Patents by Inventor William Saylor

William Saylor has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Modular monolithic bulkhead panel
    Publication number: 20060101771
    Abstract: A modular monolithic metal framed bulkhead panel having an outer frame, an inner frame, a non-metallic composite panel, a panel seal, and a frame seal common to a panel-bulkhead structure interface.
    Type: Application
    Filed: November 22, 2005
    Publication date: May 18, 2006
    Inventors: Wrenn Holman, Robert Dost, Ernest Williams, Gary Richter, Juan Villalobos, Yida Gonzalez, Michael Volkmar, Michael Byrd, Francisco Boyer, Nasima Rahman, William Saylor, Patricia Hutchison, Chad Braunschweig, David Bauder
  • Sensor array for measuring plasma characteristics in plasma processing environments
    Publication number: 20050151544
    Abstract: A plasma processing system is provided with diagnostic apparatus for making in-situ measurements of plasma properties. The diagnostic apparatus generally comprises a non-invasive sensor array disposed within a plasma processing chamber, an electrical circuit for stimulating the sensors, and means for recording and communicating sensor measurements for monitoring or control of the plasma process. In one form, the sensors are dynamically pulsed dual floating Langmuir probes that measure incident charged particle currents and electron temperatures in proximity to the plasma boundary or boundaries within the processing system. The plasma measurements may be used to monitor the condition of the processing plasma or furnished to a process system controller for use in controlling the plasma process.
    Type: Application
    Filed: February 25, 2005
    Publication date: July 14, 2005
    Inventors: Leonard Mahoney, Carl Almgren, Gregory Roche, William Saylor, William Sproul, Hendrik Walde
  • Sensor array for measuring plasma characteristics in plasma processing enviroments
    Publication number: 20050034811
    Abstract: A plasma processing system is provided with diagnostic apparatus for making in-situ measurements of plasma properties. The diagnostic apparatus generally comprises a non-invasive sensor array disposed within a plasma processing chamber, an electrical circuit for stimulating the sensors, and means for recording and communicating sensor measurements for monitoring or control of the plasma process. In one form, the sensors are dynamically pulsed dual floating Langmuir probes that measure incident charged particle currents and electron temperatures in proximity to the plasma boundary or boundaries within the processing system. The plasma measurements may be used to monitor the condition of the processing plasma or furnished to a process system controller for use in controlling the plasma process.
    Type: Application
    Filed: August 14, 2003
    Publication date: February 17, 2005
    Inventors: Leonard Mahoney, Carl Almgren, Gregory Roche, William Saylor, William Sproul, Hendrik Walde