Patents by Inventor Wing C. Yip

Wing C. Yip has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method of manufacturing photo-alignment layer
    Patent number: 6582776
    Abstract: A photo-alignment layer having excellent long-term stability to light and heat is manufactured by coating a material for the photo-alignment layer, which contains a dichroic dye having two or more polymerizable groups per molecule, on a substrate, and exposing the coating layer to polarized light, thereby imparting a photo-alignment function, and polymerizing the polymerizable groups by heating or light exposure.
    Type: Grant
    Filed: November 19, 2001
    Date of Patent: June 24, 2003
    Assignees: Hong Kong University of Science And Technology, Dainippon Ink and Chemicals, Inc.
    Inventors: Wing C. Yip, Elena K. Prudnikova, Hoi S. Kwok, Vladimir G. Chigrinov, Vladimir M. Kozenkov, Hirokazu Takada, Masanobu Fukuda
  • Method of manufacturing photo-alignment layer
    Publication number: 20020098295
    Abstract: A photo-alignment layer having excellent long-term stability to light and heat is manufactured by coating a material for the photo-alignment layer, which contains a dichroic dye having two or more polymerizable groups per molecule, on a substrate, and exposing the coating layer to polarized light, thereby imparting a photo-alignment function, and polymerizing the polymerizable groups by heating or light exposure.
    Type: Application
    Filed: November 19, 2001
    Publication date: July 25, 2002
    Applicant: HONG KONG UNIVERSITY OF SCIENCE AND TECHNOLOGY
    Inventors: Wing C. Yip, Elena K. Prudnikova, Hoi S. Kwok, Vladimir G. Chigrinov, Vladimir M. Kozenkov, Hirokazu Takada, Masanobu Fukuda