Patents by Inventor Wolfgang Seitz

Wolfgang Seitz has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10741946
    Abstract: A tube used for producing an electrically conductive connection between an electrical conducting element and a printed circuit board of a light fixture. The use of the tube in the printed circuit board makes it possible, due to a corresponding configuration and a region which widens in relation to the longitudinal direction, that the tube can be connected to the printed circuit board or is held thereby and can be soldered. Additionally, the configuration or widened portion prevents soldering agent from penetrating into the tube, so that a wire for voltage supply can then be introduced into the tube and can be connected thereto by deformation. As a result, an automatic and reliable method is made possible, so that a cost saving is produced.
    Type: Grant
    Filed: July 11, 2018
    Date of Patent: August 11, 2020
    Assignee: LEDVANCE GMBH
    Inventors: Anton Joerg, Matthias Kellner, Thomas Klafta, Wolfgang Seitz, Christoph Steidl, Marcel Vuc
  • Publication number: 20200208790
    Abstract: An LED lighting device has an at least partially translucent bulb, in which an LED holder with an LED is fastened thereto. The LED holder is fastened in the at least partially translucent bulb. The LED holder has two holding elements which have a contact region for electrical connection of the LED and a connecting element outside the at least partially translucent bulb. The holding elements are used both for heat dissipation from the LED and for supplying power to the LED.
    Type: Application
    Filed: September 12, 2017
    Publication date: July 2, 2020
    Inventors: Georg ROSENBAUER, Wolfgang SEITZ, Heinz LANG
  • Patent number: 10584846
    Abstract: A lighting device and the method of creating the lighting device having a lighting module and a lens mechanically connected to that lighting module. The lens has one or more connecting pins. The light module has one or more receiving openings for receiving the connecting pins. The free ends of the connecting pins are deformed by thermal deformation so that the light module is held on the lens.
    Type: Grant
    Filed: July 17, 2018
    Date of Patent: March 10, 2020
    Assignee: LEDVANCE GMBH
    Inventors: Anton Joerg, Thomas Klafta, Wolfgang Seitz, Christoph Steidl, Marcel Vuc
  • Patent number: 10495266
    Abstract: A semiconductor lamp includes a housing with a cavity to accommodate a light source, preferably an LED, and a driver for the light source. The housing has at least one injection channel for injection of an encapsulation material into the cavity of the housing. A semiconductor lamp is produced by providing a housing with a cavity and inserting a driver and a light source into the cavity. Following the insertion of the driver and the light source into the cavity, an encapsulation material is introduced into at least a part of the cavity through at least one injection channel of the housing.
    Type: Grant
    Filed: August 31, 2018
    Date of Patent: December 3, 2019
    Assignee: LEDVANCE GMBH
    Inventors: Christian Dendorfer, Thomas Klafta, Patrick Kotal, Krisztian Novak, Wolfgang Seitz, Henrike Streppel
  • Publication number: 20190063691
    Abstract: A semiconductor lamp includes a housing with a cavity to accommodate a light source, preferably an LED, and a driver for the light source. The housing has at least one injection channel for injection of an encapsulation material into the cavity of the housing. A semiconductor lamp is produced by providing a housing with a cavity and inserting a driver and a light source into the cavity. Following the insertion of the driver and the light source into the cavity, an encapsulation material is introduced into at least a part of the cavity through at least one injection channel of the housing.
    Type: Application
    Filed: August 31, 2018
    Publication date: February 28, 2019
    Inventors: Christian Dendorfer, Thomas Klafta, Patrick Kotal, Krisztian Novak, Wolfgang Seitz, Henrike Streppel
  • Publication number: 20190036249
    Abstract: A tube used for producing an electrically conductive connection between an electrical conducting element and a printed circuit board of a light fixture. The use of the tube in the printed circuit board makes it possible, due to a corresponding configuration and a region which widens in relation to the longitudinal direction, that the tube can be connected to the printed circuit board or is held thereby and can be soldered. Additionally, the configuration or widened portion prevents soldering agent from penetrating into the tube, so that a wire for voltage supply can then be introduced into the tube and can be connected thereto by deformation. As a result, an automatic and reliable method is made possible, so that a cost saving is produced.
    Type: Application
    Filed: July 11, 2018
    Publication date: January 31, 2019
    Inventors: Anton Joerg, Matthias Kellner, Thomas Klafta, Wolfgang Seitz, Christoph Steidl, Marcel Vuc
  • Publication number: 20190032887
    Abstract: A lighting device and the method of creating the lighting device having a lighting module and a lens mechanically connected to that said lighting module. The lens has one or more connecting pins. The light module has one or more receiving openings for receiving the connecting pins. The free ends of the connecting pins are deformed by thermal deformation so that the light module is held on the lens.
    Type: Application
    Filed: July 17, 2018
    Publication date: January 31, 2019
    Inventors: Anton Joerg, Thomas Klafta, Wolfgang Seitz, Christoph Steidl, Marcel Vuc
  • Patent number: 9170499
    Abstract: The disclosure relates to an illumination system of a microlithographic projection exposure apparatus. The illumination system can include a depolarizer which in conjunction with a light mixing system disposed downstream in the light propagation direction at least partially causes effective depolarization of polarized light impinging on the depolarizer. The illumination system can also include a microlens array which is arranged upstream of the light mixing system in the light propagation direction. The microlens array can include a plurality of microlenses arranged with a periodicity. The depolarizer can be configured so that a contribution afforded by interaction of the depolarizer with the periodicity of the microlens array to a residual polarization distribution occurring in a pupil plane arranged downstream of the microlens array in the light propagation direction has a maximum degree of polarization of not more than 5%.
    Type: Grant
    Filed: December 8, 2014
    Date of Patent: October 27, 2015
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Damian Fiolka, Manfred Maul, Markus Schwab, Wolfgang Seitz, Olaf Dittmann
  • Publication number: 20150153654
    Abstract: The disclosure relates to an illumination system of a microlithographic projection exposure apparatus. The illumination system can include a depolariser which in conjunction with a light mixing system disposed downstream in the light propagation direction at least partially causes effective depolarisation of polarised light impinging on the depolariser. The illumination system can also include a microlens array which is arranged upstream of the light mixing system in the light propagation direction. The microlens array can include a plurality of microlenses arranged with a periodicity. The depolariser can be configured so that a contribution afforded by interaction of the depolariser with the periodicity of the microlens array to a residual polarisation distribution occurring in a pupil plane arranged downstream of the microlens array in the light propagation direction has a maximum degree of polarisation of not more than 5%.
    Type: Application
    Filed: December 8, 2014
    Publication date: June 4, 2015
    Inventors: Damian Fiolka, Manfred Maul, Markus Schwab, Wolfgang Seitz, Olaf Dittmann
  • Patent number: 8946980
    Abstract: A method for fitting a base for a discharge lamp is provided. The method may include providing a discharge lamp with an end region, on which an option is provided for making contact with an electrode located in the interior of the discharge vessel; applying material to the end region; positioning a base sleeve onto the end region with the material; and positioning a clamping ring onto the base sleeve; wherein the clamping ring is of the kind that has at least one bead.
    Type: Grant
    Filed: May 29, 2008
    Date of Patent: February 3, 2015
    Assignee: OSRAM Gesellschaft mit beschraenkter Haftung
    Inventors: Swen-Uwe Baacke, Gerhard Loeffler, Dirk Rosenthal, Wolfgang Seitz
  • Patent number: 8928859
    Abstract: The disclosure relates to an illumination system of a microlithographic projection exposure apparatus. The illumination system can include a depolarizer which in conjunction with a light mixing system disposed downstream in the light propagation direction at least partially causes effective depolarization of polarized light impinging on the depolarizer. The illumination system can also include a microlens array which is arranged upstream of the light mixing system in the light propagation direction. The microlens array can include a plurality of microlenses arranged with a periodicity. The depolarizer can be configured so that a contribution afforded by interaction of the depolarizer with the periodicity of the microlens array to a residual polarization distribution occurring in a pupil plane arranged downstream of the microlens array in the light propagation direction has a maximum degree of polarization of not more than 5%.
    Type: Grant
    Filed: August 1, 2012
    Date of Patent: January 6, 2015
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Damian Fiolka, Manfred Maul, Markus Schwab, Wolfgang Seitz, Olaf Dittmann
  • Patent number: 8876570
    Abstract: A method for producing an electrode (16) for a high-pressure discharge lamp (10), comprising the following steps: a) scanning at least part of the electrode surface for producing an oxide layer (step 120); b) at least partially sublimating the oxide layer formed in step a) (step 120); and c) reducing the rest of the oxide layer.
    Type: Grant
    Filed: October 28, 2011
    Date of Patent: November 4, 2014
    Assignee: OSRAM GmbH
    Inventor: Wolfgang Seitz
  • Patent number: 8546776
    Abstract: To prevent reflective optical elements (2) for EUV lithography from becoming electrically charged as they are irradiated with EUV radiation (4), an optical system for EUV lithography is proposed, having a reflective optical element (2), including a substrate (21) with a highly reflective coating (22) emitting secondary electrons when irradiated with EUV radiation (4), and a source (3) of electrically charged particles, which is arranged in such a manner that electrically charged particles are applied to the reflective optical element (2), wherein the source (3) for the charge carrier compensation is exclusively a flood gun applying electrons to the reflective optical element (2).
    Type: Grant
    Filed: December 13, 2012
    Date of Patent: October 1, 2013
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Dirk Heinrich Ehm, Markus Weiss, Christoph Zaczek, Tobias Hackl, Wolfgang Seitz
  • Publication number: 20130221842
    Abstract: A method for producing an electrode (16) for a high-pressure discharge lamp (10), comprising the following steps: a) scanning at least part of the electrode surface for producing an oxide layer (step 120); b) at least partially sublimating the oxide layer formed in step a) (step 120); and c) reducing the rest of the oxide layer.
    Type: Application
    Filed: October 28, 2011
    Publication date: August 29, 2013
    Inventor: Wolfgang Seitz
  • Patent number: 8368304
    Abstract: In various embodiments, a discharge lamp may include a lamp vessel that includes a discharge vessel enclosing a discharge medium and two lamp shafts each extending coaxially at opposite ends of the discharge vessel, two outer power-feed sections each extending to the outside from one of the lamp shafts, two electrodes each consisting of an electrode rod and electrode head, with the electrode rods being arranged along the lamp shafts such that the two electrode heads are located mutually opposite inside the discharge vessel, a sealed section in each of the two lamp shafts by which a gas-tight electricity passage is formed between the two outer power-feed sections on the one hand and the two electrodes on the other, a narrow section in each of the two lamp shafts that is arranged between the respective sealed section and the electrode head of the associated electrode, with the narrow section closely surrounding the electrode rod, and a damping/guiding element arranged between the narrow section of a lamp shaft
    Type: Grant
    Filed: March 18, 2010
    Date of Patent: February 5, 2013
    Assignee: OSRAM AG
    Inventors: Swen-Uwe Baacke, Bernhard Ruhland, Wolfgang Seitz, Christian Wider
  • Publication number: 20120293786
    Abstract: The disclosure relates to an illumination system of a microlithographic projection exposure apparatus. The illumination system can include a depolariser which in conjunction with a light mixing system disposed downstream in the light propagation direction at least partially causes effective depolarisation of polarised light impinging on the depolariser. The illumination system can also include a microlens array which is arranged upstream of the light mixing system in the light propagation direction. The microlens array can include a plurality of microlenses arranged with a periodicity. The depolariser can be configured so that a contribution afforded by interaction of the depolariser with the periodicity of the microlens array to a residual polarisation distribution occurring in a pupil plane arranged downstream of the microlens array in the light propagation direction has a maximum degree of polarisation of not more than 5%.
    Type: Application
    Filed: August 1, 2012
    Publication date: November 22, 2012
    Applicant: CARL ZEISS SMT GMBH
    Inventors: Damian Fiolka, Manfred Maul, Markus Schwab, Wolfgang Seitz, Olaf Dittmann
  • Patent number: 8264668
    Abstract: The disclosure relates to an illumination system of a microlithographic projection exposure apparatus. The illumination system can include a depolariser which in conjunction with a light mixing system disposed downstream in the light propagation direction at least partially causes effective depolarisation of polarised light impinging on the depolariser. The illumination system can also include a microlens array which is arranged upstream of the light mixing system in the light propagation direction. The microlens array can include a plurality of microlenses arranged with a periodicity. The depolariser can be configured so that a contribution afforded by interaction of the depolariser with the periodicity of the microlens array to a residual polarisation distribution occurring in a pupil plane arranged downstream of the microlens array in the light propagation direction has a maximum degree of polarisation of not more than 5%.
    Type: Grant
    Filed: July 2, 2009
    Date of Patent: September 11, 2012
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Damian Fiolka, Manfred Maul, Markus Schwab, Wolfgang Seitz, Olaf Dittmann
  • Publication number: 20120049731
    Abstract: In various embodiments, a discharge lamp may include a lamp vessel that includes a discharge vessel enclosing a discharge medium and two lamp shafts each extending coaxially at opposite ends of the discharge vessel, two outer power-feed sections each extending to the outside from one of the lamp shafts, two electrodes each consisting of an electrode rod and electrode head, with the electrode rods being arranged along the lamp shafts such that the two electrode heads are located mutually opposite inside the discharge vessel, a sealed section in each of the two lamp shafts by which a gas-tight electricity passage is formed between the two outer power-feed sections on the one hand and the two electrodes on the other, a narrow section in each of the two lamp shafts that is arranged between the respective sealed section and the electrode head of the associated electrode, with the narrow section closely surrounding the electrode rod, and a damping/guiding element arranged between the narrow section of a lamp shaft
    Type: Application
    Filed: March 18, 2010
    Publication date: March 1, 2012
    Applicant: OSRAM AG
    Inventors: Swen-Uwe Baacke, Bernhard Ruhland, Wolfgang Seitz, Christian Wider
  • Publication number: 20110304267
    Abstract: A noble gas short-arc discharge lamp (1) comprising a discharge vessel and electrodes (2, 3) arranged therein is disclosed. The discharge vessel, for the purpose of thermal insulation, has at least in sections a coating (8) serving for reflecting infrared radiation.
    Type: Application
    Filed: May 3, 2011
    Publication date: December 15, 2011
    Applicant: OSRAM Gesellschaft mit beschrankter
    Inventors: Christoforos KAZAZIS, Wolfgang Seitz
  • Publication number: 20110068673
    Abstract: A method for fitting a base for a discharge lamp is provided. The method may include providing a discharge lamp with an end region, on which an option is provided for making contact with an electrode located in the interior of the discharge vessel; applying material to the end region; positioning a base sleeve onto the end region with the material; and positioning a clamping ring onto the base sleeve; wherein the clamping ring is of the kind that has at least one bead.
    Type: Application
    Filed: May 29, 2008
    Publication date: March 24, 2011
    Applicant: OSRAM Gesellschaft mit beschraenkter Haftung
    Inventors: Swen-Uwe Baacke, Gerhard Loeffler, Dirk Rosenthal, Wolfgang Seitz