Patents by Inventor Wim VANROOSE

Wim VANROOSE has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11523649
    Abstract: According to an embodiment, the invention relates to a computer implemented method for grading a pattern from a first size to a second size, the pattern comprising one or more panels, the method comprising the steps of a representation step comprising representing each panel of the one or more panels by a contour, wherein a contour comprises one or more segments, a constraint step comprising imposing constraints on segments for grading to the second size; generating a mesh of each panel of the one or more panels thereby obtaining a first set of meshes; combining the first set of meshes with the constraints into a system of equations; solving the system of equations into a second set of meshes, wherein the contours of the second meshes correspond to the pattern in the second size and representing the contours of the second set of meshes.
    Type: Grant
    Filed: December 6, 2018
    Date of Patent: December 13, 2022
    Assignee: POLYGONAL BVBA
    Inventors: Wim Vanroose, Samira Lafkioui
  • Publication number: 20210052028
    Abstract: According to an embodiment, the invention relates to a computer implemented method for grading a pattern from a first size to a second size, the pattern comprising one or more panels, the method comprising the steps of a representation step comprising representing each panel of the one or more panels by a contour, wherein a contour comprises one or more segments, a constraint step comprising imposing constraints on segments for grading to the second size; generating a mesh of each panel of the one or more panels thereby obtaining a first set of meshes; combining the first set of meshes with the constraints into a system of equations; solving the system of equations into a second set of meshes, wherein the contours of the second meshes correspond to the pattern in the second size and representing the contours of the second set of meshes.
    Type: Application
    Filed: December 6, 2018
    Publication date: February 25, 2021
    Inventors: Wim VANROOSE, Samira LAFKIOUI