Abstract: A coated cutting tool includes a substrate and a coating. The coating has a (Ti,Al,Si)N layer, which has a periodical change in contents of the elements Ti, Al, and Si, over the thickness of the (Ti,Al,Si)N layer, between a minimum content and a maximum content of each element. The average minimum content of Ti is from 14 to 18 at. % and the average maximum content of Ti is from 18 to 22 at. %. The average minimum content of Al is from 18 to 22 at. % and the average maximum content of Al is from 24 to 28 at. %. The average minimum content of Si is from 0 to 2 at. % and the average maximum content of Si is from 1 to 5 at. %. The remaining content in the (Ti,Al,Si)N layer is a noble gas in an average content of from 0.1 to 5 at. % and the element N.

Abstract: A coated cutting tool and a process for the production thereof id provided. The coated cutting tool consists of a substrate body of WC-Co based cemented carbide and a coating, the coating including a first (Ti,Al)N multilayer, a first gamma-aluminium oxide layer, and a set of alternating second (Ti,Al)N multilayers and second gamma-aluminium oxide layers.

Abstract: A coated cutting tool includes a substrate with a coating including a (Ti,Al)N layer having an overall composition (TixAl1-x)N, 0.34?x?0.65. The (Ti,Al)N layer contains columnar (Ti,Al)N grains with an average grain size of from 10 to 100 nm. The (Ti,Al)N layer also includes lattice planes of a cubic crystal structure. The (Ti,Al)N layer shows a pattern in electron diffraction analysis, wherein there is a diffraction signal existing, which is shown as a peak (P) in an averaged radial intensity distribution profile having its maximum within a scattering vector range of from 3.2 to 4.0 nm?1, the full width half maximum (FWHM) of the peak (P) being from 0.8 to 2.0 nm?1.

Abstract: The present coated cutting tool includes a substrate with a coating including a layer of TixAlyCrzSivN, where x is 0.30-0.50, y is 0.25-0.45, z is 0.05-0.15, and v is 0.10-0.20, x+y+z+v=1. The layer has a cubic phase with a distribution of unit cell lengths within the range 3.96 to 4.22 ? for the cubic cell. The unit cell length range 3.96 to 4.22 ? includes more than one intensity maximum in an averaged radial intensity profile of an electron diffraction pattern.

Abstract: A coated cutting tool includes a substrate having a coating including a layer of aluminium nitride, which has a phase of aluminium nitride (P). The phase of aluminium nitride (P) has an electron diffraction pattern, wherein up to a scattering vector of q=8.16 nm?1 there is at least one additional reflection (R) to any reflection found in the cubic and hexagonal aluminium nitride diffraction patterns.

Abstract: A coated cutting tool and a process for the production thereof is provided. The coated cutting tool includes a substrate and a hard material coating, the substrate being selected from cemented carbide, cermet, ceramics, cubic boron nitride, polycrystalline diamond or high-speed steel. The hard material coating includes a (Ti,Al)N layer stack of alternately stacked (Ti,Al)N sub-layers. The layer stack has an overall atomic ratio of Ti:Al within the (Ti,Al)N layer stack within the range from 0.33:0.67 to 0.67:0.33, a total thickness of the (Ti,Al)N layer stack within the range from 1 ?m to 20 ?m, each of the individual (Ti,Al)N sub-layers within the (Ti,Al)N layer stack of alternately stacked (Ti,Al)N sub-layers having a thickness within the range from 0.5 nm to 50 nm, each of the individual (Ti,Al)N sub-layers within the (Ti,Al)N layer stack of alternately stacked (Ti,Al)N sub-layers being different in respect of the atomic ratio Ti:Al than an immediately adjacent (Ti,Al)N sub-layer, and other characteristics.

Abstract: A coated cutting tool and a process for the production thereof is provided. The coated cutting tool includes a substrate and a hard material coating, the substrate being selected from cemented carbide, cermet, ceramics, cubic boron nitride, polycrystalline diamond or high-speed steel. The hard material coating includes a (Ti,Al)N layer stack of alternately stacked (Ti,Al)N sub-layers. The layer stack has an overall atomic ratio of Ti:Al within the (Ti,Al)N layer stack within the range from 0.33:0.67 to 0.67:0.33, a total thickness of the (Ti,Al)N layer stack within the range from 1 ?m to 20 ?m, each of the individual (Ti,Al)N sub-layers within the (Ti,Al)N layer stack of alternately stacked (Ti,Al)N sub-layers having a thickness within the range from 0.5 nm to 50 nm, each of the individual (Ti,Al)N sub-layers within the (Ti,Al)N layer stack of alternately stacked (Ti,Al)N sub-layers being different in respect of the atomic ratio Ti:Al than an immediately adjacent (Ti,Al)N sub-layer, and other characteristics.

Abstract: A solid carbide milling cutter has a substrate of hard metal and a multi-layer coating deposited at least to surface regions that contact a workpiece during a milling operation. The multi-layer coating includes a single-layer or a multi-layer functional layer deposited directly on the substrate surface and a single-layer or a multi-layer covering layer deposited on the functional layer. The functional layer has one or more layers of TixAl1-xN with 0.3?x?0.55. The covering layer has one or more layers of ZrN. The functional layer and the covering layer are deposited by HIPIMS, wherein during the deposition of the functional layer power pulses are applied to each sputtering target consisting of material to be deposited, which power pulses transfer an amount of energy to each sputtering target that exceeds a maximum power density in the pulse of ?500 W/cm2.

Abstract: A test device (80) for testing for the presence of a substance in a sample held on a sample carrier (30) includes a holder (82) for holding a sample carrier (30) which includes one or more chambers (50,52). The test device (80) also includes an actuator for compressing or depressurizing the chamber(s) (50,52). The actuator is configured to prevent reinflation of the chamber(s) (50,52) after compression or depressurization.

Abstract: A solid carbide milling cutter has a substrate of hard metal and a multi-layer coating deposited at least to surface regions that contact a workpiece during a milling operation. The multi-layer coating includes a single-layer or a multi-layer functional layer deposited directly on the substrate surface and a single-layer or a multi-layer covering layer deposited on the functional layer. The functional layer has one or more layers of TixAl1-xN with 0.3?x?0.55. The covering layer has one or more layers of ZrN. The functional layer and the covering layer are deposited by HIPIMS, wherein during the deposition of the functional layer power pulses are applied to each sputtering target consisting of material to be deposited, which power pulses transfer an amount of energy to each sputtering target that exceeds a maximum power density in the pulse of ?500 W/cm2.

Abstract: Cutting tool has a substrate and a multilayer coating deposited by PVD. The coating comprises a base layer of one or more identical or different layers of a nitride or carbonitride which contains at least aluminium (Al) and a chromium-containing, oxidic functional layer. Attachment of the chromium-containing functional layer is improved by an intermediate layer of one or more oxides or oxide nitrates of the metals Al, Cr, Si, and/or Zr provided between the base layer and the functional layer. The intermediate layer has a cubic structure and the chromium-containing functional layer is selected from chromium oxide (Cr2O3), chromium oxynitride, aluminium-chromium oxide (AlCr)2O3, aluminium-chromium oxynitride or a mixed oxide or mixed oxynitride of aluminium, chromium and further metals of (AlCrMe1, Men)2 oxide or (AlCrMe1, Men)2 oxynitride, where Me . . . Men means one or more further metals, selected from Hf, Y, Zr and Ru, and wherein the functional layer has a rhombohedral structure.

Abstract: A test device (80) for testing for the presence of a substance in a sample held on a sample carrier (30) includes a holder (82) for holding a sample carrier (30) which includes one or more chambers (50,52). The test device (80) also includes an actuator for compressing or depressurising the chamber(s) (50,52). The actuator is configured to prevent reinflation of the chamber(s) (50,52) after compression or depressurisation.

Abstract: The present invention concerns a method for depositing mixed crystal layers with at least two different metals on a substrate by means of PVD methods. To provide a method of depositing mixed crystal layers with at least two different metals on a substrate by means of PVD methods, which gives mixed crystal layers which are as free as possible of macroparticles (droplets) and which have a proportion as high as possible of a desired crystalline phase and which are highly crystalline, it is proposed according to the invention that deposition of the mixed crystal layer is effected with simultaneous application of i) the cathode sputtering method of dual magnetron sputtering or high power impulse magnetron sputtering and ii) arc vapour deposition.

Abstract: Cutting tool has a substrate and a multilayer coating deposited by PVD. The coating comprises a base layer of one or more identical or different layers of a nitride or carbonitride which contains at least aluminium (Al) and a chromium-containing, oxidic functional layer. Attachment of the chromium-containing functional layer is improved by an intermediate layer of one or more oxides or oxide nitrates of the metals Al, Cr, Si, and/or Zr provided between the base layer and the functional layer. The intermediate layer has a cubic structure and the chromium-containing functional layer is selected from chromium oxide (Cr2O3), chromium oxynitride, aluminium-chromium oxide (AlCr)2O3, aluminium-chromium oxynitride or a mixed oxide or mixed oxynitride of aluminium, chromium and further metals of (AlCrMe1, Men)2 oxide or (AlCrMe1, Men)2 oxynitride, where Me . . . Men means one or more further metals, selected from Hf, Y, Zr and Ru, and wherein the functional layer has a rhombohedral structure.

Abstract: The invention relates to a cutting tool having a substrate base body and a single or multi-layered coating attached thereupon, wherein at least one layer of the coating is a metal oxide layer produced in the PVD process or in the CVD process and the metal oxide layer has a grain structure wherein there is structural disorder within a plurality of the existing grains that are characterized in that in electron diffraction images of the grains, point-shaped reflections occur up to a maximum lattice spacing dGRENZ and for lattice spacing greater than dGRENZ no point-shaped reflections occur, but rather a diffuse intensity distribution typical for amorphous structures.

Abstract: The invention concerns a cutting tool comprising a base body and a multi-layer coating applied thereto, which, possibly besides further layers, includes a plurality of main layers A and intermediate layers B applied alternately directly one upon the other, wherein the main layers A and the intermediate layers B are respectively metal oxide layers produced by the PVD process, the thickness of the main layers A is in the range of 4 nm to 1 ?m, and the thickness of the intermediate layers B is in the range of 2 nm to 50 nm, wherein the ratio of the thicknesses of the intermediate layers B to the thicknesses of the main layers A is in the range of 1:2 to 1:100.

Abstract: The present invention concerns a method for depositing mixed crystal layers with at least two different metals on a substrate by means of PVD methods. To provide a method of depositing mixed crystal layers with at least two different metals on a substrate by means of PVD methods, which gives mixed crystal layers which are as free as possible of macroparticles (droplets) and which have a proportion as high as possible of a desired crystalline phase and which are highly crystalline, it is proposed according to the invention that deposition of the mixed crystal layer is effected with simultaneous application of i) the cathode sputtering method of dual magnetron sputtering or high power impulse magnetron sputtering and ii) arc vapour deposition.

Abstract: The invention relates to a cutting tool having a substrate base body and a single or multi-layered coating attached thereupon, wherein at least one layer of the coating is a metal oxide layer produced in the PVD process or in the CVD process and the metal oxide layer has a grain structure wherein there is structural disorder within a plurality of the existing grains that are characterized in that in electron diffraction images of the grains, point-shaped reflections occur up to a maximum lattice spacing dGRENZ and for lattice spacing greater than dGRENZ no point-shaped reflections occur, but rather a diffuse intensity distribution typical for amorphous structures.

Abstract: The invention concerns a cutting tool comprising a base body and a multi-layer coating applied thereto, which, possibly besides further layers, includes a plurality of main layers A and intermediate layers B applied alternately directly one upon the other, wherein the main layers A and the intermediate layers B are respectively metal oxide layers produced by the PVD process, the thickness of the main layers A is in the range of 4 nm to 1 ?m, and the thickness of the intermediate layers B is in the range of 2 nm to 50 nm, wherein the ratio of the thicknesses of the intermediate layers B to the thicknesses of the main layers A is in the range of 1:2 to 1:100.