Patents by Inventor Wolfgang Stoiber

Wolfgang Stoiber has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Process for producing polycrystalline silicon
    Patent number: 9738531
    Abstract: Installation of a shield around a Siemens reactor prior to harvesting polysilicon rods produced therein allows the upper, bell jar-like shell to be removed for cleaning, while protecting the polysilicon rods from contamination and increasing safety of nearby personnel. The polysilicon rods are harvested while the shield is present.
    Type: Grant
    Filed: August 27, 2014
    Date of Patent: August 22, 2017
    Assignee: WACKER CHEMIE AG
    Inventors: Barbara Mueller, Walter Haeckl, Wolfgang Stoiber
  • PROCESS FOR PRODUCING POLYCRYSTALLINE SILICON
    Publication number: 20160214864
    Abstract: Installation of a shield around a Siemens reactor prior to harvesting polysilicon rods produced therein allows the upper, bell jar-like shell to be removed for cleaning, while protecting the polysilicon rods from contamination and increasing safety of nearby personnel. The polysilicon rods are harvested while the shield is present.
    Type: Application
    Filed: August 27, 2014
    Publication date: July 28, 2016
    Inventors: Barbara MUELLER, Walter HAECKL, Wolfgang STOIBER
  • Method for processing an etching mixture which is formed during the production of highly pure silicon
    Patent number: 7922876
    Abstract: In a method for recovering acid from an aqueous etching mixture containing HF, HNO3, H2SiF6 and HNO2 which has been used for purifying polycrystalline silicon, the used etching mixture is distilled progressively so that approximately from 20 to 50 wt. % of the mixture is distilled off as dilute acid containing more than 90 wt. % of the silicon dissolved as hexafluorosilicic acid in a first fraction, and the water contained in the used etching mixture having been reduced by approximately 10-30 wt. %, this water-depleted mixture is then concentrated by evaporation to a residue of about 1 to 5 wt. % of the initial amount of used etching mixture during which a second fraction is distilled off, and the residue is disposed of.
    Type: Grant
    Filed: August 21, 2007
    Date of Patent: April 12, 2011
    Assignee: Wacker Chemie AG
    Inventors: Hanns Wochner, Christian Gossmann, Wolfgang Stoiber
  • METHOD FOR PROCESSING AN ETCHING MIXTURE WHICH IS FORMED DURING THE PRODUCTION OF HIGHLY PURE SILICON
    Publication number: 20080053815
    Abstract: In a method for recovering acid from an aqueous etching mixture containing HF, HNO3, H2SiF6 and HNO2 which has been used for purifying polycrystalline silicon, the used etching mixture is distilled progressively so that approximately from 20 to 50 wt. % of the mixture is distilled off as dilute acid containing more than 90 wt. % of the silicon dissolved as hexafluorosilicic acid in a first fraction, and the water contained in the used etching mixture having been reduced by approximately 10-30 wt. %, this water-depleted mixture is then concentrated by evaporation to a residue of about 1 to 5 wt. % of the initial amount of used etching mixture during which a second fraction is distilled off, and the residue is disposed of.
    Type: Application
    Filed: August 21, 2007
    Publication date: March 6, 2008
    Applicant: WACKER CHEMIE AG
    Inventors: Hanns Wochner, Christian Gossmann, Wolfgang Stoiber