Abstract: A microbeam interconnection method is provided to connect integrated circuit bond pads to substrate contacts. Conductive leads (microbeams) are releasably formed, by a process such as electroplating or vacuum deposition, over a release layer deposited on a ceramic, glass or similar carrier. The microbeam material adheres only very weakly to the release layer. After the inner ends of the microbeams have been bonded to IC bond pads, such as by flip chip bump bonding, and the integrated circuit has been fully tested, the IC is lifted away from the carrier, causing the microbeams to peel away from the release layer. After straightening the microbeams against a flat surface, the outer ends of the microbeams may then be bonded to contacts on an MCM or other substrate. The method permits full electrical testing at speed and high speed bonding. The method significantly reduces mechanical stresses in interconnect bonds and thereby improves integrated circuit reliability.

Abstract: A microbeam interconnection method is provided to connect integrated circuit bond pads to substrate contacts. Conductive leads (microbeams) are releasably formed, by a process such as electroplating or vacuum deposition, over a release layer deposited on a ceramic, glass or similar carrier. The microbeam material adheres only very weakly to the release layer. After the inner ends of the microbeams have been bonded to IC bond pads, such as by flip chip bump bonding, and the integrated circuit has been fully tested, the IC is lifted away from the carrier, causing the microbeams to peel away from the release layer. After straightening the microbeams against a flat surface, the outer ends of the microbeams may then be bonded to contacts on an MCM or other substrate. The method permits full electrical testing at speed and high speed bonding. The method significantly reduces mechanical stresses in interconnect bonds and thereby improves integrated circuit reliability.

Abstract: A method is provided for supporting the mechanical members of a micro-electronic substrate during the manufacture of the substrate into a micro-mechanical or micro-electromechanical device. The method provides supporting material that surrounds the various mechanical members of the micro-electronic substrate and stabilizes these mechanical members during manufacture. The method also facilitates precise photolithographic as well as other microfabrication techniques. Specifically, the method provides support material that surrounds the perimeter of the micro-electronic substrate and that has a surface that is coplanar with one surface of the micro-electronic substrate. Photoresist or other materials can then be deposited, such as by spinning, on the surface of the micro-electronic substrate such that the edges of the photoresist or other materials lie upon the supporting material.