Abstract: An optical system for lithography apparatus comprises a movable element and a functional element having a first and second portions. The optical element is designed as an optical element or as a reference structure. The first portion is fastened to the movable element by a joining mechanism along a fastening plane. The second portion comprises a functional surface. The functional element comprises a decoupling device for decoupling by deformation the first portion from the second portion. The decoupling device is formed by a narrowing of the functional element. The narrowing is located laterally outside a region of the functional surface. The functional surface is a measurement surface which is suitable for acquisition for the purposes of positioning and/or orientating the movable element.

Abstract: A power module for an electric axle drive may include a plurality of semiconductor switching elements, where the semiconductor switching elements are attached to a substrate. The power module may also include a control unit electrically connected to the plurality of semiconductor switching elements, where the plurality of semiconductor switching elements includes a first set of semiconductor switching elements dedicated to the electric axle drive. The plurality of semiconductor switching elements may also include a second set of second set of semiconductor switching elements dedicated to a transmission connected to the electric axle drive.

Abstract: A device for measuring lithography masks is provided, comprising a reticle carrier for the lithography mask to be measured, a measurement objective for reproducing on a detector a section of said lithography mask held by said reticle carrier, a measurement module for measuring the position of said reticle carrier relative to said measurement objective, and a correction module by means of which said reticle carrier can be moved in order to bring it into a predetermined position relative to said measurement objective, wherein said measurement objective and said measurement module are fastened directly to an instrument carrier in a locally fixed manner.

Abstract: A device for measuring lithography masks is provided, comprising a reticle carrier for the lithography mask to be measured, a measurement objective for reproducing on a detector a section of said lithography mask held by said reticle carrier, a measurement module for measuring the position of said reticle carrier relative to said measurement objective, and a correction module by means of which said reticle carrier can be moved in order to bring it into a predetermined position relative to said measurement objective, wherein said measurement objective and said measurement module are fastened directly to an instrument carrier in a locally fixed manner.