Abstract: A bond tool is used in semiconductor package to break a lead at a notch formed thereon and then bonds the broken lead to a die pad. In an embossing-type bond tool, an end thereof is provided with a projected portion for vertically pressing against the lead to form a transversely extended groove thereon. In a scissor-type bond tool, an end thereof is formed into two opposite sharp blades for horizontally cutting the lead at two lateral edges thereof to provide two symmetrical cuts. Unlike the conventional notches that are formed on the lead during the complicate forming process of the lead, the groove and the symmetrical cuts are easily formed on the straight lead without notch to provide a weak point at reduced manufacturing cost. The difficulties in forming the conventional notches on the lead due to the highly precise lead windows, lead width, and lead pitch can therefore be avoided and thus improve the yield for manufacturing of lead bond substrates.

Abstract: A chemical-mechanical polishing apparatus includes a wafer carrier with a very low center of gravity which allows pressure to be applied evenly on a wafer being polished. The wafer carrier includes top, center, and bottom mating subassemblies with only the center and bottom subassembly or wafer holder actually rotating. The bottom of the central subassembly and the top of the bottom subassemblies are shaped as negative and positive, mating truncated pyramids with a downward extension at the center axis of the central subassembly which terminates in a ball in a recess in the top of the lower subassembly. The ball is positioned as low as possible to provide a very low center of gravity to ensure even pressure distribution over a wafer being polished. The truncated pyramidal shapes are to provide a geometry which exhibits a rigid structure with incrementally decreasing mass with distance from the central axis.

Abstract: Endpoint determination of a wafer removal process, in-situ, is afforded by the use of a Kalman filter known to be useful in celestial navigation. The use of line variable displacement transducers provides position error correction for the Kalman filter and the Preston equation provides the initial calibration for the endpoint determination. Accuracies of fifty angstrom are achieved.

Abstract: Chemical-mechanical polishing apparatus includes three subassemblies, a top subassembly which is non-rotating but which has a lower section which forms a shell about a center and a lower subassembly both of which rotate within the shell. The system also includes a slurry dispensing system which is embedded in the shell and which is operative to supply slurry just in front of the advancing edge of a wafer being polished by the system. The slurry dispensing system includes a tube with holes arranged 180 degrees about the shell of the non-rotating subassembly which is also operative to retain the wafer in contact with the (rotating) pad covered platen with which it is in contact.

Abstract: Chemical-mechanical polishing apparatus includes a pad reconditioning mechanism which comprises nested conical tubes which overly the pad. The outer tube has an array of holes in it much like the head of an electric razor and is rotated about its axis by being in contact with the rotating pad. The inner cone is stationary and has a longitudinal, downward-facing slot. An air stream from the narrow end of the inner cone towards the wide end carries particle-laden slurry to the wide end for removal or recycling. The nested cones are arranged like a detachable bridge with the narrow end secured to a non-rotating center core and the wide end secured to the top of the table in which the (now annular) platen rotates.

Abstract: A slurry recycling system for a chemical-mechanical polishing apparatus includes an annular-shaped wafer polishing platen which rotates about a non-rotating center core. A slurry dispensing system housed in the center core directs a slurry mist radially into the path of a moving wafer. The recycling system is positioned at the periphery of the platen and is controlled by an end point monitoring and control system which uniquely provides instantaneous wafer removal rate data to regulate a slurry recycling valve.

Abstract: Semiconductor wafer polishing apparatus, in accordance with the princples of this invention, includes an annular-shaped platen rotatable about a non-rotating center core having a diameter smaller than the width of the annular-shaped platen. The center core is the source of slurry which permits convenient dispensing of slurry. The apparatus includes a bridge which extends from the center core to the rigid table in which the apparatus is housed. The bridge is a convenient support for apparatus for pad rejuvenation and for sensing and correcting wafer attitude and characteristics as well as slurry properties on a real time basis for improving wafer uniformity and local surface planarity.