Patents by Inventor Winfried Kaiser
Winfried Kaiser has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20220189892Abstract: A device includes a high frequency chip and a dielectric material arranged between a first area radiating an electromagnetic interference signal in a first frequency range between 1 GHz and 1 THz and a second area receiving the electromagnetic interference signal. An attenuation of the dielectric material is more than 5 dB/cm at least in a subrange of the first frequency range.Type: ApplicationFiled: November 9, 2021Publication date: June 16, 2022Inventors: Pietro BRENNER, Walter HARTNER, Julian Winfried KAISER, Saqib KALEEM
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Patent number: 9529276Abstract: A microlithography projection exposure apparatus for producing microelectronic components has at least two operating states. The microlithography projection exposure apparatus includes a reflective mask in an object plane. In the first operating state, a first partial region of the mask is illuminated by a first radiation, which has an assigned first centroid direction having a first centroid direction vector at each point of the first partial region. In the second operating state, a second partial region of the mask is illuminated by a second radiation, which has an assigned second centroid direction having a second centroid direction vector at each point of the second partial region. The first and the second partial region have a common overlap region.Type: GrantFiled: March 4, 2011Date of Patent: December 27, 2016Assignee: Carl Zeiss SMT GmbHInventors: Hans-Juergen Mann, Winfried Kaiser
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Patent number: 9250104Abstract: The present invention suggests the use of independent, wireless, smart and therefore self-contained sensors (3, 4, 5) in a patient monitoring system (1). The sensors (3, 4, 5) provide their own communication system for transmitting acquired signals to a patient monitor (8) etc. Furthermore a patient identifier (26) is associated to the communication. This approach introduces a patient-related concept, where all communication is personalized and assigned to the patient (2).Type: GrantFiled: June 3, 2005Date of Patent: February 2, 2016Assignee: KONINKLIJKE PHILIPS N.V.Inventors: Harald Greiner, Bernd Wilm, Kai Hassing, Winfried Kaiser
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Publication number: 20110200946Abstract: A microlithography projection exposure apparatus for producing microelectronic components has at least two operating states. The microlithography projection exposure apparatus includes a reflective mask in an object plane. In the first operating state, a first partial region of the mask is illuminated by a first radiation, which has an assigned first centroid direction having a first centroid direction vector at each point of the first partial region. In the second operating state, a second partial region of the mask is illuminated by a second radiation, which has an assigned second centroid direction having a second centroid direction vector at each point of the second partial region. The first and the second partial region have a common overlap region.Type: ApplicationFiled: March 4, 2011Publication date: August 18, 2011Inventors: Hans-Juergen Mann, Winfried Kaiser
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Publication number: 20090118595Abstract: The present invention suggests the use of independent, wireless, smart and therefore self-contained sensors (3, 4, 5) in a patient monitoring system (1). The sensors (3, 4, 5) provide their own communication system for transmitting acquired signals to a patient monitor (8) etc. Furthermore a patient identifier (26) is associated to the communication. This approach introduces a patient-related concept, where all communication is personalized and assigned to the patient (2).Type: ApplicationFiled: June 3, 2005Publication date: May 7, 2009Applicant: KONINKLIJKE PHILIPS ELECTRONICS N.V.Inventors: Harald Greiner, Bernd Wilm, Kai Hassing, Winfried Kaiser
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Publication number: 20080151211Abstract: Projection exposure methods and systems for exposing substrates are disclosed. The methods and systems feature projection objectives capable of multiple exposure configurations having different image side numerical apertures and different image field sizes.Type: ApplicationFiled: December 6, 2007Publication date: June 26, 2008Applicant: CARL ZEISS SMT AGInventors: Winfried Kaiser, Wilhelm Ulrich, Heiko Feldmann, Aurelian Dodoc
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Patent number: 7382536Abstract: An objective for a microlithography projection system has at least one fluoride crystal lens. The effects of birefringence, which are detrimental to the image quality, are reduced if the lens axis of the crystal lens is oriented substantially perpendicular to the {100}-planes or {100}-equivalent crystallographic planes of the fluoride crystal. If two or more fluoride crystal lenses are used, they should have lens axes oriented in the (100)-, (111)-, or (110)-direction of the crystallographic structure, and they should be oriented at rotated positions relative to each other. The birefringence-related effects are further reduced by using groups of mutually rotated (100)-lenses in combination with groups of mutually rotated (111)- or (110)-lenses. A further improvement is also achieved by applying a compensation coating to at least one optical element of the objective.Type: GrantFiled: March 29, 2006Date of Patent: June 3, 2008Assignee: Carl Zeiss SMT AGInventors: Daniel Krähmer, Toralf Gruner, Wilhelm Ulrich, Birgit Enkisch, Michael Gerhard, Martin Brunotte, Christian Wagner, Winfried Kaiser, Manfred Maul, Christof Zaczek
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Patent number: 7310187Abstract: A method of adjusting a projection objective permits the projection objective to be adjusted between an immersion configuration and a dry configuration with few interventions in the system, and therefore to be used optionally as an immersion objective or as a dry objective. The projection objective has a multiplicity of optical elements which are arranged along an optical axis of the projection objective, the optical elements comprising a first group of optical elements following the object plane and a last optical element following the first group, arranged next to the image plane and defining an exit surface of the projection objective which is arranged at a working distance from the image plane. The last optical element is substantially without refracting power and has no curvature or only slight curvature.Type: GrantFiled: April 13, 2007Date of Patent: December 18, 2007Assignee: Carl Zeiss SMT AGInventors: Alexander Epple, Paul Graeupner, Winfried Kaiser, Reiner Garreis, Wilhelm Ulrich
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Publication number: 20070188881Abstract: A method of adjusting a projection objective permits the projection objective to be adjusted between an immersion configuration and a dry configuration with few interventions in the system, and therefore to be used optionally as an immersion objective or as a dry objective. The projection objective has a multiplicity of optical elements which are arranged along an optical axis of the projection objective, the optical elements comprising a first group of optical elements following the object plane and a last optical element following the first group, arranged next to the image plane and defining an exit surface of the projection objective which is arranged at a working distance from the image plane. The last optical element is substantially without refracting power and has no curvature or only slight curvature.Type: ApplicationFiled: April 13, 2007Publication date: August 16, 2007Inventors: Alexander Epple, Paul Graeupner, Winfried Kaiser, Reiner Garreis, Wilhelm Ulrich
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Patent number: 7209292Abstract: A method of adjusting a projection objective permits the projection objective to be adjusted between an immersion configuration and a dry configuration. The projection objective includes optical elements arranged along an optical axis thereof, which include a first group of elements following the object plane and a last optical element following the first group, which is arranged near the image plane. The last optical element defines an exit surface of the projection objective, which is arranged at a working distance from the image plane. The last optical element is substantially without refracting power and has no or only slight curvature. The method includes varying the thickness of the last optical element, changing the refractive index of the space between the exit surface and the image plane by introducing or removing an immersion medium, and axially displacing the last optical element to set a working distance.Type: GrantFiled: May 30, 2003Date of Patent: April 24, 2007Assignee: Carl Zeiss SMT AGInventors: Alexander Epple, Paul Graeupner, Winfried Kaiser, Reiner Garreis, Wilhelm Ulrich
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Patent number: 7180667Abstract: An objective for a microlithography projection system has at least one fluoride crystal lens. The effects of birefringence, which are detrimental to the image quality, are reduced if the lens axis of the crystal lens is oriented substantially perpendicular to the {100}-planes or {100}-equivalent crystallographic planes of the fluoride crystal. If two or more fluoride crystal lenses are used, they should have lens axes oriented in the (100)-, (111)-, or (110)-direction of the crystallographic structure, and they should be oriented at rotated positions relative to each other. The birefringence-related effects are further reduced by using groups of mutually rotated (100)-lenses in combination with groups of mutually rotated (111)- or (110)-lenses. A further improvement is also achieved by applying a compensation coating to at least one optical element of the objective.Type: GrantFiled: April 1, 2004Date of Patent: February 20, 2007Assignee: Carl Zeiss SMT AGInventors: Daniel Krähmer, Toralf Gruner, Wilhelm Ulrich, Birgit Enkisch, Michael Gerhard, Martin Brunotte, Christian Wagner, Winfried Kaiser, Manfred Maul, Christof Zaczek
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Patent number: 7170585Abstract: A projection exposure apparatus for microlithography has a light source, an illumination system, a mask-positioning system and a projection lens. The latter has a system aperture plane and an image plane and contains at least one lens that is made of a material which has a birefringence dependent on the transmission angle. The exposure apparatus further has an optical element, which has a position-dependent polarization-rotating effect or a position-dependent birefringence. This element, which is provided close to a pupil plane of the projection exposure apparatus, compensates at least partially for the birefringent effects produced in the image plane by the at least one lens.Type: GrantFiled: April 7, 2005Date of Patent: January 30, 2007Assignee: Carl Zeiss SMT AGInventors: Martin Brunotte, Jürgen Hartmaier, Hubert Holderer, Winfried Kaiser, Alexander Kohl, Jens Kugler, Manfred Maul, Christian Wagner
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Patent number: 7145720Abstract: An objective for a microlithography projection system has at least one fluoride crystal lens. The effects of birefringence, which are detrimental to the image quality, are reduced if the lens axis of the crystal lens is oriented substantially perpendicular to the {100}-planes or {100}-equivalent crystallographic planes of the fluoride crystal. If two or more fluoride crystal lenses are used, they should have lens axes oriented in the (100)-, (111)-, or (110)-direction of the crystallographic structure, and they should be oriented at rotated positions relative to each other. The birefringence-related effects are further reduced by using groups of mutually rotated (100)-lenses in combination with groups of mutually rotated (111)- or (110)-lenses. A further improvement is also achieved by applying a compensation coating to at least one optical element of the objective.Type: GrantFiled: February 12, 2003Date of Patent: December 5, 2006Assignee: Carl Zeiss SMT AGInventors: Daniel Krähmer, Toralf Gruner, Wilhelm Ulrich, Birgit Enkisch, Michael Gerhard, Martin Brunotte, Christian Wagner, Winfried Kaiser, Manfred Maul, Christof Zaczek
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Patent number: 7126765Abstract: An objective for a microlithography projection system has at least one fluoride crystal lens. The effects of birefringence, which are detrimental to the image quality, are reduced if the lens axis of the crystal lens is oriented substantially perpendicular to the {100}-planes or {100}-equivalent crystallographic planes of the fluoride crystal. If two or more fluoride crystal lenses are used, they should have lens axes oriented in the (100)-, (111)-, or (110)-direction of the crystallographic structure, and they should be oriented at rotated positions relative to each other. The birefringence-related effects are further reduced by using groups of mutually rotated (100)-lenses in combination with groups of mutually rotated (111)- or (110)-lenses. A further improvement is also achieved by applying a compensation coating to at least one optical element of the objective.Type: GrantFiled: January 5, 2005Date of Patent: October 24, 2006Assignee: Carl Zeiss SMT AGInventors: Daniel Krähmer, Toralf Gruner, Wilhelm Ulrich, Birgit Enkisch, Michael Gerhard, Martin Brunotte, Christian Wagner, Winfried Kaiser, Manfred Maul, Christof Zaczek
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Publication number: 20060171020Abstract: An objective for a microlithography projection system has at least one fluoride crystal lens. The effects of birefringence, which are detrimental to the image quality, are reduced if the lens axis of the crystal lens is oriented substantially perpendicular to the {100}-planes or {100}-equivalent crystallographic planes of the fluoride crystal. If two or more fluoride crystal lenses are used, they should have lens axes oriented in the (100)-, (111)-, or (110)-direction of the crystallographic structure, and they should be oriented at rotated positions relative to each other. The birefringence-related effects are further reduced by using groups of mutually rotated (100)-lenses in combination with groups of mutually rotated (111)- or (110)-lenses. A further improvement is also achieved by applying a compensation coating to at least one optical element of the objective.Type: ApplicationFiled: March 29, 2006Publication date: August 3, 2006Applicant: Carl Zeiss SMT AGInventors: Daniel Krahmer, Toralf Gruner, Wilhelm Ulrich, Birgit Enkisch, Michael Gerhard, Martin Brunotte, Christian Wagner, Winfried Kaiser, Manfred Maul, Christoph Zaczek
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Patent number: 7079331Abstract: The invention relates to a device for holding a beam splitter element having an optically active beam splitter layer in an optical imaging device, the beam splitter element being connected to at least one support element that is fastened in the housing of the imaging device. The connection between the beam splitter element and said at least one support element is designed in such a way that the position of the beam splitter layer of the beam splitter element remains nearly constant relative to the housing independently of temperatures and of thermal stresses acting upon the beam splitter element.Type: GrantFiled: April 19, 2005Date of Patent: July 18, 2006Assignee: Carl Zeiss SMT AGInventors: Ulrich Weber, Alexander Kohl, Hubert Holderer, Armin Schoeppach, Erwin Gaber, Winfried Kaiser, Reiner Garreis, Toralf Gruner, Chris Reed, Dragos Pariza, Mike Meehan
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Publication number: 20050264786Abstract: A projection exposure apparatus for microlithography has a light source, an illumination system, a mask-positioning system and a projection lens. The latter has a system aperture plane and an image plane and contains at least one lens that is made of a material which has a birefringence dependent on the transmission angle. The exposure apparatus further has an optical element, which has a position-dependent polarization-rotating effect or a position-dependent birefringence. This element, which is provided close to a pupil plane of the projection exposure apparatus, compensates at least partially for the birefringent effects produced in the image plane by the at least one lens.Type: ApplicationFiled: April 7, 2005Publication date: December 1, 2005Inventors: Martin Brunotte, Jurgen Hartmaier, Hubert Holderer, Winfried Kaiser, Alexander Kohl, Jens Kugler, Manfred Maul, Christian Wagner
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Publication number: 20050248858Abstract: The invention relates to a device for holding a beam splitter element having an optically active beam splitter layer in an optical imaging device, the beam splitter element being connected to at least one support element that is fastened in the housing of the imaging device. The connection between the beam splitter element and said at least one support element is designed in such a way that the position of the beam splitter layer of the beam splitter element remains nearly constant relative to the housing independently of temperatures and of thermal stresses acting upon the beam splitter element.Type: ApplicationFiled: April 19, 2005Publication date: November 10, 2005Applicant: Carl Zeiss SMT AGInventors: Ulrich Weber, Alexander Kohl, Hubert Holderer, Armin Schoeppach, Erwin Gaber, Winfried Kaiser, Reiner Garreis, Toralf Gruner, Chris Reed, Dragos Pariza, Mike Meehan
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Publication number: 20050134967Abstract: A projection exposure apparatus for microlithography has a light source, an illumination system, a mask-positioning system and a projection lens. The latter has a system aperture plane and an image plane and contains at least one lens that is made of a material which has a birefringence dependent on the transmission angle. The exposure apparatus further has an optical element, which has a position-dependent polarization-rotating effect or a position-dependent birefringence. This element, which is provided close to a pupil plane of the projection exposure apparatus, compensates at least partially for the birefringent effects produced in the image plane by the at least one lens.Type: ApplicationFiled: March 3, 2005Publication date: June 23, 2005Applicant: CARL ZEISS SMT AGInventors: Martin Brunotte, Jurgen Hartmaier, Hubert Holderer, Winfried Kaiser, Alexander Kohl, Jens Kugler, Manfred Maul, Christian Wagner
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Publication number: 20050122594Abstract: An objective for a microlithography projection system has at least one fluoride crystal lens. The effects of birefringence, which are detrimental to the image quality, are reduced if the lens axis of the crystal lens is oriented substantially perpendicular to the {100}-planes or {100}-equivalent crystallographic planes of the fluoride crystal. If two or more fluoride crystal lenses are used, they should have lens axes oriented in the (100)-, (111)-, or (110)-direction of the crystallographic structure, and they should be oriented at rotated positions relative to each other. The birefringence-related effects are further reduced by using groups of mutually rotated (100)-lenses in combination with groups of mutually rotated (111)- or (110)-lenses. A further improvement is also achieved by applying a compensation coating to at least one optical element of the objective.Type: ApplicationFiled: January 5, 2005Publication date: June 9, 2005Inventors: Daniel Krahmer, Toralf Gruner, Wilhelm Ulrich, Birgit Enkisch, Michael Gerhard, Martin Brunotte, Christian Wagner, Winfried Kaiser, Manfred Maul, Christoph Zaczek