Abstract: There is provided a reflective X-ray microscope for examining an object in an object plane. The reflective X-ray microscope includes (a) a first subsystem, having a first mirror and a second mirror, disposed in a beam path from the object plane to the image plane, and (b) a second subsystem, having a third mirror, situated downstream of the first subsystem in the beam path. The object is illuminated with radiation having a wavelength <100 nm, and the reflective X-ray microscope projects the object with magnification into an image plane.

Abstract: There is provided a reflective X-ray microscope for examining an object in an object plane. The reflective X-ray microscope includes (a) a first subsystem, having a first mirror and a second mirror, disposed in a beam path from the object plane to the image plane, and (b) a second subsystem, having a third mirror, situated downstream of the first subsystem in the beam path. The object is illuminated with radiation having a wavelength <100 nm, and the reflective X-ray microscope projects the object with magnification into an image plane.

Abstract: A lens assembly comprising nine lenses. Each lens includes u greater than or equal to about 12.8°, LEP equal to or from about 100 mm to about 400 mm, &agr; Rba greater than or equal to about 1°, and &agr; Rbi less than or equal to about −14°. The outward ray angle tilt and the inward ray angle tilt are positive if the outward ray and the inward ray intersect the optical axis at a location which, when seen from the object, is in an opposite direction to projection. The outward ray angle tilt and the inward ray angle tilt are negative if the outward ray and the inward ray intersect the optical axis at a location which, when seen from the object, is in the direction of projection.

Abstract: A lens assembly comprising seven lenses. Each lens includes u greater than or equal to about 12.8°, LEP equal to or from about 100 mm to about 400 mm, &sgr;Rba greater than or equal to about 1°, and &sgr;Rbi less than or equal to about −14°. The outward ray angle slopes and the inward ray angle slopes are positive if the outward ray and the inward ray intersect the optical axis at a location which, when seen from the object, is in an opposite direction to projection. The outward ray angle slopes and the inward ray angle slopes are negative if the outward ray and the inward ray intersect the optical axis at a location which, when seen from the object, is in an opposite direction to projection.

Abstract: The preferably highly antireflection coated facet of a laser chip is imaged by an optical system onto a reflector, as a result of which the adjustment tolerance is substantially increased by the cat's eye effect and, since the optical system is provided with a high longitudinal chromatic aberration, the wavelength can be tuned by shifting given parts of the total system relative to other parts of the total system. In this way a tunable semiconductor laser light source which is free from mode jumps and has at most two adjustable degrees of freedom can be produced.

Abstract: A lens assembly comprising nine lenses. Each lens includes u greater than or equal to about 12.8°, LEP equal to or from about 100 mm to about 400 mm, &agr;Rba greater than or equal to about 1°, and &agr;Rbi less than or equal to about −14°. The outward ray angle tilt and the inward ray angle tilt are positive if the outward ray and the inward ray intersect the optical axis at a location which, when seen from the object, is in an opposite direction to projection. The outward ray angle tilt and the inward ray angle tilt are negative if the outward ray and the inward ray intersect the optical axis at a location which, when seen from the object, is in the direction of projection.

Abstract: The invention relates to a projection objective which consists of at least seven lenses that are adjacent to air on both sides. The inventive projection objective meets the criteria of the following equations in its totality: u≧12.8°; 100 mm≦LEP≦400 mm; &sgr;RBa≧1°; &sgr;RBi≦−14°, whereby u is the aperture angle (2u-entire angle) on the illumination side; LEP is the distance from the entrance pupil (on the illumination side) to the object level (the position in the direction of projection from the reference point: object level corresponds to a positive value); &sgr;RBa is the angle inclination of the beam in relation to the optical axis in the object space between the object and the 1.