Patents by Inventor William R. Gemmill

William R. Gemmill has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Semi-aqueous polymer removal compositions with enhanced compatibility to copper, tungsten, and porous low-K dielectrics
    Patent number: 9327966
    Abstract: A composition is provided that is effective for removing post etch treatment (PET) polymeric films and photoresist from semiconductor substrates. The composition exhibits excellent polymer film removal capability while maintaining compatibility with copper and low-? dielectrics and contains water, ethylene glycol, a glycol ether solvent, morpholinopropylamine and a corrosion inhibiting compound and optionally one or more metal ion chelating agent, one or more other polar organic solvent, one or more tertiary amine, one or more aluminum corrosion inhibition agent, and one or more surfactant.
    Type: Grant
    Filed: May 31, 2012
    Date of Patent: May 3, 2016
    Assignee: AVANTOR PERFORMANCE MATERIALS, INC.
    Inventors: William R. Gemmill, Glenn Westwood
  • SEMI-AQUEOUS POLYMER REMOVAL COMPOSITIONS WITH ENHANCED COMPATIBILITY TO COPPER, TUNGSTEN, AND POROUS LOW-K DIELECTRICS
    Publication number: 20140248781
    Abstract: A composition is provided that is effective for removing post etch treatment (PET) polymeric films and photoresist from semiconductor substrates. The composition exhibits excellent polymer film removal capability while maintaining compatibility with copper and low-? dielectrics and contains water, ethylene glycol, a glycol ether solvent, morpholinopropylamine and a corrosion inhibiting compound and optionally one or more metal ion chelating agent, one or more other polar organic solvent, one or more tertiary amine, one or more aluminum corrosion inhibition agent, and one or more surfactant.
    Type: Application
    Filed: May 31, 2012
    Publication date: September 4, 2014
    Applicant: Avantor Performance Materials, Inc.
    Inventors: William R. Gemmill, Glenn Westwood
  • Multipurpose acidic, organic solvent based microelectronic cleaning composition
    Patent number: 8557757
    Abstract: A cleaning composition for cleaning microelectronic or nanoelectronic devices, the cleaning composition having HF as the sole acid and sole fluoride compound in the composition, at least one primary solvent selected from the group consisting of sulfones and selenones, at least one polyhydroxyl alkyl or aryl alcohol co-solvent having metal ion complexing or binding sites, and water, and optionally at least one phosphonic acid corrosion inhibitor compound and the is free of amines, bases and other salts.
    Type: Grant
    Filed: January 14, 2010
    Date of Patent: October 15, 2013
    Assignee: Avantor Performance Materials, Inc.
    Inventors: Chien-Pin S. Hsu, Glenn Westwood, William R. Gemmill
  • Post plasma etch/ash residue and silicon-based anti-reflective coating remover compositions containing tetrafluoroborate ion
    Patent number: 8168577
    Abstract: A microelectronic cleaning compositions of: a) from about 80% to about 99% by weight of the composition of at least one organic sulfone; b) from about 0.5% to about 19% by weight of the composition of water; and c) from about 0.5% to about 10% by weight of the composition of at least one component providing tetrafluoroborate ion, and d) optionally at least one polyhydric alcohol is especially useful to clean etch/ash residues from microelectronic substrates or device having both Si-based anti-reflective coatings and low-k dielectrics.
    Type: Grant
    Filed: February 5, 2009
    Date of Patent: May 1, 2012
    Assignee: Avantor Performance Materials, Inc.
    Inventor: William R. Gemmill
  • MULTIPURPOSE ACIDIC, ORGANIC SOLVENT BASED MICROELECTRONIC CLEANING COMPOSITION
    Publication number: 20110306534
    Abstract: A cleaning composition for cleaning microelectronic or nanoelectronic devices, the cleaning composition having HF as the sole acid and sole fluoride compound in the composition, at least one primary solvent selected from the group consisting of sulfones and selenones, at least one polyhydroxyl alkyl or aryl alcohol co-solvent having metal ion complexing or binding sites, and water, and optionally at least one phosphonic acid corrosion inhibitor compound and the is free of amines, bases and other salts.
    Type: Application
    Filed: January 14, 2010
    Publication date: December 15, 2011
    Inventors: Chien-Pin S. Hsu, Glenn Westwood, William R. Gemmill
  • Post Plasma Etch/Ash Residue and Silicon-Based Anti-Reflective Coating Remover Compositions Containing Tetrafluoroborate Ion
    Publication number: 20110046036
    Abstract: A microelectronic cleaning compositions of: a) from about 80% to about 99% by weight of the composition of at least one organic sulfone; b) from about 0.5% to about 19% by weight of the composition of water; and c) from about 0.5% to about 10% by weight of the composition of at least one component providing tetrafluoroborate ion, and d) optionally at least one polyhydric alcohol is especially useful to clean etch/ash residues from microelectronic substrates or device having both Si-based anti-reflective coatings and low-k dielectrics.
    Type: Application
    Filed: February 5, 2009
    Publication date: February 24, 2011
    Inventor: William R. Gemmill