Patents by Inventor Wilmert Cyriel Stefaan De Bosscher

Wilmert Cyriel Stefaan De Bosscher has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Conductive sputter targets with silicon, zirconium and oxygen
    Patent number: 11739415
    Abstract: A target for sputtering comprises SiZrxOy wherein x is higher than 0.02 but not higher than 5, and y is higher than 0.03 but not higher than 2*(1+x), wherein the target has an XRD pattern with silicon 2-theta peak at 28.29°+/?0.3°, or a tetragonal phase ZrO2 2-theta peak at 30.05°+/?0.3°. The target has a low resistivity, below 1000 ohm·cm, preferably below 100 ohm·cm, more preferably below 10 ohm·cm, even lower than 1 ohm·cm.
    Type: Grant
    Filed: November 12, 2019
    Date of Patent: August 29, 2023
    Assignee: SOLERAS ADVANCED COATINGS BV
    Inventors: Ignacio Caretti Giangaspro, Wilmert Cyriel Stefaan De Bosscher, David Karel Debruyne, Guy Gobin, Freddy Fack, Hubert Eliano
  • CONDUCTIVE SPUTTER TARGETS WITH SILICON, ZIRCONIUM AND OXYGEN
    Publication number: 20210395878
    Abstract: A target for sputtering comprises SiZrxOy wherein x is higher than 0.02 but not higher than 5, and y is higher than 0.03 but not higher than 2*(1+x), wherein the target has an XRD pattern with silicon 2-theta peak at 28.29°+/?0.3°, or a tetragonal phase ZrO2 2-theta peak at 30.05°+/?0.3°. The target has a low resistivity, below 1000 ohm·cm, preferably below 100 ohm·cm, more preferably below 10 ohm·cm, even lower than 1 ohm·cm.
    Type: Application
    Filed: November 12, 2019
    Publication date: December 23, 2021
    Inventors: Ignacio CARETTI GIANGASPRO, Wilmert Cyriel Stefaan DE BOSSCHER, David Karel DEBRUYNE, Guy GOBIN, Freddy FACK, Hubert ELIANO
  • Sputtering magnetron arrangements with adjustable magnetic field strength
    Publication number: 20040178056
    Abstract: A sputtering magnetron arrangement is disclosed, comprising a magnetic field generator (1) and a target (4) which is associated with said magnetic field generator (1). The magnetic field generator (1) includes a magnetically active element (5-9) and an adjusting means (20-25) which is adapted to deform or deflect locally the magnetically active element (5-9) so as to alter with respect to the target (4) the position of at least a portion of the magnetic field generator (1).
    Type: Application
    Filed: February 2, 2004
    Publication date: September 16, 2004
    Inventors: Wilmert Cyriel Stefaan De Bosscher, Jean-Paul Lammens, Ronny Broche, Guy Gobin, Anja G J Blondeel