Abstract: The present disclosure provides methods of improving dewatering in the papermaking process by incorporation of functionalized cellulose fibers in the paper furnish. Additionally, the disclosure provides the means to eliminate process problems mainly plugging problems in a nano/micro-fibrillated cellulose production process by incorporation of functionalized cellulose fibers in a cellulose fiber composition and methods of functionalizing cellulose fibers in a paper making process. The methods according to the present disclosure provide several advantages, such as improving the freeness and dewatering of the paper making process during the paper making process, leading to an increased production rate and reduced energy consumption.

Abstract: We have developed an improved vapor-phase deposition method and apparatus for the attachment of organic films/coatings containing a variety of functional groups on halogen-containing substrates. The substrate surface is halogenated using a vaporous halogen-containing compound, followed by a reaction with at least one organic molecule containing at least one nucleophilic functional group. Halogenation of the substrate surface and subsequent reaction with the organic molecule are carried out in the same process chamber in a manner such that the halogenated substrate surface does not lose its functionality prior to reaction with the nucleophilic functional group(s) on the organic molecule.

Abstract: Coatings of dialkylsilyloxy groups are applied to water-wettable surfaces by chemical vapor deposition using dihalodialkylsilanes with short-chain alkyl groups. Some of the surfaces which will benefit from the application of these coatings are hydroxyl-terminated silicon surfaces of microelectromechanical systems, nanoelectromechanical systems, and biomicroelectromechanical systems, while surfaces of other chemistries will benefit as well. When applied to a microstructure on an MEMS surface, the coating reduces stiction in the microstructure. The use of the vapor phase as a deposition medium facilitates the deposition process and permits close control over the reaction conditions and the characteristics of the resulting coating.