Patents by Inventor Winceslao A. Cebuhar

Winceslao A. Cebuhar has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Methods and Systems to Compensate for a Stitching Disturbance of a Printed Pattern in a Maskless Lithography System Not Utilizing Overlap of the Exposure Zones
    Publication number: 20090033893
    Abstract: A method and system are provided for forming a pattern within an area of a photosensitive surface. An exemplary method includes performing a first exposure of the photosensitive surface in accordance with predetermined image data, wherein the first exposure occurs during a first pass and produces a first image within the area. The image data is adjusted to compensate for identified image deficiencies image deficiencies, the image deficiencies being within a region of the first image. A second exposure, of the photosensitive surface, is performed in accordance with the adjusted image data during a second pass.
    Type: Application
    Filed: July 23, 2008
    Publication date: February 5, 2009
    Applicant: ASML Holding N.V.
    Inventors: Arno Bleeker, Winceslao A. Cebuhar, Azat Latypov