Patents by Inventor William S. Jaspersen

William S. Jaspersen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Powered load lock electrode/substrate assembly including robot arm, optimized for plasma process uniformity and rate
    Patent number: 4657618
    Abstract: An electrode and substrate assembly for a plasma reactor allows high power plasma processing with low frequency excitation. The electrode sub-assembly is contained in a chamber which is used for pre-treatment such as de-scumming photoresist or for post-etch resist stripping and passivation. A post-etch treatment is essential in plasma aluminum etching.
    Type: Grant
    Filed: October 22, 1984
    Date of Patent: April 14, 1987
    Assignee: Texas Instruments Incorporated
    Inventors: John E. Spencer, Randall E. Johnson, Dan T. Hockersmith, Randall C. Hildenbrand, John I. Jones, William S. Jaspersen