Abstract: The present invention relates to a quartz glass blank for an optical component for transmitting radiation of a wavelength of 15 nm and shorter, the blank consisting of highly pure quartz glass, doped with titanium and/or fluorine, which is distinguished by an extremely high homogeneity. The homogeneity relates to the following features: a) micro-inhomogeneities caused by a local variance of the TiO2 distribution (<0.05% TiO2, averaged over a volume element of (5 ?m)3 in relation to the mean value of the TiO2 content), b) an absolute maximum inhomogeneity in the thermal expansion coefficient ?? in the main functional direction (<5 ppb/K), c) a radial variance of the thermal expansion coefficient over the usable surface of the quartz glass blank of not more than 0.4 ppb/(K.cm); d) a maximum stress birefringence (SDB) at 633 nm in the main functional direction of 2 nm/cm with a specific progression; and e) a specific progression of the ??, averaged according to (b) on the optical surface.

Abstract: The present invention relates to a quartz glass blank for an optical component for transmitting radiation of a wavelength of 15 nm and shorter, the blank consisting of highly pure quartz glass, doped with titanium and/or fluorine, which is distinguished by an extremely high homogeneity. The homogeneity relates to the following features: a) micro-inhomogeneities caused by a local variance of the TiO2 distribution (<0.05% TiO2, averaged over a volume element of (5 ?m)3 in relation to the mean value of the TiO2 content), b) an absolute maximum inhomogeneity in the thermal expansion coefficient ?? in the main functional direction (<5 ppb/K), c) a radial variance of the thermal expansion coefficient over the usable surface of the quartz glass blank of not more than 0.4 ppb/(K·cm); d) a maximum stress birefringence (SDB) at 633 nm in the main functional direction of 2 nm/cm with a specific progression; and e) a specific progression of the ??, averaged according to (b) on the optical surface.

Abstract: To facilitate the start of a process using a quartz glass crucible with a crucible body and an inner layer of quartz glass a quartz glass crucible is provided with an inner surface roughened at least in the starting zone region by multiple depressions disposed at a maximum distance of 5 mm from one another. Furthermore, a simple and inexpensive process for the manufacture of such a quartz glass crucible is described, by providing a crucible body with a smooth inner surface of quartz glass and subsequently roughening the inner layer in the starting zone region by multiple depressions disposed at a maximum of 5 mm from one another.

Abstract: A method of preparing a high purity massive synthetic silica glass article. The method includes a homogenizing step, wherein a rod shaped synthetic silica glass material has a greater optical homogeneity in a plane perpendicular to its rotational axis than a plane parallel thereto, a step of forming the homogeneous synthetic silica glass and a step of cutting the formed synthetic silica glass.

Abstract: A method of preparing a ball-shaped synthetic silica glass optical article. The method includes a step of providing a rod-shaped synthetic silica glass having end faces at both sides thereof and having fewer cords per unit volume viewed in a direction perpendicular to a line connecting the end faces relative to the number of cords per unit volume viewed in a direction along the line connecting the end faces. The synthetic silica glass being optically homogeneous in the direction perpendicular to the line connecting the end faces. The method includes the further step of establishing support portions at the end faces of the synthetic silica glass. The rod-shaped synthetic silica glass is thereupon heated while being rotated around an axis connecting the support portions wherein a molten zone is formed.

Abstract: A shaped body of amorphous silicon dioxide, which has a chemical purity of at least 99.9% and a cristobalite content of at most 1% and which is impermeable to gas, is known. To provide shaped bodies of amorphous silicon dioxide which have a high precision, which can be small or large in size and of simple to complicated shape, which have a chemical purity of at least 99.9%, are impermeable to gas above wall thicknesses of 1 mm, which have a high cold flexural strength, low thermal conductivity and low radiation of heat, which are thermal shock resistant and can be exposed repeatedly or also long-term to temperatures in the range from 1000.degree. to 1300.degree. C. and which can be welded in a sharply delineated manner without spreading joins and which have a low spectral transmission from the ultraviolet to the middle infrared spectral region, the shaped body is opaque, contains pores, at a wall thickness of 1 mm has a direct spectral transmission which is virtually constant in the wavelength range from .

Abstract: Semifinished products designed as composite bodies for electronic or opto-electronic semiconductor components are known. The composite bodies are made of a disk-shaped, transparent quartz glass substrate and a wafer made of a semiconductor material. The directly bonded surfaces of the quartz glass substrate and wafer are polished before being mutually bonded. In order to create a semifinished product that resists temperatures above 900.degree. C., such as those used to produce semiconductor circuits in industrially feasible times, without raising fears of a substantial reduction of the adhesive forces, chipping of the wafers away from each other or an undesirable deformation of the composite body, the substrate quartz glass is a synthetic quartz glass with at least 10.sup.14.0 poise viscosity at 950.degree. C. which does not fall below 10.sup.12 poise at 1050.degree. C.

Abstract: A high purity ball-shaped optical article formed of silica glass useful in optical systems employed in photolithography applications. The optical article is characterized by end faces and a side face positioned between the end faces. The side face is externally projected beyond the outline of the end faces and has a spherical configuration. The optical article is uniquely characterized by a smaller number of cords per unit area, viewed in a direction perpendicular to a line connecting the end faces, than the number of cords per unit area viewed in a direction along the line connecting the end faces. The article is also defined by optical homogeneity in a direction perpendicular to the line connecting the end faces.

Abstract: Molded bodies of quartz glass have at least one surface area of transparent quartz glass, the exposed surfaces of which are smooth and which have a surface microroughness of less than 8 .mu.m. The base material has a chemical purity of at least 99.9% and a cristobalite content of no more than 1%; is gas-impermeable and opaque; and contains pores. At a wall thickness of 1 mm, the base material has a nearly uniform direct spectral transmission of less than 10% in the wavelength range of .lambda.=190-2,650 nm; and which has a density of at least 2.215 g/cm.sup.3. The transparent surface area is formed from base material by heating it to a temperature above 1,650.degree. C. The thickness of the transparent layer is at least 0.5 mm, and its direct spectral transmission in the wavelength range of .lambda.=6001-2,650 nm is at least 60% for a layer thickness of 1 mm.

Abstract: A shaped body of amorphous silicon dioxide, which has a chemical purity of at least 99.9% and a cristobalite content of at most 1% and which is impermeable to gas, is known. To provide shaped bodies of amorphous silicon dioxide which have a high precision, which can be small or large in size and of simple to complicated shape, which have a chemical purity of at least 99.9%, are impermeable to gas above wall thicknesses of 1 mm, which have a high cold flexural strength, low thermal conductivity and low radiation of heat, which are thermal shock resistant and can be exposed repeatedly or also long-term to temperatures in the range from 1000.degree. to 1300.degree. C. and which can be welded in a sharply delineated manner without spreading joins and which have a low spectral transmission from the ultraviolet to the middle infrared spectral region, the shaped body is opaque, contains pores, at a wall thickness of 1 mm has a direct spectral transmission which is virtually constant in the wavelength range from .

Abstract: To produce a free-flowing granulate which has a high bulk density and a defined particle size distribution, which generates little dust, is easy to handle, and is suitable as a starting material for quartz glass products, the mixing operation includes a first mixing phase, in which the materials to be mixed are subjected to a slow mixing action to form a coarse-grained mass, and a second mixing phase, in which the coarse-grained mass is converted to a fine-grained mass by a more intensive mixing action which grinds and compacts the grains. The content of silica powder in the materials to be mixed is adjusted at least during the second mixing phase to a value of at least 75 wt. %.

Abstract: A process for the production of homogeneous ream-free bodies made of quartz glass or made of a glass having a high content of silicic acid, in which an essentially bar-shaped initial body is twisted about its longitudinal axis in a shaping step to form a twisted body radially homogenized in layers having axial layering. To make it possible to produce homogeneous large-volume bodies, in at least one further shaping step the twisted body is then softened in a heatable mold under a force acting in the axial direction to deform it in a direction transverse to its axial direction into the mold and form a glass bar, the longitudinal axis of which extends essentially perpendicular to the layering. The glass bar is then twisted about its longitudinal axis.

Abstract: Granular silicon dioxide is placed in a treatment chamber which is heated to a temperature ranging from 700.degree. to 1300.degree. C. The chamber is then rotated for a prescribed period of time to mix the grains while a gaseous atmosphere of chlorine and/or hydrogen chloride is passed through the treatment chamber. The mixing period is followed by a resting period which is at least ten times longer than the mixing time. During the resting period the grains are exposed to a constant electric field having a strength of 600 to 1350 V/cm applied across the chamber. The foregoing cycle is repeated several times. For working the process a device is used which includes a quartz glass rotary tube into which hollow silicon carbide electrodes extend.

Abstract: A method of vitrifying a porous cylindrical article made out of glass soot, especially for manufacturing a preliminary blank for optical fibers. The article is heat-treated in a furnace in a vacuum or in an atmosphere that contains helium. The porous article is placed in a horizontal graphite tube in the furnace, is sintered therein for 20 to 40 minutes in a vacuum or in a helium atmosphere with reduced pressure at 1250.degree. to 1400.degree. C., and is subsequently vitrified by heat-treating the sintered article at first in the sintering atmosphere, while slowly rotating it in the hot graphite tube for 20 to 40 minutes at approximately 1450.degree. to 1600.degree. C. and then while rotating it in the graphite tube more rapidly than in the first stage for 10 to 30 minutes at approximately 1650.degree. to 1750.degree. C.

Abstract: In a procedure for selectively separating the isotopes of a multi-isotopic element by forming a gas of isotopic compounds of the element, selectively exciting the molecules of one isotopic compound by application of laser radiation thereto, and separating the excited molecules from the other components of the gas by physical or chemical means, the efficiency of the separation is improved by passing the gas, prior to laser excitation, through a nozzle to cause it to undergo adiabatic expansion to form an undercooled gas stream, and applying the laser radiation to the gas stream.