Patents by Inventor Winfried Kaiser

Winfried Kaiser has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9529276
    Abstract: A microlithography projection exposure apparatus for producing microelectronic components has at least two operating states. The microlithography projection exposure apparatus includes a reflective mask in an object plane. In the first operating state, a first partial region of the mask is illuminated by a first radiation, which has an assigned first centroid direction having a first centroid direction vector at each point of the first partial region. In the second operating state, a second partial region of the mask is illuminated by a second radiation, which has an assigned second centroid direction having a second centroid direction vector at each point of the second partial region. The first and the second partial region have a common overlap region.
    Type: Grant
    Filed: March 4, 2011
    Date of Patent: December 27, 2016
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Hans-Juergen Mann, Winfried Kaiser
  • Patent number: 9250104
    Abstract: The present invention suggests the use of independent, wireless, smart and therefore self-contained sensors (3, 4, 5) in a patient monitoring system (1). The sensors (3, 4, 5) provide their own communication system for transmitting acquired signals to a patient monitor (8) etc. Furthermore a patient identifier (26) is associated to the communication. This approach introduces a patient-related concept, where all communication is personalized and assigned to the patient (2).
    Type: Grant
    Filed: June 3, 2005
    Date of Patent: February 2, 2016
    Assignee: KONINKLIJKE PHILIPS N.V.
    Inventors: Harald Greiner, Bernd Wilm, Kai Hassing, Winfried Kaiser
  • Publication number: 20110200946
    Abstract: A microlithography projection exposure apparatus for producing microelectronic components has at least two operating states. The microlithography projection exposure apparatus includes a reflective mask in an object plane. In the first operating state, a first partial region of the mask is illuminated by a first radiation, which has an assigned first centroid direction having a first centroid direction vector at each point of the first partial region. In the second operating state, a second partial region of the mask is illuminated by a second radiation, which has an assigned second centroid direction having a second centroid direction vector at each point of the second partial region. The first and the second partial region have a common overlap region.
    Type: Application
    Filed: March 4, 2011
    Publication date: August 18, 2011
    Inventors: Hans-Juergen Mann, Winfried Kaiser
  • Publication number: 20090118595
    Abstract: The present invention suggests the use of independent, wireless, smart and therefore self-contained sensors (3, 4, 5) in a patient monitoring system (1). The sensors (3, 4, 5) provide their own communication system for transmitting acquired signals to a patient monitor (8) etc. Furthermore a patient identifier (26) is associated to the communication. This approach introduces a patient-related concept, where all communication is personalized and assigned to the patient (2).
    Type: Application
    Filed: June 3, 2005
    Publication date: May 7, 2009
    Applicant: KONINKLIJKE PHILIPS ELECTRONICS N.V.
    Inventors: Harald Greiner, Bernd Wilm, Kai Hassing, Winfried Kaiser
  • Publication number: 20080151211
    Abstract: Projection exposure methods and systems for exposing substrates are disclosed. The methods and systems feature projection objectives capable of multiple exposure configurations having different image side numerical apertures and different image field sizes.
    Type: Application
    Filed: December 6, 2007
    Publication date: June 26, 2008
    Applicant: CARL ZEISS SMT AG
    Inventors: Winfried Kaiser, Wilhelm Ulrich, Heiko Feldmann, Aurelian Dodoc
  • Patent number: 7382536
    Abstract: An objective for a microlithography projection system has at least one fluoride crystal lens. The effects of birefringence, which are detrimental to the image quality, are reduced if the lens axis of the crystal lens is oriented substantially perpendicular to the {100}-planes or {100}-equivalent crystallographic planes of the fluoride crystal. If two or more fluoride crystal lenses are used, they should have lens axes oriented in the (100)-, (111)-, or (110)-direction of the crystallographic structure, and they should be oriented at rotated positions relative to each other. The birefringence-related effects are further reduced by using groups of mutually rotated (100)-lenses in combination with groups of mutually rotated (111)- or (110)-lenses. A further improvement is also achieved by applying a compensation coating to at least one optical element of the objective.
    Type: Grant
    Filed: March 29, 2006
    Date of Patent: June 3, 2008
    Assignee: Carl Zeiss SMT AG
    Inventors: Daniel Krähmer, Toralf Gruner, Wilhelm Ulrich, Birgit Enkisch, Michael Gerhard, Martin Brunotte, Christian Wagner, Winfried Kaiser, Manfred Maul, Christof Zaczek
  • Patent number: 7310187
    Abstract: A method of adjusting a projection objective permits the projection objective to be adjusted between an immersion configuration and a dry configuration with few interventions in the system, and therefore to be used optionally as an immersion objective or as a dry objective. The projection objective has a multiplicity of optical elements which are arranged along an optical axis of the projection objective, the optical elements comprising a first group of optical elements following the object plane and a last optical element following the first group, arranged next to the image plane and defining an exit surface of the projection objective which is arranged at a working distance from the image plane. The last optical element is substantially without refracting power and has no curvature or only slight curvature.
    Type: Grant
    Filed: April 13, 2007
    Date of Patent: December 18, 2007
    Assignee: Carl Zeiss SMT AG
    Inventors: Alexander Epple, Paul Graeupner, Winfried Kaiser, Reiner Garreis, Wilhelm Ulrich
  • Publication number: 20070188881
    Abstract: A method of adjusting a projection objective permits the projection objective to be adjusted between an immersion configuration and a dry configuration with few interventions in the system, and therefore to be used optionally as an immersion objective or as a dry objective. The projection objective has a multiplicity of optical elements which are arranged along an optical axis of the projection objective, the optical elements comprising a first group of optical elements following the object plane and a last optical element following the first group, arranged next to the image plane and defining an exit surface of the projection objective which is arranged at a working distance from the image plane. The last optical element is substantially without refracting power and has no curvature or only slight curvature.
    Type: Application
    Filed: April 13, 2007
    Publication date: August 16, 2007
    Inventors: Alexander Epple, Paul Graeupner, Winfried Kaiser, Reiner Garreis, Wilhelm Ulrich
  • Patent number: 7209292
    Abstract: A method of adjusting a projection objective permits the projection objective to be adjusted between an immersion configuration and a dry configuration. The projection objective includes optical elements arranged along an optical axis thereof, which include a first group of elements following the object plane and a last optical element following the first group, which is arranged near the image plane. The last optical element defines an exit surface of the projection objective, which is arranged at a working distance from the image plane. The last optical element is substantially without refracting power and has no or only slight curvature. The method includes varying the thickness of the last optical element, changing the refractive index of the space between the exit surface and the image plane by introducing or removing an immersion medium, and axially displacing the last optical element to set a working distance.
    Type: Grant
    Filed: May 30, 2003
    Date of Patent: April 24, 2007
    Assignee: Carl Zeiss SMT AG
    Inventors: Alexander Epple, Paul Graeupner, Winfried Kaiser, Reiner Garreis, Wilhelm Ulrich
  • Patent number: 7180667
    Abstract: An objective for a microlithography projection system has at least one fluoride crystal lens. The effects of birefringence, which are detrimental to the image quality, are reduced if the lens axis of the crystal lens is oriented substantially perpendicular to the {100}-planes or {100}-equivalent crystallographic planes of the fluoride crystal. If two or more fluoride crystal lenses are used, they should have lens axes oriented in the (100)-, (111)-, or (110)-direction of the crystallographic structure, and they should be oriented at rotated positions relative to each other. The birefringence-related effects are further reduced by using groups of mutually rotated (100)-lenses in combination with groups of mutually rotated (111)- or (110)-lenses. A further improvement is also achieved by applying a compensation coating to at least one optical element of the objective.
    Type: Grant
    Filed: April 1, 2004
    Date of Patent: February 20, 2007
    Assignee: Carl Zeiss SMT AG
    Inventors: Daniel Krähmer, Toralf Gruner, Wilhelm Ulrich, Birgit Enkisch, Michael Gerhard, Martin Brunotte, Christian Wagner, Winfried Kaiser, Manfred Maul, Christof Zaczek
  • Patent number: 7170585
    Abstract: A projection exposure apparatus for microlithography has a light source, an illumination system, a mask-positioning system and a projection lens. The latter has a system aperture plane and an image plane and contains at least one lens that is made of a material which has a birefringence dependent on the transmission angle. The exposure apparatus further has an optical element, which has a position-dependent polarization-rotating effect or a position-dependent birefringence. This element, which is provided close to a pupil plane of the projection exposure apparatus, compensates at least partially for the birefringent effects produced in the image plane by the at least one lens.
    Type: Grant
    Filed: April 7, 2005
    Date of Patent: January 30, 2007
    Assignee: Carl Zeiss SMT AG
    Inventors: Martin Brunotte, Jürgen Hartmaier, Hubert Holderer, Winfried Kaiser, Alexander Kohl, Jens Kugler, Manfred Maul, Christian Wagner
  • Patent number: 7145720
    Abstract: An objective for a microlithography projection system has at least one fluoride crystal lens. The effects of birefringence, which are detrimental to the image quality, are reduced if the lens axis of the crystal lens is oriented substantially perpendicular to the {100}-planes or {100}-equivalent crystallographic planes of the fluoride crystal. If two or more fluoride crystal lenses are used, they should have lens axes oriented in the (100)-, (111)-, or (110)-direction of the crystallographic structure, and they should be oriented at rotated positions relative to each other. The birefringence-related effects are further reduced by using groups of mutually rotated (100)-lenses in combination with groups of mutually rotated (111)- or (110)-lenses. A further improvement is also achieved by applying a compensation coating to at least one optical element of the objective.
    Type: Grant
    Filed: February 12, 2003
    Date of Patent: December 5, 2006
    Assignee: Carl Zeiss SMT AG
    Inventors: Daniel Krähmer, Toralf Gruner, Wilhelm Ulrich, Birgit Enkisch, Michael Gerhard, Martin Brunotte, Christian Wagner, Winfried Kaiser, Manfred Maul, Christof Zaczek
  • Patent number: 7126765
    Abstract: An objective for a microlithography projection system has at least one fluoride crystal lens. The effects of birefringence, which are detrimental to the image quality, are reduced if the lens axis of the crystal lens is oriented substantially perpendicular to the {100}-planes or {100}-equivalent crystallographic planes of the fluoride crystal. If two or more fluoride crystal lenses are used, they should have lens axes oriented in the (100)-, (111)-, or (110)-direction of the crystallographic structure, and they should be oriented at rotated positions relative to each other. The birefringence-related effects are further reduced by using groups of mutually rotated (100)-lenses in combination with groups of mutually rotated (111)- or (110)-lenses. A further improvement is also achieved by applying a compensation coating to at least one optical element of the objective.
    Type: Grant
    Filed: January 5, 2005
    Date of Patent: October 24, 2006
    Assignee: Carl Zeiss SMT AG
    Inventors: Daniel Krähmer, Toralf Gruner, Wilhelm Ulrich, Birgit Enkisch, Michael Gerhard, Martin Brunotte, Christian Wagner, Winfried Kaiser, Manfred Maul, Christof Zaczek
  • Publication number: 20060171020
    Abstract: An objective for a microlithography projection system has at least one fluoride crystal lens. The effects of birefringence, which are detrimental to the image quality, are reduced if the lens axis of the crystal lens is oriented substantially perpendicular to the {100}-planes or {100}-equivalent crystallographic planes of the fluoride crystal. If two or more fluoride crystal lenses are used, they should have lens axes oriented in the (100)-, (111)-, or (110)-direction of the crystallographic structure, and they should be oriented at rotated positions relative to each other. The birefringence-related effects are further reduced by using groups of mutually rotated (100)-lenses in combination with groups of mutually rotated (111)- or (110)-lenses. A further improvement is also achieved by applying a compensation coating to at least one optical element of the objective.
    Type: Application
    Filed: March 29, 2006
    Publication date: August 3, 2006
    Applicant: Carl Zeiss SMT AG
    Inventors: Daniel Krahmer, Toralf Gruner, Wilhelm Ulrich, Birgit Enkisch, Michael Gerhard, Martin Brunotte, Christian Wagner, Winfried Kaiser, Manfred Maul, Christoph Zaczek
  • Patent number: 7079331
    Abstract: The invention relates to a device for holding a beam splitter element having an optically active beam splitter layer in an optical imaging device, the beam splitter element being connected to at least one support element that is fastened in the housing of the imaging device. The connection between the beam splitter element and said at least one support element is designed in such a way that the position of the beam splitter layer of the beam splitter element remains nearly constant relative to the housing independently of temperatures and of thermal stresses acting upon the beam splitter element.
    Type: Grant
    Filed: April 19, 2005
    Date of Patent: July 18, 2006
    Assignee: Carl Zeiss SMT AG
    Inventors: Ulrich Weber, Alexander Kohl, Hubert Holderer, Armin Schoeppach, Erwin Gaber, Winfried Kaiser, Reiner Garreis, Toralf Gruner, Chris Reed, Dragos Pariza, Mike Meehan
  • Publication number: 20050264786
    Abstract: A projection exposure apparatus for microlithography has a light source, an illumination system, a mask-positioning system and a projection lens. The latter has a system aperture plane and an image plane and contains at least one lens that is made of a material which has a birefringence dependent on the transmission angle. The exposure apparatus further has an optical element, which has a position-dependent polarization-rotating effect or a position-dependent birefringence. This element, which is provided close to a pupil plane of the projection exposure apparatus, compensates at least partially for the birefringent effects produced in the image plane by the at least one lens.
    Type: Application
    Filed: April 7, 2005
    Publication date: December 1, 2005
    Inventors: Martin Brunotte, Jurgen Hartmaier, Hubert Holderer, Winfried Kaiser, Alexander Kohl, Jens Kugler, Manfred Maul, Christian Wagner
  • Publication number: 20050248858
    Abstract: The invention relates to a device for holding a beam splitter element having an optically active beam splitter layer in an optical imaging device, the beam splitter element being connected to at least one support element that is fastened in the housing of the imaging device. The connection between the beam splitter element and said at least one support element is designed in such a way that the position of the beam splitter layer of the beam splitter element remains nearly constant relative to the housing independently of temperatures and of thermal stresses acting upon the beam splitter element.
    Type: Application
    Filed: April 19, 2005
    Publication date: November 10, 2005
    Applicant: Carl Zeiss SMT AG
    Inventors: Ulrich Weber, Alexander Kohl, Hubert Holderer, Armin Schoeppach, Erwin Gaber, Winfried Kaiser, Reiner Garreis, Toralf Gruner, Chris Reed, Dragos Pariza, Mike Meehan
  • Publication number: 20050134967
    Abstract: A projection exposure apparatus for microlithography has a light source, an illumination system, a mask-positioning system and a projection lens. The latter has a system aperture plane and an image plane and contains at least one lens that is made of a material which has a birefringence dependent on the transmission angle. The exposure apparatus further has an optical element, which has a position-dependent polarization-rotating effect or a position-dependent birefringence. This element, which is provided close to a pupil plane of the projection exposure apparatus, compensates at least partially for the birefringent effects produced in the image plane by the at least one lens.
    Type: Application
    Filed: March 3, 2005
    Publication date: June 23, 2005
    Applicant: CARL ZEISS SMT AG
    Inventors: Martin Brunotte, Jurgen Hartmaier, Hubert Holderer, Winfried Kaiser, Alexander Kohl, Jens Kugler, Manfred Maul, Christian Wagner
  • Publication number: 20050122594
    Abstract: An objective for a microlithography projection system has at least one fluoride crystal lens. The effects of birefringence, which are detrimental to the image quality, are reduced if the lens axis of the crystal lens is oriented substantially perpendicular to the {100}-planes or {100}-equivalent crystallographic planes of the fluoride crystal. If two or more fluoride crystal lenses are used, they should have lens axes oriented in the (100)-, (111)-, or (110)-direction of the crystallographic structure, and they should be oriented at rotated positions relative to each other. The birefringence-related effects are further reduced by using groups of mutually rotated (100)-lenses in combination with groups of mutually rotated (111)- or (110)-lenses. A further improvement is also achieved by applying a compensation coating to at least one optical element of the objective.
    Type: Application
    Filed: January 5, 2005
    Publication date: June 9, 2005
    Inventors: Daniel Krahmer, Toralf Gruner, Wilhelm Ulrich, Birgit Enkisch, Michael Gerhard, Martin Brunotte, Christian Wagner, Winfried Kaiser, Manfred Maul, Christoph Zaczek
  • Patent number: 6879379
    Abstract: A projection exposure apparatus for microlithography has a light source, an illumination system, a mask-positioning system and a projection lens. The latter has a system aperture plane and an image plane and contains at least one lens that is made of a material which has a birefringence dependent on the transmission angle. The exposure apparatus further has an optical element, which has a position-dependent polarization-rotating effect or a position-dependent birefringence. This element, which is provided close to a pupil plane of the projection exposure apparatus, compensates at least partially for the birefringent effects produced in the image plane by the at least one lens.
    Type: Grant
    Filed: November 14, 2003
    Date of Patent: April 12, 2005
    Assignee: Carl Zeiss SMT AG
    Inventors: Martin Brunotte, Jürgen Hartmaier, Hubert Holderer, Winfried Kaiser, Alexander Kohl, Jens Kugler, Manfred Maul, Christian Wagner