Patents by Inventor Willy Rachmady

Willy Rachmady has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20210288049
    Abstract: Techniques and mechanisms for operating transistors that are in a stacked configuration. In an embodiment, an integrated circuit (IC) device includes transistors arranged along a line of direction which is orthogonal to a surface of a semiconductor substrate. A first epitaxial structure and a second epitaxial structure are coupled, respectively, to a first channel structure of a first transistor and a second channel structure of a second transistor. The first epitaxial structure and the second epitaxial structure are at different respective levels relative to the surface of the semiconductor substrate. A dielectric material is disposed between the first epitaxial structure and the second epitaxial structure to facilitate electrical insulation of the channels from each other. In another embodiment, the stacked transistors are coupled to provide a complementary metal-oxide-semiconductor (CMOS) inverter circuit.
    Type: Application
    Filed: May 28, 2021
    Publication date: September 16, 2021
    Inventors: Ravi PILLARISETTY, Willy RACHMADY, Marko RADOSAVLJEVIC, Van H. LE, Jack T. KAVALIEROS
  • Patent number: 11107890
    Abstract: An apparatus is described. The apparatus includes a FINFET device having a channel. The channel is composed of a first semiconductor material that is epitaxially grown on a subfin structure beneath the channel. The subfin structure is composed of a second semiconductor material that is different than the first semiconductor material. The subfin structure is epitaxially grown on a substrate composed of a third semiconductor material that is different than the first and second semiconductor materials. The subfin structure has a doped region to substantially impede leakage currents between the channel and the substrate.
    Type: Grant
    Filed: June 30, 2016
    Date of Patent: August 31, 2021
    Assignee: Intel Corporation
    Inventors: Gilbert Dewey, Matthew V. Metz, Willy Rachmady, Anand S. Murthy, Chandra S. Mohapatra, Tahir Ghani, Sean T. Ma, Jack T. Kavalieros
  • Patent number: 11101377
    Abstract: Techniques and mechanisms for providing efficient transistor functionality of an integrated circuit. In an embodiment, a transistor device comprises a first body of a high mobility semiconductor and a second body of a wide bandgap semiconductor. The first body adjoins each of, and is disposed between, the second body and a gate dielectric layer of the transistor. The second body extends between, and variously adjoins, each of a source of the transistor and a drain of the transistor. A location of the second body mitigates current leakage that might otherwise occur via the first body. In another embodiment, a mobility of the first body is equal to or greater than 100 cm2/V·s, wherein a bandgap of the second body is equal to or greater than 2.0 eV.
    Type: Grant
    Filed: March 28, 2018
    Date of Patent: August 24, 2021
    Assignee: Intel Corporation
    Inventors: Abhishek A. Sharma, Gilbert Dewey, Van H. Le, Willy Rachmady, Ravi Pillarisetty
  • Patent number: 11101376
    Abstract: Embodiments related to transistors having one or more non-planar transition metal dichalcogenide cladding layers, integrated circuits and systems incorporating such transistors, and methods for fabricating them are discussed.
    Type: Grant
    Filed: June 29, 2017
    Date of Patent: August 24, 2021
    Assignee: Intel Corporation
    Inventors: Ravi Pillarisetty, Abhishek Sharma, Van H. Le, Gilbert Dewey, Willy Rachmady
  • Patent number: 11101270
    Abstract: Techniques and mechanisms for operating transistors that are in a stacked configuration. In an embodiment, an integrated circuit (IC) device includes transistors arranged along a line of direction which is orthogonal to a surface of a semiconductor substrate. A first epitaxial structure and a second epitaxial structure are coupled, respectively, to a first channel structure of a first transistor and a second channel structure of a second transistor. The first epitaxial structure and the second epitaxial structure are at different respective levels relative to the surface of the semiconductor substrate. A dielectric material is disposed between the first epitaxial structure and the second epitaxial structure to facilitate electrical insulation of the channels from each other. In another embodiment, the stacked transistors are coupled to provide a complementary metal-oxide-semiconductor (CMOS) inverter circuit.
    Type: Grant
    Filed: June 29, 2017
    Date of Patent: August 24, 2021
    Assignee: Intel Corporation
    Inventors: Ravi Pillarisetty, Willy Rachmady, Marko Radosavljevic, Van H. Le, Jack T. Kavalieros
  • Publication number: 20210257457
    Abstract: A nanowire device of the present description may be produced with the incorporation of at least one hardmask during the fabrication of at least one nanowire transistor in order to assist in protecting an uppermost channel nanowire from damage that may result from fabrication processes, such as those used in a replacement metal gate process and/or the nanowire release process. The use of at least one hardmask may result in a substantially damage free uppermost channel nanowire in a multi-stacked nanowire transistor, which may improve the uniformity of the channel nanowires and the reliability of the overall multi-stacked nanowire transistor.
    Type: Application
    Filed: April 12, 2021
    Publication date: August 19, 2021
    Inventors: Seung Hoon Sung, Seiyon Kim, Kelin J. Kuhn, Willy Rachmady, Jack T. Kavalieros
  • Patent number: 11088204
    Abstract: A memory device includes a first electrode, a non-volatile memory element having a first terminal and a second terminal, where the first terminal is coupled to the first electrode. The memory device further includes a selector having a first terminal, a second terminal and a sidewall between the first and second terminals, where the second terminal of the selector is coupled to the first terminal of the non-volatile memory element. A second electrode is coupled to the second terminal of the selector and a third electrode laterally adjacent to the sidewall of the selector.
    Type: Grant
    Filed: September 30, 2017
    Date of Patent: August 10, 2021
    Assignee: Intel Corporation
    Inventors: Ravi Pillarisetty, Abhishek A. Sharma, Van H. Le, Jack T. Kavalieros, Willy Rachmady
  • Patent number: 11081483
    Abstract: Techniques and mechanisms for providing a complementary metal-oxide-semiconductor (CMOS) circuit which includes a group III-nitride (III-N) material. In an embodiment, an n-type transistor of the CMOS circuit comprises structures which are variously disposed on a group III-N semiconductor material. The n-type transistor is coupled to a p-type transistor of the CMOS circuit, wherein a channel region of the p-type transistor comprises a group III-V semiconductor material. The channel region is configured to conduct current along a first direction, where a surface portion of the group III-N semiconductor material extends along a second direction perpendicular to the second direction. In another embodiment, the group III-N semiconductor material includes a gallium-nitride (GaN) compound, and the group III-V semiconductor material includes a nanopillar of an indium antimonide (InSb) compound.
    Type: Grant
    Filed: September 29, 2017
    Date of Patent: August 3, 2021
    Assignee: Intel Corporation
    Inventors: Willy Rachmady, Ravi Pillarisetty, Han Wui Then, Marko Radosavljevic, Sansaptak Dasgupta, Van H. Le
  • Patent number: 11075202
    Abstract: An integrated circuit structure includes a first portion of a bottom semiconductor fin extending horizontally in a length direction and vertically in a height direction, a second portion of the bottom semiconductor fin extending horizontally in the length direction and vertically in the height direction, a top semiconductor fin extending horizontally in the length direction and vertically in the height direction, and an insulator region extending horizontally in the length direction to electrically insulate the first portion of the bottom semiconductor fin from the second portion of the bottom semiconductor fin. The insulator region further extends vertically in the height direction in vertical alignment with the top semiconductor fin. The insulator region includes at least one of an insulator material and an airgap. In an embodiment, the top semiconductor fin is associated with a transistor, and the insulator region is in vertical alignment with a gate electrode of the transistor.
    Type: Grant
    Filed: January 10, 2018
    Date of Patent: July 27, 2021
    Assignee: Intel Corporation
    Inventors: Aaron D. Lilak, Gilbert Dewey, Willy Rachmady, Patrick Morrow, Rishabh Mehandru
  • Patent number: 11075198
    Abstract: An integrated circuit structure includes: a top semiconductor fin extending in a length direction; a bottom semiconductor fin extending in the length direction, the bottom semiconductor fin being under and vertically aligned with the top semiconductor fin; a top gate structure in contact with a portion of the top semiconductor fin; top source and drain regions each adjacent to the portion of the top semiconductor fin; a bottom gate structure in contact with a portion of the bottom semiconductor fin; and bottom source and drain regions each adjacent to the portion of the bottom semiconductor fin. The portion of the top semiconductor fin is between the top source region and the top drain region. The portion of the bottom semiconductor fin is between the bottom source and drain regions. Heights, widths, or both the heights and widths of the portions of the top and bottom semiconductor fins are different.
    Type: Grant
    Filed: January 8, 2018
    Date of Patent: July 27, 2021
    Assignee: Intel Corporation
    Inventors: Aaron D. Lilak, Cheng-ying Huang, Gilbert Dewey, Willy Rachmady, Rishabh Mehandru
  • Publication number: 20210226006
    Abstract: Methods of forming microelectronic structures are described. Embodiments of those methods include forming a nanowire device comprising a substrate comprising source/drain structures adjacent to spacers, and nanowire channel structures disposed between the spacers, wherein the nanowire channel structures are vertically stacked above each other.
    Type: Application
    Filed: April 8, 2021
    Publication date: July 22, 2021
    Inventors: Kelin J. Kuhn, Seiyon Kim, Rafael Rios, Stephen M. Cea, Martin D. Giles, Annalisa Cappellani, Titash Rakshit, Peter Chang, Willy Rachmady
  • Publication number: 20210210620
    Abstract: The present description relates to the fabrication of microelectronic transistor source and/or drain regions using angled etching. In one embodiment, a microelectronic transistor may be formed by using an angled etch to reduce the number masking steps required to form p-type doped regions and n-type doped regions. In further embodiments, angled etching may be used to form asymmetric spacers on opposing sides of a transistor gate, wherein the asymmetric spacers may result in asymmetric source/drain configurations.
    Type: Application
    Filed: March 30, 2016
    Publication date: July 8, 2021
    Applicant: Intel Corporation
    Inventors: Seung Hoon Sung, Robert B. Turkot, Marko Radosavljevic, Han Wui Then, Willy Rachmady, Sansaptak Dasgupta, Jack T. Kavalieros
  • Publication number: 20210202476
    Abstract: A monolithic three-dimensional integrated circuit may include multiple transistor levels separated by one or more levels of metallization. An upper level transistor structure may include a monocrystalline channel material over a bottom gate stack. The channel material and the gate stack materials may be formed on a donor substrate at any suitable temperature, and subsequently transferred from the donor substrate to a host substrate that includes lower-level circuitry. The upper-level transistor may be patterned from the transferred layers so that the gate electrode includes one or more bonding layers. Source and drain material may be patterned from a source and drain material layer that was transferred from the donor substrate along with the channel material, or source and drain material may be grown at low temperatures from the transferred channel material.
    Type: Application
    Filed: December 27, 2019
    Publication date: July 1, 2021
    Inventors: Cheng-Ying Huang, Gilbert Dewey, Ashish Agrawal, Kimin Jun, Willy Rachmady, Zachary Geiger, Cory Bomberger, Ryan Keech, Koustav Ganguly, Anand Murthy, Jack Kavalieros
  • Publication number: 20210202319
    Abstract: A monolithic three-dimensional integrated circuit may include multiple transistor levels separated by one or more levels of metallization. An upper level transistor structure may include monocrystalline source and drain material epitaxially grown from a monocrystalline channel material at a temperature low enough to avoid degradation of a lower level transistor structure and/or degradation of one or more low-k dielectric materials between the transistor levels. A highly conductive n-type silicon source and drain material may be selectively deposited at low temperatures with a high pressure CVD process. Multiple crystals of source drain material arranged in a vertically stacked multi-channel transistor structure may be contacted by a single contact metallization.
    Type: Application
    Filed: December 27, 2019
    Publication date: July 1, 2021
    Applicant: Intel Corporation
    Inventors: Ashish Agrawal, Gilbert Dewey, Cheng-Ying Huang, Willy Rachmady, Anand Murthy, Ryan Keech, Cory Bomberger
  • Publication number: 20210202378
    Abstract: A device includes a device level having a metallization structure coupled to a semiconductor device and a transistor above the device level. The transistor has a body including a single crystal group III-V or group IV semiconductor material, a source structure on a first portion of the body and a drain structure on a second portion of the body, where the source structure is separate from the drain structure. The transistor further includes a gate structure including a first gate structure portion in a recess in the body and a second gate structure portion between the source structure and the drain structure. A source contact is coupled with the source structure and a drain contact is coupled with the drain structure. The source contact is in contact with the metallization structure in the device level.
    Type: Application
    Filed: December 27, 2019
    Publication date: July 1, 2021
    Inventors: Gilbert Dewey, Ryan Keech, Cory Bomberger, Cheng-Ying Huang, Ashish Agrawal, Willy Rachmady, Anand Murthy
  • Patent number: 11049773
    Abstract: A transistor device comprising a channel disposed on a substrate between a source and a drain, a gate electrode disposed on the channel, wherein the channel comprises a channel material that is separated from a body of the same material on a substrate. A method comprising forming a trench in a dielectric layer on an integrated circuit substrate, the trench comprising dimensions for a transistor body including a width; depositing a spacer layer in a portion of the trench, the spacer layer narrowing the width of the trench; forming a channel material in the trench through the spacer layer; recessing the dielectric layer to define a first portion of the channel material exposed and a second portion of the channel material in the trench; and separating the first portion of the channel material from the second portion of the channel material.
    Type: Grant
    Filed: September 30, 2016
    Date of Patent: June 29, 2021
    Assignee: Intel Corporation
    Inventors: Gilbert Dewey, Matthew V. Metz, Sean T. Ma, Cheng-Ying Huang, Tahir Ghani, Anand S. Murthy, Harold W. Kennel, Nicholas G. Minutillo, Jack T. Kavalieros, Willy Rachmady
  • Publication number: 20210193802
    Abstract: Disclosed herein are PN-body-tied field effect transistors (PNBTFETs), as well as related devices and methods. In some embodiments, an integrated circuit (IC) structure may include: a fin including a channel region, a contact region, and an intermediate region between the contact region and the channel region, wherein the channel region includes a dopant of a first type, the intermediate region includes a dopant of a second type different from the first type, and the contact region includes a dopant of the first type; a gate that at least partially wraps around the channel region; and a conductive contact in contact with the contact region.
    Type: Application
    Filed: December 18, 2019
    Publication date: June 24, 2021
    Applicant: Intel Corporation
    Inventors: Aaron D. Lilak, Kerryann Marrietta Foley, Sayed Hasan, Patrick Morrow, Willy Rachmady
  • Patent number: 11031499
    Abstract: An apparatus including a transistor device including a channel disposed on a substrate between a source and a drain, a gate electrode disposed on the channel, wherein the channel includes a length dimension between source and drain that is greater than a length dimension of the gate electrode such that there is a passivated underlap between an edge of the gate electrode and an edge of the channel relative to each of the source and the drain. A method including forming a channel of a transistor device on a substrate; forming first and second passivation layers on a surface of substrate on opposite sides of the channel; forming a gate stack on the channel between first and second passivation layers; and forming a source on the substrate between the channel and the first passivation layer and a drain on the substrate between the channel and the second passivation layer.
    Type: Grant
    Filed: July 2, 2016
    Date of Patent: June 8, 2021
    Assignee: Intel Corporation
    Inventors: Willy Rachmady, Van H. Le, Matthew V. Metz, Benjamin Chu-Kung, Ashish Agrawal, Jack T. Kavalieros
  • Publication number: 20210167216
    Abstract: Deep gate-all-around semiconductor devices having germanium or group 111-V active layers are described. For example, a non-planar semiconductor device includes a hetero-structure disposed above a substrate. The hetero-structure includes a hetero-junction between an upper layer and a lower layer of differing composition. An active layer is disposed above the hetero-structure and has a composition different from the upper and lower layers of the hetero-structure. A gate electrode stack is disposed on and completely surrounds a channel region of the active layer, and is disposed in a trench in the upper layer and at least partially in the lower layer of the hetero-structure. Source and drain regions are disposed in the active layer and in the upper layer, but not in the lower layer, on either side of the gate electrode stack.
    Type: Application
    Filed: February 12, 2021
    Publication date: June 3, 2021
    Inventors: Ravi Pillarisetty, Willy Rachmady, Van H. Le, Seung Hoon Sung, Jessica S. Kachian, Jack T. Kavalieros, Han Wui Then, Gilbert Dewey, Marko Radosavljevic, Benjamin Chu-Kung, Niloy Mukherjee
  • Patent number: 11024714
    Abstract: A nanowire device of the present description may be produced with the incorporation of at least one hardmask during the fabrication of at least one nanowire transistor in order to assist in protecting an uppermost channel nanowire from damage that may result from fabrication processes, such as those used in a replacement metal gate process and/or the nanowire release process. The use of at least one hardmask may result in a substantially damage free uppermost channel nanowire in a multi-stacked nanowire transistor, which may improve the uniformity of the channel nanowires and the reliability of the overall multi-stacked nanowire transistor.
    Type: Grant
    Filed: October 1, 2018
    Date of Patent: June 1, 2021
    Assignee: Sony Corporation
    Inventors: Seung Hoon Sung, Seiyon Kim, Kelin J. Kuhn, Willy Rachmady, Jack T. Kavalieros