Patents by Inventor Wolfgang Speicher

Wolfgang Speicher has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 4332860
    Abstract: Aqueous dispersions which are suitable for the treatment of leather and have a pH of from 2 to 7 and particle diameters of from 20 to 150 nm of polymers having a T.sub..lambda.max -value below 20.degree. C. ofA from 20 to 70 parts by weight of one or more acyclic conjugated dienes having from 4-9 carbon atoms;B from 10 to 40 parts by weight of acrylonitrile and/or methacrylonitrile;C from 1 to 5 parts by weight of allylsulphonic acid and/or methallyl sulphonic acid or water-soluble salts thereof;D less than 20 parts by weight of acrylic and/or methacrylic acid hydroxyalkylesters having from 2-4 carbon atoms in the hydroxyalkyl group; andE 0 to 40 parts by weight of acrylic and/or methacrylic acid alkyl esters having up to 8 carbon atoms in the alkyl group.
    Type: Grant
    Filed: April 3, 1981
    Date of Patent: June 1, 1982
    Assignee: Bayer Aktiengesellschaft
    Inventors: Ferdinand Heins, Wolfgang Speicher
  • Patent number: 4289827
    Abstract: The present invention relates to moisture-hardening one-component lacquers having improved shelf life and thermal stability. These lacquers are characterized by high gloss and high flexural strength and are based on reaction products containing free isocyanate groups of relatively high molecular weight polyols having an average functionality of from 2 to 3, polyisocyanates and, optionally, low molecular weight polyhydroxyl compounds which are characterized in that the relatively high molecular weight polyol is a mixture of:(a) a hydroxyl polyester having an average molecular weight of from about 500 to 6000,(b) a hydroxyl polyether corresponding to the following general formula: ##STR1## wherein R.sub.1 represents hydrogen, a C.sub.1 -C.sub.4 alkyl radical or a phenyl radical,X represents one of the difunctional radicals --S--, --O--, --SO.sub.2 --, --CO-- or --C(R.sub.2 R.sub.3)-- whereR.sub.2 and R.sub.3, which may be the same or different, represent hydrogen or a C.sub.1 -C.sub.
    Type: Grant
    Filed: February 22, 1980
    Date of Patent: September 15, 1981
    Assignee: Bayer Aktiengesellschaft
    Inventors: Klaus Noll, Wolfgang Speicher, Josef Pedain, Rosemarie Schmid