Abstract: An aqueous dispersion is used in the chemical mechanical polishing of surfaces, particularly oxidic surfaces, such as silicon dioxide. The aqueous dispersion contains a powder of pyrogenically produced silicon dioxide doped with 0.01 and 3 wt. % aluminium oxide, relative to the total amount of powder, said powder having an average particle diameter in the dispersion of not more than 0.1 ?m.

Abstract: Aluminium oxide doped with a divalent metal oxide, produced by flame hydrolysis and which has no spinell structures or alpha-aluminium detectable in an x-ray diffractogram. It is produced by a pyrogenic process in which, during the flame hydrolysis of aluminium halogenides, an aerosol, which contains an aqueous solution of a divalent metal salt is added to the gas mixture. The doped aluminium oxides can be used in aqueous dispersions for chemical-mechanical polishing.

Abstract: The present invention provides an aqueous dispersion containing at least two powder types selected from one or more metal oxide powders and/or one or more non-metal oxide powder. The present invention also provides a coating composition containing this dispersion, an inkjet recording medium containing the coating composition, and methods of making the same.

Abstract: The present invention relates to an aqueous dispersion containing a silicon dioxide powder coated with cerium oxide. In addition, the present invention provides a method of producing an aqueous dispersion containing a silicon dioxide powder coated with cerium oxide and methods of using this aqueous dispersion for chemical-mechanical polishing.

Abstract: Sulfur-functional polyorganosiloxanes corresponding to the general formula I with substituents as described in the specification, corresponding to the general formula I They can be used in rubber mixtures.

Abstract: An aqueous dispersion, comprising: a silicon dioxide powder having a silicon dioxide content of 10 to 60 wt. %, wherein the aqueous dispersion is stable in the pH range of 2 to 6, the aqueous dispersion additionally contains at least one compound, which is at least partially soluble in aqueous solution in the pH range 2 to 6 in the form of polyvalent cations, these being stable in a silicate-like environment as an anionic component of the particle surface of the silicon dioxide powder, the quantity of cation-providing compound in relation to the surface of the silicon dioxide is 0.001 to 0.1 mg cation-providing compound/m2 silicon dioxide surface, the cation-providing compound being calculated as the oxide, and the zeta potential of the aqueous dispersion has values of less than or equal to zero.

Abstract: A stable, aqueous dispersion, which includes:

Abstract: The present invention provides an aqueous dispersion containing at least two powder types selected from one or more metal oxide powders and/or one or more non-metal oxide powder. The present invention also provides a coating composition containing this dispersion, an inkjet recording medium containing the coating composition, and methods of making the same.

Abstract: A pyrogenic process is used to prepare alkali-doped silica particles. Particles produced by this process exhibit homogeneous doping, reduced agglomeration, greater stability and higher removal rates. Aqueous dispersions containing alkali-doped pyrogenic silica with average particle size less than 100 nm are used for polishing surfaces (CMP).

Abstract: A finely divided, stable dispersion of a solid is produced by: spraying at least two streams of a preliminary dispersion, each through a separate nozzle by pumps, onto a collision point in a reactor chamber enclosed by a reactor housing; passing water vapor through an opening into the reactor chamber so that a vaporous atmosphere consisting mainly of water vapor prevails in the reactor chamber; and removing the finely divided dispersion and a) vapor, b) partially condensed vapor consisting mainly of water or c) a combination of a) and b) from the reactor chamber by excess pressure of an incoming water vapor on the gas inlet side; wherein the solid has an average particle size of from 10 nm to 10 &mgr;m.

Abstract: An aqueous dispersion containing a cerium oxide-doped, pyrogenically produced silicon dioxide, wherein the cerium oxide is introduced through an aerosol of a cerium salt solution or suspension and the average particle size in the dispersion is less than 100 nm. The dispersion is produced by dispersing the cerium oxide-doped, pyrogenically produced silicon dioxide in aqueous solution by means of a high energy input. The aqueous dispersion can be used for chemical-mechanical polishing.

Abstract: The present invention relates to an aqueous dispersion containing a silicon dioxide powder coated with cerium oxide. In addition, the present invention provides a method of producing an aqueous dispersion containing a silicon dioxide powder coated with cerium oxide and methods of using this aqueous dispersion for chemical-mechanical polishing.

Abstract: An aqueous dispersion is used in the chemical mechanical polishing of surfaces, particularly oxidic surfaces, such as silicon dioxide. The aqueous dispersion contains a powder of pyrogenically produced silicon dioxide doped with 0.01 and 3 wt. % aluminium oxide, relative to the total amount of powder, said powder having an average particle diameter in the dispersion of not more than 0.1 &mgr;m.

Abstract: Sulfur-functional polyorganosiloxanes corresponding to the general formula I with substituents as described in the specification, corresponding to the general formula I 1

Abstract: A method for producing potassium-doped pyrogenic oxides involves mixing a gaseous mixture including a pyrogenic oxide precursor and an aqueous aerosol containing a potassium salt to form an aerosol-gaseous mixture which is then reacted in a flame under conditions suitable for producing pyrogenic oxides by flame oxidation or flame hydrolysis to form the potassium-doped pyrogenic oxides product. The particle product is spherical, has a BET surface between 1 and 1000 m2/g and a narrow distribution of particle size of at least 0.7. The doped oxides can be used as polishing material (CMP application).

Abstract: Sulfur-functional polyorganosiloxanes corresponding to the general formula I with substituents as described in the specification, corresponding to the general formula I They can be used in rubber mixtures.

Abstract: A pyrogenic process is used to prepare alkali-doped silica particles. Particles produced by this process exhibit homogeneous doping, reduced agglomeration, greater stability and higher removal rates. Aqueous dispersions containing alkali-doped pyrogenic silica with average particle size less than 100 nm are used for polishing surfaces (CMP).

Abstract: Aqueous dispersion containing a silicon-aluminum mixed oxide powder, the powder containing 0.1 to 99.9 wt. % Al2O3 and Si—O—Al-bonds. The dispersion can be produced using dispersing and/or grinding devices which a achieve an energy input of at least 200 KJ/m3. The dispersion can be used for the chemical-mechanical polishing of semiconductor substrates.

Abstract: An aqueous dispersion containing a cerium oxide-doped, pyrogenically produced silicon dioxide, wherein the cerium oxide is introduced through an aerosol of a cerium salt solution or suspension and the average particle size in the dispersion is less than 100 nm. The dispersion is produced by dispersing the cerium oxide-doped, pyrogenically produced silicon dioxide in aqueous solution by means of a high energy input. The aqueous dispersion can be used for chemical-mechanical polishing.

Abstract: The ink mixture contains at least one organosilane and optionally at least one hydrophobic silicic acid. The ink mixture can be used as a printing ink, especially as an ink for ink-jet printing.