 2001
    Date of Patent: August 14, 2001
    Assignee: Advanced Micro Devices, Inc.
    Inventor: William Pratt Funsten