Abstract: A substrate support for supporting a substrate. The substrate support includes a main body, a clamping device and a dither device. The main body includes a support surface for supporting the substrate. The clamping device is arranged to provide the clamping force to clamp the substrate on the support surface. The dither device is configured to dither the clamping force. The dither device may be configured to dither the clamping force while the substrate is being loaded onto the support surface.

Abstract: A substrate support for supporting a substrate. The substrate support comprises a main body, a clamping device and a dither device. The main body comprises a support surface for supporting the substrate. The clamping device is arranged to provide the clamping force to clamp the substrate on the support surface. The dither device is configured to dither the clamping force. The dither device may be configured to dither the clamping force while the substrate W is being loaded onto the support surface.

Abstract: A positioning system including: a first body; a second body; and an actuator arranged between the first body and the second body to position the first body relative to the second body, wherein the actuator includes a first piezoelectric actuator and a second piezoelectric actuator arranged in series, wherein the first piezoelectric actuator has a first hysteresis, wherein the second piezoelectric actuator has a second hysteresis smaller than the first hysteresis, and wherein the second piezoelectric actuator has a positioning range at least equal to the first hysteresis.

Abstract: A positioning system including: a first body; a second body; and an actuator arranged between the first body and the second body to position the first body relative to the second body, wherein the actuator includes a first piezoelectric actuator and a second piezoelectric actuator arranged in series, wherein the first piezoelectric actuator has a first hysteresis, wherein the second piezoelectric actuator has a second hysteresis smaller than the first hysteresis, and wherein the second piezoelectric actuator has a positioning range at least equal to the first hysteresis.

Abstract: A substrate support for supporting a substrate. The substrate support comprises a main body, a clamping device and a dither device. The main body comprises a support surface for supporting the substrate. The clamping device is arranged to provide the clamping force to clamp the substrate on the support surface. The dither device is configured to dither the clamping force. The dither device may be configured to dither the clamping force while the substrate W is being loaded onto the support surface.

Abstract: Apparatus (control device) and a method for controlling a torque transmitting device such as a brake, wet clutch, dry clutch (10) during a filling and slip phase is provided, e.g. for coupling a first shaft (12) to a second shaft (14) via the wet clutch (10). A reference profile (52) for a control variable is provided, wherein the chronological progress of said control variable influences the position of a piston (22) for actuating clutch elements (16, 18). Each clutch element (16, 18) is connected to the first shaft (12) or the second shaft (14), with respect to a cylinder (20) of the wet clutch (10), and the control variable is determined during each coupling and a valve (38) for applying a pressure source to the piston (22) is operated, wherein the valve (38) is controlled during each coupling by means of a feed forward closed loop control (54) such that the control variable follows the reference profile (52).

Abstract: Apparatus (control device) and a method for controlling a torque transmitting device such as a brake, wet clutch, dry clutch (10) during a filling and slip phase is provided, e.g. for coupling a first shaft (12) to a second shaft (14) via the wet clutch (10). A reference profile (52) for a control variable is provided, wherein the chronological progress of said control variable influences the position of a piston (22) for actuating clutch elements (16, 18), Each clutch element (16, 18) is connected to the first shaft (12) or the second shaft (14), with respect to a cylinder (20) of the wet clutch (10), and the control variable is determined during each coupling and a valve (38) for applying a pressure source to the piston (22) is operated, wherein the valve (38) is controlled during each coupling by means of a feed forward closed loop control (54) such that the control variable follows the reference profile (52).