Abstract: A lithography apparatus includes a first optical system configured to irradiate a mask with a non-telecentric illumination and a second optical system configured to guide radiation reflected off or transmitted through the mask to a substrate. The mask includes an absorber structure arranged over a non-absorbing surface, wherein the absorber structure includes sidewalls extending in a first direction intersecting a main plane of incidence of the non-telecentric illumination. The sidewall angle of the sidewalls may be at most equal to 90° minus the angle of incidence of the non-telecentric illumination and at least equal to 90° minus the sum of the angle of incidence and a half acceptance angle of the second optical system.

Abstract: The invention concerns an irradiation device for testing objects coated with light-sensitive paint, comprising a EUV radiation source, an optical system for filtering the radiation of the EUV radiation source a chamber for receiving the object, as well as systems for intersecting the trajectory of the rays on the object. The invention also concerns a method for operating such a device. The invention aims at obtaining as quickly as possible an illumination at least partly simultaneous of several irradiation fields, with different doses, by using an inexpensive laboratory radiation source without resorting to complex optical systems. Therefor, the invention provides a device comprising a simplified and compact optical system, with closable diaphragm apertures located in front of the object to be irradiated and at least one control sensor placed on the trajectory of the rays and enabling the radiation dose to be measured.

Abstract: A method for smoothing areas of a structure made of a first material having a predetermined first glass transition temperature on a carrier includes the steps of: (1) applying a second material having a predetermined second glass transition temperature, so that the surface of the structure of the first material is at least partially covered by the second material; (2) increasing the temperature of the first material to a first predeterminable temperature, which is greater than the first glass transition temperature; and (3) lowering the temperature of the first material below the first glass transition temperature of the first material.

Abstract: The invention concerns an irradiation device for testing objects coated with light-sensitive paint, comprising a EUV radiation source, an optical system for filtering the radiation of the EUV radiation source a chamber for receiving the object, as well as systems for intersecting the trajectory of the rays on the object. The invention also concerns a method for operating such a device. The invention aims at obtaining as quickly as possible an illumination at least partly simultaneous of several irradiation fields, with different doses, by using an inexpensive laboratory radiation source without resorting to complex optical systems. Therefor, the invention provides a device comprising a simplified and compact optical system, with closable diaphragm apertures located in front of the object to be irradiated and at least one control sensor placed on the trajectory of the rays and enabling the radiation dose to be measured.

Abstract: A chemically amplified photo-resist includes a polymer containing acid-labile radicals attached to a polar group and also contains anchor groups that allow attachment of a consolidating agent. The polymer includes first repeating units containing siloxane groups. The photoresist on the one hand exhibits an enhanced transparency for short-wavelength radiation and on the other hand permits chemical consolidation of the structured resist. A process for producing structured resists is a also described.

Abstract: A method for smoothing areas of a structure made of a first material having a predetermined first glass transition temperature on a carrier includes the steps of: (1) applying a second material having a predetermined second glass transition temperature, so that the surface of the structure of the first material is at least partially covered by the second material; (2) increasing the temperature of the first material to a first predeterminable temperature, which is greater than the first glass transition temperature; and (3) lowering the temperature of the first material below the first glass transition temperature of the first material.

Abstract: A chemically amplified photo-resist includes a polymer containing acid-labile radicals attached to a polar group and also contains anchor groups that allow attachment of a consolidating agent. The polymer includes first repeating units containing siloxane groups. The photoresist on the one hand exhibits an enhanced transparency for short-wavelength radiation and on the other hand permits chemical consolidation of the structured resist. A process for producing structured resists is a also described.

Abstract: A fuel cell with a proton-conducting membrane, on which catalyst material and a collector are arranged on both sides, is characterized by the following features: on the side facing the membrane (14), the collectors (16,18) are provided with an electrically conductive gas-permeable carbon aerogel with a surface roughness of <2 .mu.m; a catalyst layer (15, 17) of platinum or a platinum alloy is in each case applied to the carbon aerogel by material bonding; and a membrane (14), deposited by plasma-chemical means, with a layer thickness of between 3 and 50 .mu.m, is located between the catalyst layers (15, 17).