Patents by Inventor Wolfgang Schmidt

Wolfgang Schmidt has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240158233
    Abstract: The present invention is directed to a process for preparing a transition metal phosphate comprising mixing a transition metal oxide with a hypophosphite compound and heating the mixture under inert gas conditions.
    Type: Application
    Filed: March 8, 2022
    Publication date: May 16, 2024
    Applicant: Studiengesellschaft Kohle gGmbH
    Inventors: Wolfgang SCHMIDT, Niklas STEGMANN
  • Publication number: 20230348976
    Abstract: The present invention is concerned with kits, methods and apparatus for analysing a biological sample from a subject to predict and/or monitor the development of infection and/or organ dysfunction and/or sepsis utilising groups of nucleic acid markers to predict the development of infection and/or organ dysfunction and/or sepsis.
    Type: Application
    Filed: September 15, 2021
    Publication date: November 2, 2023
    Inventors: Roman Antoni Lukaszewski, Ioannis Panagiotou, Wolfgang Schmidt-Heck
  • Publication number: 20230340599
    Abstract: The present invention is concerned with kits, methods and apparatus for analysing a biological sample from a subject to predict and/or monitor the development of infection and/or organ dysfunction and/or sepsis utilising groups of nucleic acid markers to predict the development of infection and/or organ dysfunction and/or sepsis.
    Type: Application
    Filed: September 15, 2021
    Publication date: October 26, 2023
    Inventors: Roman Antoni Lukaszewski, Ioannis Panagiotou, Wolfgang Schmidt-Heck
  • Publication number: 20230242733
    Abstract: A process for recycling a stream of polyester waste material by depolymerising the polyester by alcoholysis, includes first and second consecutive stages of depolymerisation, in which the polymer waste material is subjected in a continuous manner, in the first stage, the polyester waste material is continuously fed to an extruder operated at a temperature above the polyester melting temperature, while a first amount of alcohol is co-fed to the extruder, to produce a fluid mixture including a melt of the at least partly depolymerised polyester, and in the second stage, the fluid mixture is continuously fed to a continuously stirred tank reactor (CSTR) operated at a temperature above the polyester melting temperature, while co-feeding a second amount of alcohol to the CSTR, a residence time in the CSTR being used to provide at the CSTR outlet a continuous stream of polyester depolymerised into an oligomeric ester.
    Type: Application
    Filed: July 1, 2021
    Publication date: August 3, 2023
    Inventors: Marco Brons, Markus Anton Ruesink, Johan Albert Frans Kunst, Johannes Gerhardus Niels Hoffard, Layo Van Het Goor, Mike De Lange, Bram Wolfgang Schmidt, Jan Jager
  • Publication number: 20230212131
    Abstract: The present invention relates to novel Collagen 1 translation inhibitors, composition and methods of preparation thereof, and uses thereof for treating Fibrosis including lung, liver, kidney, cardiac and dermal fibrosis, IPF, wound healing, scarring and Gingival fibromatosis, Systemic Sclerosis, and alcoholic and non-alcoholic steatohepatitis (NASH).
    Type: Application
    Filed: June 9, 2021
    Publication date: July 6, 2023
    Applicant: Anima Biotech Inc.
    Inventors: David William SHEPPARD, Jason Paul TIERNEY, Aviad MANDABI, Wolfgang SCHMIDT, Stefano LEVANTO, Julie Nicole HAMBLIN, Richard James BULL, Iris ALROY, Wissam MANSOUR, Moty KLEPFISH, Yaode WANG, Haitang LI
  • Publication number: 20230150980
    Abstract: The present invention relates to novel Collagen I translation inhibitors, composition and methods of preparation thereof, and uses thereof for treating Fibrosis including lung, liver, kidney, cardiac and dermal fibrosis, IPF, wound healing, scarring and Gingival fibromatosis, Systemic Sclerosis, and alcoholic and non-alcoholic steatohepatitis (NASH).
    Type: Application
    Filed: April 21, 2021
    Publication date: May 18, 2023
    Applicant: Anima Biotech Inc.
    Inventors: David William SHEPPARD, Jason Paul TIERNEY, Aviad MANDABI, Wolfgang SCHMIDT, Stefano LEVANTO, Julie Nicole HAMBLIN, Richard James BULL, Iris ALROY, Wissam MANSOUR, Moty KLEPFISH, Yaode WANG, Haitang Ll, Stephen David PENROSE
  • Publication number: 20230116201
    Abstract: The present invention relates to novel Collagen 1 translation inhibitors, composition and methods of preparation thereof, and uses thereof for treating Fibrosis including lung, liver, kidney, cardiac and dermal fibrosis, IPF, wound healing, scarring and Gingival fibromatosis, Systemic Sclerosis, and alcoholic and non-alcoholic steatohepatitis (NASH).
    Type: Application
    Filed: January 28, 2021
    Publication date: April 13, 2023
    Applicant: Anima Biotech Inc.
    Inventors: David William SHEPPARD, Jason Paul TIERNEY, Wolfgang SCHMIDT, William Rameshchandra ESMIEU, Julie Nicole HAMBLIN, Richard James BULL, Iris ALROY, Wissam MANSOUR, Moty KLEPFISH, Aviad MANDABI
  • Patent number: 11541132
    Abstract: The present invention relates to radiolabeled compounds of formula I wherein either A, B, R1, R2, is labeled with a radionuclide selected from 3H, 11C and 18F and its use for imaging alpha synuclein and/or Abeta deposits in mammals.
    Type: Grant
    Filed: June 19, 2020
    Date of Patent: January 3, 2023
    Assignee: Hoffmann-La Roche Inc.
    Inventors: Edilio Borroni, Luca Gobbi, Michael Honer, Martin Edelmann, Dale Mitchell, David Hardick, Wolfgang Schmidt, Christopher Steele, Mushtaq Mulla
  • Patent number: 11307505
    Abstract: A method for operating an optical apparatus (100A, 100B, 200), having a structural element (201) which is arranged in a residual gas atmosphere (RGA) of the apparatus and which is formed at least partly from an element material subjected to a chemical reduction process and/or an etching process with a plasma component (PK) present in the residual gas atmosphere includes: feeding (S2) a gas component (GK) that at least partly suppresses the reduction process depending on a detected suppression extent (UM) for a suppression of the etching process and/or reduction process by the suppressing gas component in the residual gas atmosphere; and detecting (S1) the suppression extent with a sensor unit (208) arranged in the residual gas atmosphere. The sensor unit includes a sensor material section (211) composed of a sensor material and exhibiting a sensor section property that is measurable under the influence of the suppressing gas component.
    Type: Grant
    Filed: February 13, 2020
    Date of Patent: April 19, 2022
    Assignee: CARL ZEISS SMT GMBH
    Inventors: Moritz Becker, Stefan-Wolfgang Schmidt
  • Patent number: 11203905
    Abstract: A drill string section of a drill string for drilling in the ground having arranged on the outside of the drill string section at least one marking by means of which abrasion can be recognized.
    Type: Grant
    Filed: October 24, 2019
    Date of Patent: December 21, 2021
    Assignee: TRACTO-TECHNIK GMBH & CO. KG
    Inventor: Wolfgang Schmidt
  • Patent number: 11022893
    Abstract: An optical assembly includes an optical element (13), configured in particular for the reflection of EUV radiation (4), and a protective element (30) for protecting a surface (31) of the optical element (13, 14) from contaminating substances (P). The protective element (30) has a membrane (33a-c) and a frame (34) on which the membrane (33a-c) is mounted. The membrane is formed by a plurality of membrane segments (33a, 33b, 33c) which respectively protect a partial region (T) of the surface (31) of the optical element (13) from the contaminating substances (P). The optical assembly can form part of an overall optical arrangement, for example an EUV lithography system.
    Type: Grant
    Filed: April 28, 2018
    Date of Patent: June 1, 2021
    Assignee: CARL ZEISS SMT GMBH
    Inventors: Dirk Heinrich Ehm, Stefan-Wolfgang Schmidt
  • Publication number: 20200316232
    Abstract: The present invention relates to radiolabeled compounds of formula I wherein either A, B, R1, R2, is labeled with a radionuclide selected from 3H, C and 18F and its use for imaging alpha synuclein and/or Abeta deposits in mammals.
    Type: Application
    Filed: June 19, 2020
    Publication date: October 8, 2020
    Applicant: Hoffmann-La Roche Inc.
    Inventors: Edilio BORRONI, Luca GOBBI, Michael HONER, Martin EDELMANN, Dale MITCHELL, David HARDICK, Wolfgang SCHMIDT, Christopher STEELE, Mushtaq MULLA
  • Publication number: 20200300080
    Abstract: A system comprising a ground drilling device for moving a drill string for the insertion of an earth borehole into the ground, wherein a detection device is provided which is designed to detect the drill string at the end (a) in the region of the ground drilling device and/or (b) in the region of a target pit of the earth borehole to be created.
    Type: Application
    Filed: February 12, 2020
    Publication date: September 24, 2020
    Inventor: Wolfgang Schmidt
  • Patent number: 10712677
    Abstract: A projection exposure apparatus (400) for semiconductor lithography contains at least one partial volume (4) that is closed off from the surroundings. The partial volume (4) contains a gas, from which a plasma can be produced. Conditioning elements (20, 21, 22, 23, 24, 25) for conditioning the plasma, in particular for neutralizing the plasma, are present in the partial volume. An associated method for operating a projection exposure apparatus is also disclosed.
    Type: Grant
    Filed: November 21, 2018
    Date of Patent: July 14, 2020
    Assignee: CARL ZEISS SMT GMBH
    Inventors: Irene Ament, Dirk Heinrich Ehm, Stefan Wolfgang Schmidt, Moritz Becker, Stefan Wiesner, Diana Urich
  • Publication number: 20200183292
    Abstract: A method for operating an optical apparatus (100A, 100B, 200), having a structural element (201) which is arranged in a residual gas atmosphere (RGA) of the apparatus and which is formed at least partly from an element material subjected to a chemical reduction process and/or an etching process with a plasma component (PK) present in the residual gas atmosphere includes: feeding (S2) a gas component (GK) that at least partly suppresses the reduction process depending on a detected suppression extent (UM) for a suppression of the etching process and/or reduction process by the suppressing gas component in the residual gas atmosphere; and detecting (S1) the suppression extent with a sensor unit (208) arranged in the residual gas atmosphere. The sensor unit includes a sensor material section (211) composed of a sensor material and exhibiting a sensor section property that is measurable under the influence of the suppressing gas component.
    Type: Application
    Filed: February 13, 2020
    Publication date: June 11, 2020
    Inventors: Moritz BECKER, Stefan-Wolfgang SCHMIDT
  • Publication number: 20200149355
    Abstract: A drill string section of a drill string for drilling in the ground having arranged on the outside of the drill string section at least one marking by means of which abrasion can be recognized.
    Type: Application
    Filed: October 24, 2019
    Publication date: May 14, 2020
    Inventor: Wolfgang Schmidt
  • Patent number: 10649340
    Abstract: In order to prevent delamination of a reflective coating from the substrate under the influence of reactive hydrogen, a reflective optical element (50) for EUV lithography is provided, which has a substrate (51) and a reflective coating (54) for reflecting radiation in the wavelength range of 5 nm to 20 nm. A functional layer (60) is arranged between the reflective coating (54) and the substrate (51). With the functional layer, the concentration of hydrogen in atom % at the side of the substrate facing the reflective coating is reduced by at least a factor of 2.
    Type: Grant
    Filed: January 25, 2019
    Date of Patent: May 12, 2020
    Assignee: CARL ZEISS SMT GMBH
    Inventors: Dirk Heinrich Ehm, Vitaliy Shklover, Irene Ament, Stefan-Wolfgang Schmidt, Moritz Becker, Stefan Wiesner, Diana Urich, Robert Meier, Ralf Winter, Christof Jalics, Holger Kierey, Eric Eva
  • Publication number: 20190243258
    Abstract: A projection exposure apparatus (400) for semiconductor lithography contains at least one partial volume (4) that is closed off from the surroundings. The partial volume (4) contains a gas, from which a plasma can be produced. Conditioning elements (20, 21, 22, 23, 24, 25) for conditioning the plasma, in particular for neutralizing the plasma, are present in the partial volume. An associated method for operating a projection exposure apparatus is also disclosed.
    Type: Application
    Filed: November 21, 2018
    Publication date: August 8, 2019
    Inventors: Irene AMENT, Dirk Heinrich EHM, Stefan Wolfgang SCHMIDT, Moritz BECKER, Stefan WIESNER, Diana Urich
  • Patent number: D967038
    Type: Grant
    Filed: August 14, 2019
    Date of Patent: October 18, 2022
    Assignee: TRACTO-TECHNIK GMBH & CO. KG
    Inventor: Wolfgang Schmidt
  • Patent number: D1013736
    Type: Grant
    Filed: July 25, 2019
    Date of Patent: February 6, 2024
    Assignee: TRACTO-TECHNIK Gmbh & Co. KG
    Inventor: Wolfgang Schmidt