Abstract: The invention relates to the proposal of an electrode arrangement in a device for carrying out processes of physical vapor deposition that greatly reduces or even prevents the degradation of the electrode material caused by accretions. The contamination of the anode occurring in these processes due to cathodic carbon is minimized or prevented by the application of a thin adhesion-reducing coating of high electrical conductivity to the anode, which coating has poorer adhesive properties with regard to the coating material than the uncoated anode material. This coating is preferably a nitride coating, particularly preferably of TiN, applied with a coating thickness of between 0.1 ?m and 3.5 ?m.

Abstract: A treatment installation for vacuum treatment of a front side of strip substrates includes first and second process chambers, each process chamber including a process roller and at least one process source. A transfer chamber arranged between the process chambers is coupled with both process chambers and can be separated in terms of pressure from at least one of the process chambers. The transfer chamber further includes an unwinding device with a removable unwinding reel and a winding-up device with a removable winding-up reel for the substrate and an outside air lock for loading and unloading the unwinding reel and/or winding-up reel. The rear side of the substrate faces the two process rollers and can be guided through the transfer chamber from the unwinding device to the first process roller, from the first process roller to the second process roller and from the second process roller to the winding-up device.

Abstract: Deposition processes and devices for the fabrication of multilayer systems to better control the energy contribution at different stages of the deposition. This is achieved by depositing films by sputtering in a scheme providing for thermalized particles. Thermalized particles are obtained by choosing the working gas pressure and the distance between target and substrate to result in a mean free path of particles smaller than the distance between target and substrate or to result in a product of pressure and distance being larger than 2.0 cmPa.

Abstract: Deposition processes and devices for the fabrication of multilayer systems to better control the energy contribution at different stages of the deposition. This is achieved by depositing films by sputtering in a scheme providing for thermalized particles. Thermalized particles are obtained by choosing the working gas pressure and the distance between target and substrate to result in a mean free path of particles smaller than the distance between target and substrate or to result in a product of pressure and distance being larger than 2.0 cmPa.

Abstract: It is in the object of the present invention to improve current deposition processes and devices for the fabrication of multilayer systems to better control the energy contribution at different stages of the deposition. This is achieved by depositing films by sputtering in a scheme providing for thermalized particles. One can get thermalized particles by choosing the working gas pressure and the distance between target and substrate to result in a mean free path of particles smaller than the distance between target and substrate or to result in a product of pressure and distance being larger than 2.0 cmPa.

Abstract: In the case of the treatment installation for the vacuum treatment, in particular vacuum coating, of a front side of substrates in strip form in a first process chamber with a first process roller and at least one process source and a second process chamber with a second process roller and at least one process source, it is provided that there is a transfer chamber which is arranged between the first and second process chambers, is coupled with both process chambers and can be separated in terms of pressure from at least one of the process chambers and an unwinding device with a removable unwinding reel and a winding-up device with a removable winding-up reel for the substrate to be treated as well as an outside air lock for loading and unloading the unwinding reel and/or winding-up reel.

Abstract: It is in the object of the present invention to improve current deposition processes and devices for the fabrication of multilayer systems to better control the energy contribution at different stages of the deposition. This is achieved by depositing films by sputtering in a scheme providing for thermalized particles. One can get thermalized particles by choosing the working gas pressure and the distance between target and substrate to result in a mean free path of particles smaller than the distance between target and substrate or to result in a product of pressure and distance being larger than 2.0 cmPa.

Abstract: Proposed is a glare free pan for a rear view service in motor vehicles, possessing a curved transparent substrate, the front surface of which forms the exposed surface of the said mirror. Upon the rear surface of said substrate is applied, in appropriate thicknesses, by sputtering at least four successive and contiguous layers of respectively niobium pentoxide, silicon dioxide, chromium and a protect covering of lacquer. The chromium layer provides the effective reflecting quality of the said mirror. The composition and thicknesses of the layers allows the mirror to reflectively function in visible light wavelengths suitable for both night and day service. Proposed also is a method for the manufacture of the above as well as its assembly into a rear view mirror ready for vehicle installation.

Abstract: At least one shielding device, which protects the vacuum chamber walls and/or the components arranged in the chamber from undesired deposits of the layer starting material is arranged in the vacuum chamber of a coating installation according to the invention in which vitreous, glass-ceramic and/or ceramic layers are applied to substrates by deposition from the gas phase. It is important that in the event of temperature changes in the vacuum chamber, the expansion or contraction of the shielding device corresponds to the expansion or contraction of the vitreous, glass-ceramic or ceramic layer or deposits.

Abstract: The invention relates to a cleanroom-capable coating system for PVD or CVD processes having at least one vacuum coating chamber, in which vitreous, glass-ceramic and/or ceramic layers deposited. A first opening of the vacuum coating chamber is connected via a separately evacuable vacuum airlock chamber (load lock) to a cleanroom, the vacuum airlock chamber comprising transport means for delivering substrates into the vacuum coating chamber and for taking substrates out of the vacuum coating chamber, and a second opening of the vacuum coating chamber connects the vacuum coating chamber to a grayroom area separated from the cleanroom.

Abstract: It is in the object of the present invention to improve current deposition processes and devices for the fabrication of multilayer systems to better control the energy contribution at different stages of the deposition. This is achieved by depositing films by sputtering in a scheme providing for thermalized particles. One can get thermalized particles by choosing the working gas pressure and the distance between target and substrate to result in a mean free path of particles smaller than the distance between target and substrate or to result in a product of pressure and distance being larger than 2.0 cmPa.