Patents by Inventor Wolfgang Stolz

Wolfgang Stolz has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10269562
    Abstract: The invention provides the use of at least one binary group 15 element compound of the general formula R1R2E-E?R3R4 (I) or R5E(E?R6R7)2 (II) as the educt in a vapor deposition process. In this case, R1, R2, R3 and R4 are independently selected from the group consisting of H, an alkyl radical (C1-C10) and an aryl group, and E and E? are independently selected from the group consisting of N, P, As, Sb and Bi. This use excludes hydrazine and its derivatives. The binary group 15 element compounds according to the invention allow the realization of a reproducible production and/or deposition of multinary, homogeneous and ultrapure 13/15 semiconductors of a defined combination at relatively low process temperatures. This makes it possible to completely waive the use of an organically substituted nitrogen compound such as 1.
    Type: Grant
    Filed: September 25, 2015
    Date of Patent: April 23, 2019
    Assignee: PHILIPPS-UNIVERSITÄT MARBURG
    Inventors: Carsten Von Haenisch, Kerstin Volz, Wolfgang Stolz, Eduard Sterzer, Andreas Beyer, Dominik Keiper, Benjamin Ringler
  • Publication number: 20170243740
    Abstract: The invention provides the use of at least one binary group 15 element compound of the general formula R1R2E-E?R3R4 (I) or R5E(E?R6R7)2 (II) as the educt in a vapor deposition process. In this case, R1, R2, R3 and R4 are independently selected from the group consisting of H, an alkyl radical (C1-C10) and an aryl group, and E and E? are independently selected from the group consisting of N, P, As, Sb and Bi. This use excludes hydrazine and its derivatives. The binary group 15 element compounds according to the invention allow the realization of a reproducible production and/or deposition of multinary, homogeneous and ultrapure 13/15 semiconductors of a defined combination at relatively low process temperatures. This makes it possible to completely waive the use of an organically substituted nitrogen compound such as 1.
    Type: Application
    Filed: September 25, 2015
    Publication date: August 24, 2017
    Applicant: Philipps-Universität Marburg
    Inventors: Carsten VON HAENISCH, Kerstin VOLZ, Wolfgang STOLZ, Eduard STERZER, Andreas BEYER, Dominik KEIPER, Benjamin RINGLER
  • Patent number: 9610942
    Abstract: A device for operating a vehicle includes: a vehicle movement module for forming control signals for a control unit of an actuating system of the vehicle; an energy management module for managing energy which is available for a vehicle operation, the energy management module being configured to form further control signals for the control unit as a function of the available energy, and a prioritizer for prioritizing the control signals over the further control signals as a function of a vehicle position and/or a vehicle movement state for stabilizing the vehicle.
    Type: Grant
    Filed: September 17, 2012
    Date of Patent: April 4, 2017
    Assignee: ROBERT BOSCH GMBH
    Inventors: Werner Poechmueller, Stefan Nordbruch, Andreas Lapp, Michael Knoop, Tino Sommer, Wolfgang Stolz
  • Publication number: 20150019042
    Abstract: A device for operating a vehicle includes: a vehicle movement module for forming control signals for a control unit of an actuating system of the vehicle; an energy management module for managing energy which is available for a vehicle operation, the energy management module being configured to form further control signals for the control unit as a function of the available energy, and a prioritizer for prioritizing the control signals over the further control signals as a function of a vehicle position and/or a vehicle movement state for stabilizing the vehicle.
    Type: Application
    Filed: September 17, 2012
    Publication date: January 15, 2015
    Inventors: Werner Poechmueller, Stefan Nordbruch, Andreas Lapp, Michael Knoop, Tino Sommer, Wolfgang Stolz
  • Patent number: 8421055
    Abstract: The invention relates to a monolithic integrated semiconductor structure comprising a carrier layer on the basis of doped Si or doped GaP and a III/V semiconductor disposed thereupon and having the composition GaxInyNaAsbPcSbd, wherein x=70-100 mole-%, y=0-30 mole-%, a=0.5-15 mole-%, b=67.5-99.5 mole-%, c=0-32.0 mole-% and d=0-15 mole-%, wherein the total of x and y is always 100 mole-%, wherein the total of a, b, c and d is always 100 mole-%, and wherein the ratio of the totals of x and y on the one hand, and of a to d on the other hand, is substantially 1:1, to methods for the production thereof, new semiconductors, the use thereof for the production of luminescence diodes and laser diodes or also modulator and detector structures, which are monolithically integrated in integrated circuits on the basis of the Si or GaP technology.
    Type: Grant
    Filed: May 26, 2009
    Date of Patent: April 16, 2013
    Assignee: Philipps-University Marburg
    Inventors: Bernardette Kunert, Jorg Koch, Stefan Reinhard, Kerstin Volz, Wolfgang Stolz
  • Patent number: 7754908
    Abstract: The present invention relates to specific novel tungsten and molybdenum compounds to the use thereof for the deposition of tungsten- or molybdenum-containing layers by means of chemical vapour deposition, and to the tungsten- or molybdenum-containing layers produced by this process.
    Type: Grant
    Filed: January 4, 2007
    Date of Patent: July 13, 2010
    Assignee: H. C. Starck Clevios GmbH
    Inventors: Knud Reuter, Jörg Sundermeyer, Alexei Merkoulov, Wolfgang Stolz, Kestin Volz, Michael Pokoj, Thomas Ochs
  • Publication number: 20100102293
    Abstract: The invention relates to a monolithic integrated semiconductor structure comprising a carrier layer on the basis of doped Si or doped GaP and a III/V semiconductor disposed thereupon and having the composition GaxInyNaAsbPcSbd, wherein x=70-100 mole-%, y=0-30 mole-%, a=0.5-15 mole-%, b=67.5-99.5 mole-%, c=0-32.0 mole-% and d=0-15 mole-%, wherein the total of x and y is always 100 mole-%, wherein the total of a, b, c and d is always 100 mole-%, and wherein the ratio of the totals of x and y on the one hand, and of a to d on the other hand, is substantially 1:1, to methods for the production thereof, new semiconductors, the use thereof for the production of luminescence diodes and laser diodes or also modulator and detector structures, which are monolithically integrated in integrated circuits on the basis of the Si or GaP technology.
    Type: Application
    Filed: May 26, 2009
    Publication date: April 29, 2010
    Inventors: BERNARDETTE KUNERT, JORG KOCH, STEFAN REINHARD, KERSTIN VOLZ, WOLFGANG STOLZ
  • Patent number: 7442407
    Abstract: Tantalum and niobium compounds having the general formula (I) and their use for the chemical vapour deposition process are described: wherein M stands for Nb or Ta, R1 and R2 C1 to C12 alkyl, C5 to C12 cycloalkyl, C6 to C10 aryl radicals, 1-alkenyl, 2-alkenyl, 3-alkenyl, triorganosilyl radicals —SiR3, or amino radicals NR2 R3 is C1 to C8 alkyl, C5 to C10 cycloalkyl, C6 to C14 aryl radical, or SiR3 or NR2, R4 denotes Cl, Br, I, NIH—R5 where R5 is C1 to C8 alkyl, C5 to C10 cycloalkyl or C6 to C10 aryl radical, or O—R6 where R6=optionally substituted C1 to C11 alkyl, C5 to C10 cycloalkyl, C6 to C10 aryl radical, or —SiR3, or BH4, or an allyl radical, or an indenyl radical, or an benzyl radical, or an cyclopentadienyl radical, or —NIR—NR?R? (hydrazido(-1), wherein R, R? and R? have the aforementioned meaning of R, or CH2SiMe3, pseudohalide, or silylamide —N(SiMe3)2, and R7 and R8 are H, C1 to C12 alkyl, C5 to C12 cycloalkyl or C6 to C10 aryl radicals.
    Type: Grant
    Filed: July 7, 2006
    Date of Patent: October 28, 2008
    Assignee: H.C. Starck GmbH
    Inventors: Knud Reuter, Jörg Sundermeyer, Alexei Merkoulov, Wolfgang Stolz, Kerstin Volz, Michael Pokoj, Thomas Ochs
  • Publication number: 20080038466
    Abstract: The present invention relates to special, novel tantalum and niobium compounds, the use thereof for the deposition of tantalum- or niobium-containing layers by means of chemical vapour deposition and the tantalum- or niobium-containing layers produced by this process.
    Type: Application
    Filed: August 9, 2007
    Publication date: February 14, 2008
    Applicant: H. C. Starck GmbH
    Inventors: Knud Reuter, Stephan Kirchmeyer, Daniel Gaess, Michael Pokoj, Jorg Sundermeyer, Wolfgang Stolz, Thomas Ochs, Kerstin Volz
  • Publication number: 20070217457
    Abstract: A new method for the production of strain-compensating semiconductor layers is suggested, as well as its use for the production of strained-controlled semiconductor layer systems and the production of optically pumped semiconductor devices for the production of radiation, preferably long-wave radiation.
    Type: Application
    Filed: November 25, 2004
    Publication date: September 20, 2007
    Inventors: Wolfgang Stolz, Stephan Lutgen
  • Publication number: 20070160761
    Abstract: The present invention relates to specific novel tungsten and molybdenum compounds to the use thereof for the deposition of tungsten- or molybdenum-containing layers by means of chemical vapour deposition, and to the tungsten- or molybdenum-containing layers produced by this process.
    Type: Application
    Filed: January 4, 2007
    Publication date: July 12, 2007
    Applicant: H.C. Starck GmbH & Co. KG
    Inventors: Knud Reuter, Jorg Sundermeyer, Alexei Merkoulov, Wolfgang Stolz, Kestin Volz, Michael Pokoj, Thomas Ochs
  • Publication number: 20070042213
    Abstract: Tantalum and niobium compounds having the general formula (I) and their use for the chemical vapour deposition process are described: wherein M stands for Nb or Ta, R1 and R2 mutually independently denote optionally substituted C1 to C12 alkyl, C5 to C12 cycloalkyl, C6 to C10 aryl radicals, 1-alkenyl, 2-alkenyl, 3-alkenyl, triorganosilyl radicals —SiR3, or amino radicals NR2 where R?C1 to C4 alkyl, R3 denotes an optionally substituted C1 to C8 alkyl, C5 to C10 cycloalkyl, C6 to C14 aryl radical, or SiR3 or NR2, R4 denotes halogen from the group comprising Cl, Br, I, or NH—R5 where R5?optionally substituted C1 to C8 alkyl, C5 to C10 cycloalkyl or C6 to C10 aryl radical, or O—R6 where R6=optionally substituted C1 to C11 alkyl, C5 to C10 cycloalkyl, C6 to C10 aryl radical, or —SiR3, or BH4, or an optionally substituted allyl radical, or an indenyl radical, or an optionally substituted benzyl radical, or an optionally substituted cyclopentadienyl radical, or —NR—NR?R? (hydrazido(?1), wherein R, R? and R? h
    Type: Application
    Filed: July 7, 2006
    Publication date: February 22, 2007
    Applicant: H.C. STARCK
    Inventors: Knud Reuter, Jorg Sundermeyer, Alexei Merkoulov, Wolfgang Stolz, Kerstin Volz, Michael Pokoj, Thomas Ochs
  • Publication number: 20070012908
    Abstract: The invention relates to a monolithic integrated semiconductor structure comprising a carrier layer on the basis of doped Si or doped GaP and a III/V semiconductor disposed thereupon and having the composition GaxInyNaAsbPcSbd, wherein x=70-100 mole-%, y=0-30 mole-%, a=0.5-15 mole-%, b=67.5-99.5 mole-%, c=0-32.0 mole-% and d=0-15 mole-%, wherein the total of x and y is always 100 mole-%, wherein the total of a, b, c and d is always 100 mole-%, and wherein the ratio of the totals of x and y on the one hand and of a to d on the other hand is substantially 1:1, to methods for the production thereof, new semiconductors, the use thereof for the production of luminescence diodes and laser diodes or also modulator and detector structures, which are monolithically integrated in integrated circuits on the basis of the Si or GaP technology.
    Type: Application
    Filed: January 26, 2006
    Publication date: January 18, 2007
    Inventors: Bernardette Kunert, Jorg Koch, Stefan Reinhard, Kerstin Volz, Wolfgang Stolz
  • Patent number: 5057881
    Abstract: A multiple quantum well light emitting compositional semiconductor device ch as a laser diode or a light emitting diode has an active region comprising an alternating sequence of layers of well layer material and of barrier layer material. The thickness of the barrier layer and of the adjacent well layers is chosen such that for one type of charge carrier a relatively high probability exists for such charge carriers to be present in the barrier region whereas the other type of charge carriers are localized in the potential wells. In this way it is possible to reduce the probability of non-radiative Auger recombination processes occurring thus reducing the threshold current and increasing the quantum efficiency of the device.
    Type: Grant
    Filed: November 30, 1989
    Date of Patent: October 15, 1991
    Assignee: Max-Planck Gesellschaft zur Forderung der Wissenschaften e.V.
    Inventors: Hans Lobentanzer, Wolfgang Stolz, Klaus Ploog, Julien Nagle