Abstract: A near-net or net shape fused silica glass article, such as a radome. The article is formed by depositing silica soot onto a mandrel having a shape that corresponds to the shape of the fused silica glass article. In some embodiments, the mandrel is inductively heated to a temperature that is sufficient to consolidate or sinter the silica soot upon deposition onto the mandrel to form fused silica glass. The fused silica glass article may have an outer layer that is under compression and/or multiple layers comprising various dopants that can alter or affect physical, mechanical, electrical, and/or optical properties.

Abstract: An image mask and image mask assembly. The image mask includes a glass substrate having a thickness of less than 2 mm and a patterned mask disposed on a surface of the glass substrate. The image mask assembly includes a transparent backer plate coupled to the glass substrate. Methods of writing a pattern on a glass sheet and writing a master pattern into a layer comprising a mask material are also provided.

Abstract: A near-net or net shape fused silica glass article, such as a radome. The article is formed by depositing silica soot onto a mandrel having a shape that corresponds to the shape of the fused silica glass article. In some embodiments, the mandrel is inductively heated to a temperature that is sufficient to consolidate or sinter the silica soot upon deposition onto the mandrel to form fused silica glass. The fused silica glass article may have an outer layer that is under compression and/or multiple layers comprising various dopants that can alter or affect physical, mechanical, electrical, and/or optical properties.

Abstract: An image mask assembly for photolithography. The image mask assembly includes an image mask, a synthetic fused silica pellicle for protecting the image mask, and a frame holding the image mask and pellicle. The image mask includes a synthetic fused silica sheet comprising at least one layer and having a pattern written on a surface of the fused silica sheet. Methods of making the image mask and synthetic fused silica pellicle are also provided.

Abstract: An image mask and image mask assembly. The image mask includes a glass substrate having a thickness of less than 2 mm and a patterned mask disposed on a surface of the glass substrate. The image mask assembly includes a transparent backer plate coupled to the glass substrate. Methods of writing a pattern on a glass sheet and writing a master pattern into a layer comprising a mask material are also provided.