Patents by Inventor Wolfgang Jooss

Wolfgang Jooss has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10636934
    Abstract: The invention relates to methods and an apparatus for passivating defects of a semiconductor substrate, in particular a silicon based solar cell. According to the method, the substrate is irradiated with electromagnetic radiation during a first process phase, wherein the radiation directed onto the substrate has wavelengths at least in the region below 1200 nm and an intensity of at least 8000 Watt/m2. This can lead to a heating of the substrate, or a temperature control can be provided. Subsequently, the substrate is irradiated with electromagnetic radiation during a temperature-holding phase following the first process phase, wherein the radiation directed onto the substrate has wavelengths primarily in the region below 1200 nm and an intensity of at least 8000 Watt/m2, while a side of the substrate facing away from a source of the electromagnetic radiation is cooled via a contact with a support cooled by a cooling device.
    Type: Grant
    Filed: September 20, 2016
    Date of Patent: April 28, 2020
    Assignee: CENTROTHERM INTERNATIONAL AG
    Inventors: Thomas Pernau, Peter Völk, Hans-Peter Elser, Wolfgang Scheiffele, Andreas Reichart, Olaf Romer, Wolfgang Jooss
  • Publication number: 20190259905
    Abstract: A method for passivating a surface of a semiconductor material includes forming a layer stack having an aluminum oxide layer and an outer coating on the surface of the semiconductor material. The aluminum oxide layer and the outer coating are respectively formed in vacuum processes in which a vacuum is present. The vacuum is maintained between the forming of the aluminum oxide layer and the forming of the outer coating. Hydrogen and oxygen are supplied after the forming of the aluminum oxide layer and before the forming of the outer coating. A semiconductor substrate is also provided.
    Type: Application
    Filed: September 15, 2017
    Publication date: August 22, 2019
    Inventors: JENS-UWE FUCHS, WOLFGANG JOOSS, THOMAS PERNAU, VIET XUAN NGUYEN
  • Publication number: 20180337079
    Abstract: The invention relates to a plate element for a wafer boat for the plasma treatment of disk-shaped wafers, in particular semiconductor wafers for semiconductor or photovoltaic applications. The plate element is electrically conductive and has at least one holding unit on each side, for holding a wafer in a wafer holding region. The plate element has at least one recess in at least one side of the plate element and/or at least one opening in the plate element, wherein the at least one recess and/or the at least one opening in the plate element lies at least partially radially outside of the wafer holding region and directly adjacent thereto. The invention further relates to a wafer boat that has a plurality of plate elements of the above type arranged parallel to each other, wherein plate elements arranged adjacent are electrically insulated from each other.
    Type: Application
    Filed: November 17, 2016
    Publication date: November 22, 2018
    Inventors: Peter Völk, Uli Walk, Wolfgang Jooss
  • Publication number: 20180277710
    Abstract: The invention relates to methods and an apparatus for passivating defects of a semiconductor substrate, in particular a silicon based solar cell. According to the method, the substrate is irradiated with electromagnetic radiation during a first process phase, wherein the radiation directed onto the substrate has wavelengths at least in the region below 1200 nm and an intensity of at least 8000 Watt/m2. This can lead to a heating of the substrate, or a temperature control can be provided. Subsequently, the substrate is irradiated with electromagnetic radiation during a temperature-holding phase following the first process phase, wherein the radiation directed onto the substrate has wavelengths primarily in the region below 1200 nm and an intensity of at least 8000 Watt/m2, while a side of the substrate facing away from a source of the electromagnetic radiation is cooled via a contact with a support cooled by a cooling device.
    Type: Application
    Filed: September 20, 2016
    Publication date: September 27, 2018
    Inventors: Thomas Pernau, Peter Völk, Hans-Peter Elser, Wolfgang Scheiffele, Andreas Reichart, Olaf Romer, Wolfgang Jooss
  • Patent number: 6846984
    Abstract: A solar cell with buried contacts in recesses (7) on a first surface (2). On a lateral face (4), a metal layer (12) is produced. The metal layer (12) extends into a lateral zone (9) of a second surface (3) opposite the first surface (2). The metal layer serves as a first electrode (14). On the second surface (3) a second electrode (15), electrically separate from the first electrode (14), is produced so that the solar cell is provided with a back connection.
    Type: Grant
    Filed: April 21, 2001
    Date of Patent: January 25, 2005
    Assignee: Universitat Konstanz
    Inventors: Peter Fath, Wolfgang Jooss
  • Publication number: 20030089393
    Abstract: The invention relates to a solar cell with so-called buried contacts in recesses (7) on a first surface (2). On a lateral face (4), a metal layer (12) is produced that extends into a lateral zone (9) of a second surface (3) opposite the first surface (2), said metal layer serving as a first electrode (14). On the second surface (3) a second electrode (15), electrically separate from the first electrode (14), is produced so that the solar cell is provided with a back connection.
    Type: Application
    Filed: October 25, 2002
    Publication date: May 15, 2003
    Inventors: Peter Fath, Wolfgang Jooss