Patents by Inventor Wolfram Buehler
Wolfram Buehler has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20150114294Abstract: A processing system for processing an object (3) is provided, wherein the processing system is adapted, to focus a first energy beam, in particular an electron beam (11), and a second energy beam, in particular an ion beam (21), on a focusing region (29) in which a object (3) to be processed is arrangeable. A processing chamber wall (35) having two openings (38, 39) for traversal of both energy beams and a connector (37) for supplying process gas delimits a processing chamber (45) from a vacuum chamber (2) of the processing system. Processing the object by activating the process gas through one of the energy beams and inspecting the object via one of the energy beams is enabled for different orientations of the object relative to a propagation direction of one of the energy beams.Type: ApplicationFiled: January 6, 2015Publication date: April 30, 2015Inventors: Emmerich Bertagnolli, Heinz Wanzenboeck, Wolfram Buehler, Camille Stebler, Ulrike Zeile, Alexander Rosenthal
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Patent number: 9006681Abstract: A process of preparing a lamella from a substrate includes manufacturing a protection strip on an edge portion of the lamella to be prepared from the substrate, and preparing the lamella, wherein the manufacturing the protection strip includes a first phase of activating a surface area portion of the substrate, and a second phase of electron beam assisted deposition of the protective strip on the activated surface area portion from the gas phase.Type: GrantFiled: March 10, 2014Date of Patent: April 14, 2015Assignee: Carl Zeiss Microscopy GmbHInventors: Heinz Wanzenboeck, Wolfram Buehler, Holger Doemer, Carl Kuebler, Daniel Fischer, Gottfried Hochleitner, Emmerich Bertagnolli
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Patent number: 8939108Abstract: A processing system for processing an object (3) is provided, wherein the processing system is adapted, to focus a first energy beam, in particular an electron beam (11), and a second energy beam, in particular an ion beam (21), on a focusing region (29) in which a object (3) to be processed is arrangeable. A processing chamber wall (35) having two openings (38, 39) for traversal of both energy beams and a connector (37) for supplying process gas delimits a processing chamber (45) from a vacuum chamber (2) of the processing system. Processing the object by activating the process gas through one of the energy beams and inspecting the object via one of the energy beams is enabled for different orientations of the object relative to a propagation direction of one of the energy beams.Type: GrantFiled: December 8, 2012Date of Patent: January 27, 2015Assignee: Carl Zeiss Microscopy GmbHInventors: Emmerich Bertagnolli, Heinz Wanzenboeck, Wolfram Buehler, Camille Stebler, Ulrike Zeile, Alexander Rosenthal
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Publication number: 20140191126Abstract: A process of preparing a lamella from a substrate includes manufacturing a protection strip on an edge portion of the lamella to be prepared from the substrate, and preparing the lamella, wherein the manufacturing the protection strip includes a first phase of activating a surface area portion of the substrate, and a second phase of electron beam assisted deposition of the protective strip on the activated surface area portion from the gas phase.Type: ApplicationFiled: March 10, 2014Publication date: July 10, 2014Applicant: Carl Zeiss Microscopy GmbHInventors: Heinz Wanzenboeck, Wolfram Buehler, Holger Doemer, Carl Kuebler, Daniel Fischer, Gottfried Hochleitner, Emmerich Bertagnolli
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Patent number: 8536773Abstract: An electron beam source includes a base and a tip fixed to the base and extending from the base. The tip includes a core and a coating applied to the core. The core has a surface that includes a first material. The coating includes a second material which is different from the first material. The second material forms a surface of the tip, and the second coating includes more than 30% by weight of a lanthanide element.Type: GrantFiled: March 30, 2011Date of Patent: September 17, 2013Assignee: Carl Zeiss Microscopy GmbHInventors: Wolfram Buehler, Volker Drexel
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Patent number: 8507854Abstract: A particle beam system 1 for cleaning itself comprises an irradiation system to direct electromagnetic radiation onto the surfaces to be cleaned and a supply system 61 to supply a precursor gas to the interior of the vacuum chamber 11 of the particle beam system 1. The precursor gas is activated in a vicinity of the surfaces to be cleaned and is converted into a reaction gas which reacts with the contaminants present on the irradiated surfaces such that said contaminants may be pumped out then.Type: GrantFiled: July 13, 2010Date of Patent: August 13, 2013Assignee: Carl Zeiss Microscopy GmbHInventors: Wolfram Buehler, Holger Doemer, Matthias Lang, Joerg Stodolka, Peter Roediger, Emmerich Bertagnolli, Heinz Wanzenboeck
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Publication number: 20130098292Abstract: A processing system for processing an object (3) is provided, wherein the processing system is adapted, to focus a first energy beam, in particular an electron beam (11), and a second energy beam, in particular an ion beam (21), on a focusing region (29) in which a object (3) to be processed is arrangeable. A processing chamber wall (35) having two openings (38, 39) for traversal of both energy beams and a connector (37) for supplying process gas delimits a processing chamber (45) from a vacuum chamber (2) of the processing system. Processing the object by activating the process gas through one of the energy beams and inspecting the object via one of the energy beams is enabled for different orientations of the object relative to a propagation direction of one of the energy beams.Type: ApplicationFiled: December 8, 2012Publication date: April 25, 2013Applicant: Carl Zeiss NTS GmbHInventors: Emmerich Bertagnolli, Heinz Wanzenboeck, Wolfram Buehler, Camille Stebler, Ulrike Zeile, Alexander Rosenthal
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Publication number: 20120248959Abstract: An electron beam source includes a base and a tip fixed to the base and extending from the base. The tip includes a core and a coating applied to the core. The core has a surface that includes a first material. The coating includes a second material which is different from the first material. The second material forms a surface of the tip, and the second coating includes more than 30% by weight of a lanthanide element.Type: ApplicationFiled: March 30, 2011Publication date: October 4, 2012Applicant: CARL ZEISS NTS GMBHInventors: Wolfram Buehler, Volker Drexel
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Publication number: 20120187291Abstract: A process of preparing a lamella from a substrate includes manufacturing a protection strip on an edge portion of the lamella to be prepared from the substrate, and preparing the lamella, wherein the manufacturing the protection strip includes a first phase of activating a surface area portion of the substrate, and a second phase of electron beam assisted deposition of the protective strip on the activated surface area portion from the gas phase.Type: ApplicationFiled: March 23, 2012Publication date: July 26, 2012Applicant: CARL ZEISS NTS GMBHInventors: Heinz Wanzenboeck, Wolfram Buehler, Holger Doemer, Carl Kuebler, Daniel Fischer, Gottfried Hochleitner, Emmerich Bertagnolli
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Patent number: 8143594Abstract: A process of preparing a lamella from a substrate includes manufacturing a protection strip on an edge portion of the lamella to be prepared from the substrate, and preparing the lamella, wherein the manufacturing the protection strip includes a first phase of activating a surface area portion of the substrate, and a second phase of electron beam assisted deposition of the protective strip on the activated surface area portion from the gas phase.Type: GrantFiled: February 5, 2010Date of Patent: March 27, 2012Inventors: Heinz Wanzenboeck, Wolfram Buehler, Holger Doemer, Carl Kuebler, Daniel Fischer, Gottfried Hochleitner, Emmerich Bertagnolli
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Patent number: 7992891Abstract: An interior panelling part for covering an airbag has a sheet-like support, a decorative layer and an intermediate layer arranged between the support and the decorative layer. A passage opening for the airbag is left open in the support. The intermediate layer comprises a mat which spans the passage opening and overlaps with the support outside the passage opening. The intermediate layer and/or the decorative layer is/are weakened longitudinally or offset parallel to an edge of the passage opening on just one side of the passage opening.Type: GrantFiled: April 3, 2007Date of Patent: August 9, 2011Assignees: Faurecia Innenraum Systeme GmbH, Moldware Konstruktion Produktentwicklung Design GmbHInventors: Wolfram Buehler, Wolf-Dieter Schaedel, Gordon Schweizer, Buelent Kalkan, Frank Bauer, Christo Gavrilov
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Publication number: 20110079711Abstract: A particle beam system 1 for cleaning itself comprises an irradiation system to direct electromagnetic radiation onto the surfaces to be cleaned and a supply system 61 to supply a precursor gas to the interior of the vacuum chamber 11 of the particle beam system 1. The precursor gas is activated in a vicinity of the surfaces to be cleaned and is converted into a reaction gas which reacts with the contaminants present on the irradiated surfaces such that said contaminants may be pumped out then.Type: ApplicationFiled: July 13, 2010Publication date: April 7, 2011Inventors: Wolfram Buehler, Holger Doemer, Matthias Lang, Joerg Stodolka, Peter Roediger, Emmerich Bertagnolli, Heinz Wanzenboeck
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Publication number: 20100276607Abstract: A process of preparing a lamella from a substrate includes manufacturing a protection strip on an edge portion of the lamella to be prepared from the substrate, and preparing the lamella, wherein the manufacturing the protection strip includes a first phase of activating a surface area portion of the substrate, and a second phase of electron beam assisted deposition of the protective strip on the activated surface area portion from the gas phase.Type: ApplicationFiled: February 5, 2010Publication date: November 4, 2010Inventors: Heinz Wanzenboeck, Wolfram Buehler, Holger Doemer, Carl Kuebler, Daniel Fischer, Gottfried Hochleitner, Emmerich Bertagnolli
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Publication number: 20100024730Abstract: A processing system for processing an object (3) is provided, wherein the processing system is adapted, to focus a first energy beam, in particular an electron beam (11), and a second energy beam, in particular an ion beam (21), on a focusing region (29) in which a object (3) to be processed is arrangeable. A processing chamber wall (35) having two openings (38, 39) for traversal of both energy beams and a connector (37) for supplying process gas delimits a processing chamber (45) from a vacuum chamber (2) of the processing system. Processing the object by activating the process gas through one of the energy beams and inspecting the object via one of the energy beams is enabled for different orientations of the object relative to a propagation direction of one of the energy beams.Type: ApplicationFiled: February 18, 2009Publication date: February 4, 2010Inventors: Emmerich Bertagnolli, Heinz Wanzenboeck, Wolfram Buehler, Camille Stebler, Ulrike Zeile, Alexander Rosenthal
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Publication number: 20090273164Abstract: An interior panelling part for covering an airbag has a sheet-like support, a decorative layer and an intermediate layer arranged between the support and the decorative layer. A passage opening for the airbag is left open in the support. The intermediate layer comprises a mat which spans the passage opening and overlaps with the support outside the passage opening. The intermediate layer and/or the decorative layer is/are weakened longitudinally or offset parallel to an edge of the passage opening on just one side of the passage opening.Type: ApplicationFiled: April 3, 2007Publication date: November 5, 2009Inventors: Wolfram Buehler, Wolf-Dieter Schafdel, Gordon Schweizer, Buelent Kalkan, Frank Bauer