Patents by Inventor Wolfgang Goergen

Wolfgang Goergen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Arrangement for holding a substrate in a material deposition apparatus
    Patent number: 8808402
    Abstract: An arrangement (1) for holding a substrate (10) in a material deposition apparatus, which substrate (10) has a deposition side (10a) upon which material (M) is to be deposited, and which arrangement (1) comprises: a shadow mask (20) comprising a number of deposition openings (Di); a support structure (30) comprising a number of surround openings (Si); and a support structure holding means (6) for holding the support mask (30) and/or a substrate holding means (5) for holding the substrate (10), such that the support structure (30) is on the same side as the deposition side (10a) of the substrate (10), and the shadow mask (20) is positioned between the substrate (10) and the support structure (30) such that at least one deposition opening (Di) of the shadow mask (10) lies within a corresponding surround opening (Si) of the support structure (30).
    Type: Grant
    Filed: March 29, 2010
    Date of Patent: August 19, 2014
    Assignee: OSRAM Opto Semiconductors GmbH
    Inventors: Johannes Krijne, Erwin Eiling, Karl-Heinz Hohaus, Wolfgang Goergen, Andreas Lovich, Marc Philippens, Richard Scheicher, Ansgar Fischer, Martin Mueller
  • Arrangement for holding a substrate in a material deposition apparatus
    Patent number: 8657889
    Abstract: An arrangement (1) for holding a substrate (10) in a material deposition apparatus, which substrate (10) has a deposition side (10a) upon which material (M) is to be deposited, and which arrangement (1) comprises: a shadow mask (20) comprising a number of deposition openings (Di); a support structure (30) comprising a number of surround openings (Si); and a support structure holding means (6) for holding the support mask (30) and/or a substrate holding means (5) for holding the substrate (10), such that the support structure (30) is on the same side as the deposition side (10a) of the substrate (10), and the shadow mask (20) is positioned between the substrate (10) and the support structure (30) such that at least one deposition opening (Di) of the shadow mask (10) lies within a corresponding surround opening (Si) of the support structure (30).
    Type: Grant
    Filed: March 29, 2010
    Date of Patent: February 25, 2014
    Assignee: OSRAM Opto Semiconductors GmbH
    Inventors: Johannes Krijne, Erwin Eiling, Karl-Heinz Hohaus, Wolfgang Goergen, Andreas Lovich, Marc Philippens, Richard Scheicher, Ansgar Fischer, Martin Mueller
  • Arrangement for Holding a Substrate in a Material Deposition Apparatus
    Publication number: 20120178190
    Abstract: An arrangement (1) for holding a substrate (10) in a material deposition apparatus, which substrate (10) has a deposition side (10a) upon which material (M) is to be deposited, and which arrangement (1) comprises: a shadow mask (20) comprising a number of deposition openings (Di); a support structure (30) comprising a number of surround openings (Si); and a support structure holding means (6) for holding the support mask (30) and/or a substrate holding means (5) for holding the substrate (10), such that the support structure (30) is on the same side as the deposition side (10a) of the substrate (10), and the shadow mask (20) is positioned between the substrate (10) and the support structure (30) such that at least one deposition opening (Di) of the shadow mask (10) lies within a corresponding surround opening (Si) of the support structure (30).
    Type: Application
    Filed: March 29, 2010
    Publication date: July 12, 2012
    Inventors: Johannes Krijne, Erwin Eiling, Karl-Heinz Hohaus, Wolfgang Goergen, Andreas Lovich, Marc Philippens, Richard Scheicher, Ansgar Fischer, Martin Mueller