Patents by Inventor Willie Rivera

Willie Rivera has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method of improving vacuum quality in semiconductor processing chambers
    Patent number: 6395100
    Abstract: Methods of removing gaseous phase contaminants from a processing chamber, such as a PVD chamber, are provided. In one aspect, a method of removing gaseous phase water from a processing chamber is provided that includes placing a heated substrate that has a titanium film in the processing chamber to dissociate a first portion of the gaseous phase water into hydrogen and oxygen and capture some of the oxygen in, the titanium film. The dissociated hydrogen and uncaptured oxygen are pumped from the processing chamber and the substrate is removed from the processing chamber. Pump down times and test wafer consumption may be reduced.
    Type: Grant
    Filed: January 3, 2000
    Date of Patent: May 28, 2002
    Assignee: Advanced Micro Devices, Inc.
    Inventors: William S. Brennan, Willie Rivera