Patents by Inventor Witold Fortuniak

Witold Fortuniak has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20090156776
    Abstract: A process for making a Si—H functional siloxane oligomer from the reaction between silicon hydride compositions and cyclic siloxane oligomer in the presence of a Lewis acid is provided. The Lewis acid is operable to interact with the hydrogen of the silicon hydride to promote ring opening of the cyclic siloxane oligomer and the insertion a siloxane oligomer segment between Si and H atom to thereby form the Si—H functional siloxane oligomer.
    Type: Application
    Filed: February 18, 2009
    Publication date: June 18, 2009
    Inventors: Slawomir Rubinsztajn, Witold Fortuniak, Julian Chojnowski, Jan Kurjata
  • Patent number: 7148370
    Abstract: The present invention provides a novel method for the preparation of diorganosilanes by disproportionation of a hydridosiloxanes comprising at least one terminal SiH group and at least one siloxane bond in the presence of Lewis acid catalysts. The reaction is both selective and occurs under mild conditions. The triaryl borane, tris(petafluorophenyl)borane, is especially suited for use as a catalyst in the reaction. Organic catalysts such as tris(pentafluorophenyl)borane are typically preferred owing to their greater solubility and stability in the reaction mixture, relative to inorganic Lewis acid catalysts. The product, diorganosilane may be isolated from the product mixture by conventional techniques such as distillation.
    Type: Grant
    Filed: July 20, 2005
    Date of Patent: December 12, 2006
    Assignee: General Electric Company
    Inventors: Slawomir Rubinsztajn, James Anthony Cella, Julian Chojnowski, Witold Fortuniak, Jan Kurjata
  • Publication number: 20060241271
    Abstract: A process for making a Si—H functional siloxane oligomer from the reaction between silicon hydride compositions and cyclic siloxane oligomer in the presence of a Lewis acid is provided. The Lewis acid is operable to interact with the hydrogen of the silicon hydride to promote ring opening of the cyclic siloxane oligomer and the insertion a siloxane oligomer segment between Si and H atom to thereby form the Si—H functional siloxane oligomer.
    Type: Application
    Filed: June 7, 2005
    Publication date: October 26, 2006
    Inventors: Slawomir Rubinsztajn, Witold Fortuniak, Julian Chojnowski, Jan Kurjata